Optimum optics for die-to-wafer-like image mask inspection von Takada, Akira, Tojo, Toru, Shibuya, Masato

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A New Algorithm for Die-to-Wafer-like Image Mask Inspection in Real Time von TAKADA, Akira, TOJO, Toru, SHIBUYA, Masato

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Proximity effect correction for electron beam lithography : Highly accurate correction method von KAMIKUBO, T, ABE, T, TOJO, T, OOGI, S, ANZE, H, SHIMIZU, M, ITOH, M, NAKASUGI, T, TAKIGAWA, T, IIJIMA, T, HATTORI, Y

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Evaluation of Mask Soaking Performance in a Thermally Stabilized Vacuum Chamber in an Electron Beam Mask Writer von Mitsui, Soichiro, Akeno, Kiminobu, Ogasawara, Munehiro, Tojo, Toru

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High-Speed Convolution System for Real-Time Proximity Effect Correction von Susumu Oogi, Susumu Oogi, Takiji Ishimura, Takiji Ishimura, Takashi Kamikubo, Takashi Kamikubo, Mitsuko Shimizu, Mitsuko Shimizu, Yoshiaki Hattori, Yoshiaki Hattori, Tomohiro Iijima, Tomohiro Iijima, Hirohito Anze, Hirohito Anze, Takayuki Abe, Takayuki Abe, Toru Tojo, Toru Tojo, Tadahiro Takigawa, Tadahiro Takigawa

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The effect of down-flow cleaning process on materials used in an electron beam system von SHIMOMURA, N, OGASAWARA, M, OHTOSHI, K, YAMASAKI, S, FUKUDOME, Y, HIRANO, R, TAMAMUSHI, S, TOJO, T, TAKIGAWA, T

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Particle Contamination Control Technology in Electron Beam Mask Writing System for Next-Generation Mask Fabrication von Akeno, Kiminobu, Ogasawara, Munehiro, Ooki, Kenji, Tojo, Toru, Hirano, Ryoichi, Yoshitake, Shusuke, Toriumi, Masaki, Sekine, Akihiko, Takigawa, Tadahiko, Shinoda, Toshiki, Noguchi, Shigeru

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High-Accuracy Proximity Effect Correction for Mask Writing von Abe, Takayuki, Hattori, Yoshiaki, Iijima, Tomohiro, Anze, Hirohito, Oogi, Susumu, Kamikubo, Takashi, Tsuchiya, Seiichi, Shimizu, Matsuki, Kazuto, Inoue, Hideo, Tojo, Takigawa, Tadahiro

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Special issue on nanotechnology organization - Philosophy and trends. Current aspects and future trends of nanometer positioning von TOJO, Toru

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A chromatic aberration-free heterodyne alignment for optical lithography von HIGASHIKI, T, TOJO, T, TABATA, M, NISHIZAKA, T, MATSUMOTO, M, SAMEDA, Y

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0.05 MU-M (3-SIGMA) OVERLAY ACCURACY THROUGH-THE-LENS ALIGNMENT IN AN EXCIMER LASER LITHOGRAPHY SYSTEM von HIGASHIKI, T, TOJO, T, TAKAHASHI, Y, TABATA, M, NISHIZAKA, T, KUWABARA, O, UCHIDA, N, YOSHINO, H, SAITO, S

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Mask defect inspection method by database comparison with 0.25-0.35 μm sensitivity von TOJO, T, TABATA, M, YAMASHITA, K, TSUCHIYA, H, WATANABE, T, ITOH, C, ONO, A, INOUE, H, OKUDA, K, YOSHINO, H

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INSPECTION DEVICE von TOJO TORU

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Mechanical system construction for the EX-11 electron beam mask writer: A solution for 100 nm wafer lithography von Akeno, Kiminobu, Ogasawara, Munehiro, Tojo, Toru

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0.05 µm (3σ) Overlay Accuracy Through-the-lens Alignment in an Excimer Laser Lithography System von Higashiki, Tatsuhiko, Tojo, Toru, Takahashi, Yoshihiko, Tabata, Mitsuo, Nishizaka, Takeshi, Kuwabara, Osamu, Uchida, Norio, Yoshino, Hisakazu, Saito, Susumu

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The Estimation and Improvement of TTL Alignment Error Budgets for an Excimer Laser Aligner von HIGASHIKI, Tatsuhiko, TOJO, Toru, TARATA, Mitsuo, NISHIZAKA, Takeshi, YOSHINO, Hisakazu, SAITO, Susumu

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Current Aspects and Future Trends of Nanometer Positioning von TOJO, Toru

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Reduction of long range fogging effect in a high acceleration voltage electron beam mask writing system von Ogasawara, Munehiro, Shimomura, Naoharu, Takamatsu, Jun, Yoshitake, Shusuke, Ooki, Kenji, Nakayamada, Noriaki, Okabe, Humiyuki, Tojo, Toru, Takigawa, Tadahiro

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Pattern inspection apparatus von Isomura, Ikunao, Tojo, Toru

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Pattern inspection apparatus von TOJO TORU, ISOMURA IKUNAO

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