Radical surface interactions in industrial silicon plasma etch reactors von Cunge, G, Vempaire, D, Ramos, R, Touzeau, M, Joubert, O, Bodard, P, Sadeghi, N

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Vacuum UV broad-band absorption spectroscopy: a powerful diagnostic tool for reactive plasma monitoring von Cunge, G, Fouchier, M, Brihoum, M, Bodart, P, Touzeau, M, Sadeghi, N

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Room temperature synthesis of carbon nanofibers containing nitrogen by plasma-enhanced chemical vapor deposition von Minea, T. M., Point, S., Granier, A., Touzeau, M.

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Experimental study of a pre-ionized high power pulsed magnetron discharge von Vašina, P, Meško, M, Imbert, J C, Ganciu, M, Boisse-Laporte, C, de Poucques, L, Touzeau, M, Pagnon, D, Bretagne, J

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Measured velocity distribution of sputtered Al atoms perpendicular and parallel to the target von Ramos, R, Cunge, G, Touzeau, M, Sadeghi, N

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Absorption spectroscopy in BCl3 inductively coupled plasmas: determination of density, rotational, translational and vibrational temperatures of BCl molecule von Ramos, R, Cunge, G, Touzeau, M, Sadeghi, N

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O2(a1Δg) production at atmospheric pressure by microdischarge von Sousa, João Santos, Bauville, G., Lacour, B., Puech, V, Touzeau, M., Pitchford, Leanne C.

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Study of a fast high power pulsed magnetron discharge: role of plasma deconfinement on the charged particle transport von Vašina, P, Meško, M, de Poucques, L, Bretagne, J, Boisse-Laporte, C, Touzeau, M

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Reduction of transient regime in fast preionized high-power pulsed-magnetron discharge von Vašina, P, Meško, M, Ganciu, M, Bretagne, J, Boisse-Laporte, C, Poucques, L. de, Touzeau, M

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Atmospheric pressure generation of O2(a1Δg) by microplasmas von Sousa, J. S., Bauville, G., Lacour, B., Puech, V., Touzeau, M.

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On the use of actinometry to measure the dissociation in O2 DC glow discharges: determination of the wall recombination probability von Pagnon, D, Amorim, J, Nahorny, J, Touzeau, M, Vialle, M

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Surface kinetics of N and O atoms in N2-O2 discharges von GORDIETS, B, FERREIRA, C. M, NAHORNY, J, PAGNON, D, TOUZEAU, M, VIALLE, M

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Experimental study of a radio-frequency Ionized Physical Vapour Deposition process: Contamination by the internal coil von Imbert, J.-C., de Poucques, L., Boisse-Laporte, C., Bretagne, J., Hugon, M.C., Pagnon, D., Pitach, P., Teulé-Gay, L., Touzeau, M.

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Experimental and theoretical study of dissociation in the positive column of a hydrogen glow discharge von Amorim, J., Loureiro, J., Baravian, G., Touzeau, M.

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Atmospheric pressure generation of O(2)(a(1)) by microplasmas von Sousa, J S, Bauville, G, Lacour, B, Puech, V, Touzeau, M

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Reactions of Metastable Argon Atoms with Molecular Hydrogen at 300 and 80 K:  Origin of the Ultraviolet Chemiluminescence von Sadeghi, N, Setser, D. W, Touzeau, M

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New type of plasma reactor for thin film deposition: magnetron plasma process assisted by microwaves to ionise sputtered vapour von Boisse-Laporte, C., Leroy, O., de Poucques, L., Agius, B., Bretagne, J., Hugon, M.C., Teulé-Gay, L., Touzeau, M.

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Determination of titanium temperature and density in a magnetron vapor sputtering device assisted by two microwave coaxial excitation systems von Leroy, O., de Poucques, L., Boisse-Laporte, C., Ganciu, M., Teulé-Gay, L., Touzeau, M.

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Comparison of the ionisation efficiency in a microwave and a radio-frequency assisted magnetron discharge von de Poucques, L., Imbert, J.C., Vasina, P., Boisse-Laporte, C., Teulé-Gay, L., Bretagne, J., Touzeau, M.

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IPVD deposition of titanium based thin films von Imbert, J.C., de Poucques, L., Boisse-Laporte, C., Bretagne, J., Hugon, M.C., Teulé-Gay, L., Touzeau, M., Shtansky, D., Voldoire, O.

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