Ultraviolet-irradiated precision polishing of diamond and its related materials von Watanabe, Junji, Touge, Mutsumi, Sakamoto, Takeshi

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Development of an Ultra-finishing technique for single-crystal diamond substrate utilizing an iron tool in H2O2 solution von Kubota, Akihisa, Motoyama, Shuya, Touge, Mutsumi

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Surface smoothing of single-crystal diamond (100) substrate by polishing technique von Kubota, Akihisa, Fukuyama, Sakae, Ichimori, Yuya, Touge, Mutsumi

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Planarization of C-face 4H-SiC substrate using Fe particles and hydrogen peroxide solution von Kubota, Akihisa, Yoshimura, Masahiko, Fukuyama, Sakae, Iwamoto, Chihiro, Touge, Mutsumi

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Development of the Local Polishing Technique for Single-Crystal SiC Wafer von Touge, Mutsumi, Kubota, Akihisa, Nagae, Shin

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Grinding performance of small CBN mounted wheels trued by quartz plate von Ryusei, MIYAMOTO, Naoki, TOUGE, Takeshi, SAKAMOTO, Akihisa, KUBOTA, Mutsumi, TOUGE

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Improvement of material removal rate of single-crystal diamond by polishing using H2O2 solution von Kubota, Akihisa, Nagae, Shin, Touge, Mutsumi

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Fabrication of Smooth Surface on 4H-SiC Substrate by Ultraviolet Assisted Local Polishing in Hydrogen Peroxide Solution von Kurihara, Kazuya, Touge, Mutsumi, Kubota, Akihisa

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Surface Polishing of 2-Inch 4H-SiC Wafer Using Fe Abrasive Particles von Touge, Mutsumi, Ichimori, Yuya, Kubota, Akihisa

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Two-step polishing technique for single crystal diamond (100) substrate utilizing a chemical reaction with iron plate von Kubota, Akihisa, Nagae, Shin, Motoyama, Shuya, Touge, Mutsumi

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Study on Ultra Precision Polishing of Single Crystal Diamond Substrates under Ultraviolet Irradiation von Watanabe, Junji, Kubota, Akihisa, Anan, Satoru, Touge, Mutsumi

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Surface smoothing of a polycrystalline diamond using an iron plate-H2O2 chemical reaction von Kubota, Akihisa, Motoyama, Shuya, Touge, Mutsumi

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Advanced Lapping and Polishing Methods for Planarizing a Single-Crystal 4H-Sic Utilizing Fe Abrasive Particles von Nakanishi, Yoshitaka, Kubota, Akihisa, Watayo, Takashi, Yoshimura, Masahiko, Touge, Mutsumi

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Development of UV-truing technology for diamond grit-arranged blocks von Sakamoto, Takeshi, Nambu, Yousuke, Saitou, Renpei, Touge, Mutsumi, Kawashita, Tomoyuki, Touge, Naoki

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Study on Lapping and Constant-Pressure Grinding of Single-Crystal SiC von Nakano, Takayuki, Watanabe, Junji, Yamaguchi, Keishi, Touge, Mutsumi

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Atomic-Scale Planarization of Single Crystal Diamond Substrates by Ultraviolet Rays Assisted Machining von Watanabe, Junji, Wada, Shogo, Kubota, Akihisa, Nakanishi, Yoshitaka, Touge, Mutsumi, Anan, Satoru

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Improvement of material removal rate of single-crystal diamond by polishing using H^sub 2^O^sub 2^ solution von Kubota, Akihisa, Nagae, Shin, Touge, Mutsumi

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Study on Precision Finishing of PCD by Constant-Pressure Grinding and UV-Polishing von Nakano, Takayuki, Watanabe, Junji, Kubota, Akihisa, Yamaguchi, Keishi, Touge, Mutsumi

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Cutting Performance of PCD Tools Improved by Ultraviolet-Ray Irradiation Polishing von Izumi, Yasuo, Touge, Mutsumi, Goto, Kenta, Sakamoto, Takeshi, Kubota, Akihisa

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Effect of Particles on UV-Polishing characteristics of Single Crystal SiC Substrate von YAMAGUCHI, Keishi, TOUGE, Mutsumi, KUBOTA, Akihisa, MUROTA, Tadatoshi, WATANABE, Junji, TOYOFUKU, Youki, SAWAMI, Yuuki

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