Hybrid CMOS thin-film devices based on solution-processed CdS n-TFTs and TIPS-Pentacene p-TFTs von Perez, Michael R., Mejia, Israel, Salas-Villasenor, Ana L., Stiegler, Harvey, Trachtenberg, Isaac, Gnade, Bruce E., Quevedo-Lopez, Manuel A.

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14 MHz organic diodes fabricated using photolithographic processes von Ai, Yuming, Gowrisanker, Srinivas, Jia, Huiping, Trachtenberg, Isaac, Vogel, Eric, Wallace, Robert M., Gnade, Bruce E., Barnett, Raymond, Stiegler, Harvey, Edwards, Hal

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Performance Predictions for Solar‐Chemical Converters Based on Photoelectrochemical I‐V Curves von Luttmer, J. D., Trachtenberg, Isaac

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Adsorption Kinetics and Electrode Processes von Delahay, Paul, Trachtenberg, Isaac

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Adsorption Kinetics and Electrode Processes. II von Delahay, Paul, Trachtenberg, Isaac

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Electrochemistry in near-critical and supercritical fluids. 3. Studies of bromide, iodide, and hydroquinone in aqueous solutions von Flarsheim, William M, Tsou, Yu Min, Trachtenberg, Isaac, Johnston, Keith P, Bard, Allen J

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Catalysis of Schiff Base Hydrolysis by Metal Ions1,2 von Eichhorn, Gunther L, Trachtenberg, Isaac M

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Radio frequency diagnostics for plasma etch systems von BUSHMAN, S, EDGAR, T. F, TRACHTENBERG, I

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The King Method for First-order Rate Determinations Modified for Fast Reactions von Eichhorn, Gunther L, Trachtenberg, Isaac M

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Modeling of plasma etch systems using ordinary least squares, recurrent neural network, and projection to latent structure models von BUSHMAN, S, EDGAR, T. F, TRACHTENBERG, I

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Mathematical modeling of a single-wafer rapid thermal reactor von CHATTERJEE, S, TRACHTENBERG, I, EDGAR, T. F

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Constructing a reliable neural network model for a plasma etching process using limited experimental data von Huang, Y.L., Edgar, T.F., Himmelblau, D.M., Trachtenberg, I.

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Design and modeling of rapid thermal processing systems von Stuber, J.D., Trachtenberg, I., Edgar, T.F.

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Modeling the wafer temperature profile in a multiwafer LPCVD furnace von BADGWELL, T. A, TRACHTENBERG, I, EDGAR, T. F

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Paul Delahay: 1967 Palladium Medalist von Trachtenberg, Isaac

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Modeling of Silicon Etching in  CF 4 /  O 2 and  CF 4 /  H 2 Plasmas von Venkatesan, Suresh P., Trachtenberg, Isaac, Edgar, Thomas F.

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Modeling of silicon etching in CF4/O2 and CF4/H2 plasmas von VENKATESAN, S. P, TRACHTENBERG, I, EDGAR, T. F

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Experimental verification of a fundamental model for multiwafer low-pressure chemical vapor deposition of polysilicon von BADGWELL, T. A, EDGAR, T. F, TRACHTENBERG, I, ELLIOTT, J. K

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Modeling and scale-up of multiwafer LPCVD reactors von Badgwell, Thomas A., Edgar, Thomas F., Trachtenberg, Isaac

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A predictive model for the chemical vapor deposition of polysilicon in a cold wall, rapid thermal system von TOPRAC, A. J, TRACHTENBERG, I, EDGAR, T. F

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