A Study on Positive Photosensitive Epoxy Resins Using Reaction Development Patterning (RDP) von Zhou, Wei Min, Fukushima, Takafumi, Tomoi, Masao, Oyama, Toshiyuki

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Positive-tone Pattern Formation from Vinyl Polymers with Maleimide Group by Reaction Development Patterning von Oyama, Toshiyuki, Senoo, Shinji, Tomoi, Masao, Takahashi, Akio

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Modification of cyanate ester resin by poly(ethylene phthalate) and related copolyesters von Iijima, Takao, Katsurayama, Satoru, Fukuda, Wakichi, Tomoi, Masao

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A Novel Mechanism to Afford Photosensitivity to Unfunctionalized Polyimides: Negative-tone Reaction Development Patterning von Oyama, Toshiyuki, Sugawara, Shintaro, Shimizu, Yuji, Cheng, Xu, Tomoi, Masao, Takahashi, Akio

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Photosensitive Polyesterimides Based on Reaction Development Patterning von Sugawara, Shintaro, Tomoi, Masao, Oyama, Toshiyuki

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Synthesis of novel reactive polymers having oxirane structure in the main chain by polycondensation of bis(sulfonium ylide) with dialdehyde von OYAMA, Toshiyuki, SUZUKI, Yoshihiro, TOMOI, Masao

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Characterization of Positive-type Photosensitive Polyimide Films Formed by Electrodeposition Coating von Uemura, Takeyuki, Oyama, Toshiyuki, Tomoi, Masao, Itani, Hiroshi

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Photo-crosslinking of polystyrenes having pendant epoxy groups von Oyama, Toshiyuki, Yamashita, Takeshi, Suzuki, Tetsunori, Ebitani, Kentaro, Hoshino, Motoki, Iijima, Takao, Tomoi, Masao

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Photosensitive Polyetherimide (Ultem) Based on Reaction Development Patterning (RDP) von Fukushima, Takafumi, Kawakami, Yukiko, Oyama, Toshiyuki, Tomoi, Masao

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Characterization of Positive-type Photosensitive Polyimide Films Formed by Electrodeposition Coating von Uemura, Takayuki, Oyama, Toshiyuki, Tomoi, Masao, Itatani, Hiroshi

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Lithographic design of photosensitive polyarylates based on reaction development patterning von Oyama, Toshiyuki, Kitamura, Akira, Sato, Eiichi, Tomoi, Masao

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Modification of bismaleimide resin by N-phenylmaleimide-styrene copolymers von Iijima, Takao, Hirano, Masayoshi, Fukuda, Wakichi, Tomoi, Masao

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Polystyrenes with chiral phosphoramide substituents as Lewis base catalysts for asymmetric addition of allyltrichlorosilane: enhancement of catalytic performance by polymer effect von Oyama, Toshiyuki, Yoshioka, Hiroki, Tomoi, Masao

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Modification of bismaleimide resin by soluble poly(ester imide) containing trimellitimide moieties von Iijima, Takao, Hayashi, Nobuaki, Oyama, Toshiyuki, Tomoi, Masao

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Modification of aromatic diamine-cured epoxy resins by poly(oxymethylene) or hybrid modifiers containing poly(oxymethylene) von Iijima, Takao, Sugizaki, Atsushi, Fukuda, Wakichi, Tomoi, Masao

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New concept of positive photosensitive polyimide: Reaction development patterning (RDP) von Fukushima, Takafumi, Oyama, Toshiyuki, Iijima, Takao, Tomoi, Masao, Itatani, Hiroshi

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Thermal, Mechanical, and Dielectric Properties of Bifunctional Styryl Resins von AMOU, Satoru, YAMADA, Shinji, NAGAI, Akira, MIWA, Takao, TOMOI, Masao

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Modification of Acid Anhydride-curedEpoxy Resins ByN-Phenyl-maleimide-Styrene CopolymersandN-Phenylmaleimide-Styrene-p-Hydroxystyrene Terpolymers von Iijima, Takao, Fukuda, Wakichi, Tomoi, Masao, Aiba, Masaharu

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Modification of cyanate ester resin by soluble polyimides von Iijima, Takao, Kaise, Tomohiro, Tomoi, Masao

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Modification of three-component bismaleimide resin by poly(phthaloyl diphenyl ether) and related copolymers von Iijima, Takao, Yuasa, Noriyuki, Tomoi, Masao

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