Rutile-type TiO2 thin film for high-k gate insulator von KADOSHIMA, Masaru, HIRATANI, Masahiko, SHIMAMOTO, Yasuhiro, TORII, Kazuyoshi, MIKI, Hiroshi, KIMURA, Shinichiro, NABATAME, Toshihide

Volltext

Investigation of Relationship between Interface State and Random Telegraph Noise Using Metal--Oxide--Semiconductor Field-Effect Transistors Fabricated on Si(100), (110), and (111)... von Tega, Naoki, Miki, Hiroshi, Mine, Toshiyuki, Torii, Kazuyoshi

Volltext

Investigation of Relationship between Interface State and Random Telegraph Noise Using Metal–Oxide–Semiconductor Field-Effect Transistors Fabricated on Si(100), (110), and (111) Su... von Tega, Naoki, Miki, Hiroshi, Mine, Toshiyuki, Torii, Kazuyoshi

Volltext

Si emission from the SiO2∕Si interface during the growth of SiO2 in the HfO2∕SiO2∕Si structure von Ming, Zhao, Nakajima, Kaoru, Suzuki, Motofumi, Kimura, Kenji, Uematsu, Masashi, Torii, Kazuyoshi, Kamiyama, Satoshi, Nara, Yasuo, Yamada, Keisaku

Volltext

Silicon light-emitting transistor for on-chip optical interconnection von Saito, Shin-ichi, Hisamoto, Digh, Shimizu, Haruka, Hamamura, Hirotaka, Tsuchiya, Ryuta, Matsui, Yuichi, Mine, Toshiyuki, Arai, Tadashi, Sugii, Nobuyuki, Torii, Kazuyoshi, Kimura, Shin'ichiro, Onai, Takahiro

Volltext

Low-Shrinkage Spin-On Glass for Low Parasitic Capacitance Gap-Filling Process in Advanced Memory Devices von Ryuzaki, Daisuke, Sakurai, Haruaki, Yoshikawa, Takahiro, Torii, Kazuyoshi

Volltext

State Transition of a Defect Causing Random-Telegraph-Noise Fluctuation in Stress-Induced Leakage Current of Thin SiO2 Films in a Metal--Oxide--Silicon Structure von Ishida, Takeshi, Tega, Naoki, Mori, Yuki, Miki, Hiroshi, Mine, Toshiyuki, Kume, Hitoshi, Torii, Kazuyoshi, Yamada, Ren-ichi, Shiraishi, Kenji

Volltext

Electrode-induced degradation of Pb(Zr x Ti1− x )O3 (PZT) polarization hysteresis characteristics in Pt/PZT/Pt ferroelectric thin-film capacitors von Kushida-Abdelghafar, Keiko, Miki, Hiroshi, Torii, Kazuyoshi, Fujisaki, Yoshihisa

Volltext

Impact of threshold voltage fluctuation due to random telegraph noise on scaled-down SRAM von Tega, N., Miki, H., Yamaoka, M., Kume, H., Toshiyuki Mine, Ishida, T., Yuki Mori, Yamada, R., Kazuyoshi Torii

Volltext

Improved theory for remote-charge-scattering-limited mobility in metal–oxide–semiconductor transistors von Saito, Shin-ichi, Torii, Kazuyoshi, Hiratani, Masahiko, Onai, Takahiro

Volltext

Enhancement of Drain Current in Planar MOSFETs by Dopant Profile Engineering Using Nonmelt Laser Spike Annealing von Shima, A., Mine, T., Torii, K., Hiraiwa, A.

Volltext

Metal Schottky Source/Drain Technology for Ultrathin Silicon-on-Thin-Box Metal Oxide Semiconductor Field Effect Transistors von Shima, Akio, Sugii, Nobuyuki, Mise, Nobuyuki, Hisamoto, Digh, Takeda, Ken-ichi, Torii, Kazuyoshi

Volltext

Metal Schottky Source/Drain Technology for Ultrathin Silicon-on-Thin-Box Metal Oxide Semiconductor Field Effect Transistors von Shima, Akio, Sugii, Nobuyuki, Mise, Nobuyuki, Hisamoto, Digh, Takeda, Ken-ichi, Torii, Kazuyoshi

Volltext

Isotopic labeling study of the oxygen diffusion in HfO2∕SiO2∕Si von Zhao, Ming, Nakajima, Kaoru, Suzuki, Motofumi, Kimura, Kenji, Uematsu, Masashi, Torii, Kazuyoshi, Kamiyama, Satoshi, Nara, Yasuo, Watanabe, Heiji, Shiraishi, Kenji, Chikyow, Toyohiro, Yamada, Keisaku

Volltext

Novel Laser Annealing Process for Advanced Complementary Metal Oxide Semiconductor Devices with Suppressed Polycrystalline Silicon Gate Depletion and Ultra shallow Junctions von Shima, Akio, Mine, Toshiyuki, Torii, Kazuyoshi

Volltext

Effects of Thin Film Interference on Junction Activation during Sub-Millisecond Annealing von Shima, Akio, Tsuchiya, Ryuta, Mine, Toshiyuki, Torii, Kazuyoshi

Volltext

Impact of HK / MG stacks and future device scaling on RTN von Tega, N, Miki, H, Zhibin Ren, D'Emic, C P, Yu Zhu, Frank, D J, Guillorn, M A, Dae-Gyu Park, Haensch, W, Torii, K

Volltext

Effective Electron Mobility Reduced by Remote Charge Scattering in High-κ Gate Stacks von Hiratani, Masahiko, Saito, Shin-ich, Shimamoto, Yasuhiro, Torii, Kazuyoshi

Volltext

Electro-Luminescence from Ultra-Thin Silicon von Saito, Shin-ichi, Hisamoto, Digh, Shimizu, Haruka, Hamamura, Hirotaka, Tsuchiya, Ryuta, Matsui, Yuichi, Mine, Toshiyuki, Arai, Tadashi, Sugii, Nobuyuki, Torii, Kazuyoshi, Kimura, Shin'ichiro, Onai, Takahiro

Volltext

EFFECT OF Hf SOURCES, OXIDIZING AGENTS, AND NH3/Ar PLASMA ON THE PROPERTIES OF HfAlOx FILMS PREPARED BY ATOMIC LAYER DEPOSITION von Kawahara, T, Torii, K, Mitsuhashi, R, Muto, A, Horiuchi, A, Ito, H

Volltext