Removal of poly(methyl methacrylate) in diblock copolymers films studied by grazing incidence small‐angle X‐ray scattering von Freychet, Guillaume, Maret, Mireille, Tiron, Raluca, Chevalier, Xavier, Gharbi, Ahmed, Fernandez-Regulez, Marta, Gergaud, Patrice

Volltext

Probing Self-Assembly of Cylindrical Morphology Block Copolymer Using in Situ and ex Situ Grazing Incidence Small-Angle X‑ray Scattering: The Attractive Case of Graphoepitaxy von Maret, Mireille, Tiron, Raluca, Chevalier, Xavier, Gergaud, Patrice, Gharbi, Ahmed, Lapeyre, Céline, Pradelles, Jonathan, Jousseaume, Vincent, Fleury, Guillaume, Hadziioannou, Georges, Boudet, Nathalie, Navarro, Christophe

Volltext

Water-soluble bio-sourced resists for DUV lithography in a 200/300 mm pilot line environment von Servin, Isabelle, Teolis, Alexandre, Bazin, Arnaud, Durin, Paule, Sysova, Olha, Gablin, Corinne, Saudet, Benoît, Leonard, Didier, Soppera, Olivier, Leclercq, Jean-Louis, Chevolot, Yann, Tiron, Raluca, Delair, Thierry, Trombotto, Stéphane

Volltext

Resist-Free Directed Self-Assembly Chemo-Epitaxy Approach for Line/Space Patterning von Giammaria, Tommaso Jacopo, Gharbi, Ahmed, Paquet, Anne, Nealey, Paul, Tiron, Raluca

Volltext

HBr Plasma Treatment Versus VUV Light Treatment to Improve 193 nm Photoresist Pattern Linewidth Roughness von Pargon, Erwine, Azarnouche, Laurent, Fouchier, Marc, Menguelti, Kevin, Tiron, Raluca, Sourd, Claire, Joubert, Olivier

Volltext

Optimization of block copolymer self-assembly through graphoepitaxy: A defectivity study von Tiron, Raluca, Chevalier, Xavier, Couderc, Christophe, Pradelles, Jonathan, Bustos, Jessy, Pain, Laurent, Navarro, Christophe, Magnet, Stephanie, Fleury, Guillaume, Hadziioannou, Georges

Volltext

Exploring Strategies to Contact 3D Nano-Pillars von Amat, Esteve, del Moral, Alberto, Fernandez-Regulez, Marta, Evangelio, Laura, Lorenzoni, Matteo, Gharbi, Ahmed, Rademaker, Guido, Pourteau, Marie-Line, Tiron, Raluca, Bausells, Joan, Perez-Murano, Francesc

Volltext

Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line von Servin, Isabelle, Tiron, Raluca, Gharbi, Ahmed, Argoud, Maxime, Jullian, Karine, Chamiot-Maitral, Gaëlle, Barros, Patricia Pimenta, Chevalier, Xavier, Belledent, Jérôme, Bossy, Xavier, Moulis, Sylvain, Navarro, Christophe, Cunge, Gilles, Barnola, Sébastien, Asai, Masaya, Pieczulewski, Charles

Volltext

Recent Achievements in Sub-10 nm DSA Lithography for Line/Space Patterning von Navarro, Christophe, Nicolet, Celia, Ariura, Fumi, Chevalier, Xavier, Xu, Kui, Hockey, Mary Ann, Mumtaz, Muhammad, Fleury, Guillaume, Hadziioannou, Georges, Legrain, Antoine, Zelsmann, Marc, Gharbi, Ahmed, Tiron, Raluca, Pain, Laurent, Evangelio, Laura, Fernandez-Regulez, Marta, Perez-Murano, Francesc, Cayrefourcq, Ian

Volltext

DNA Origami Mask for Sub-Ten-Nanometer Lithography von Diagne, Cheikh Tidiane, Brun, Christophe, Gasparutto, Didier, Baillin, Xavier, Tiron, Raluca

Volltext

Block copolymer technology applied to nanoelectronics von Tallegas, Salomé, Baron, Thierry, Gay, Guillaume, Aggrafeil, Claire, Salhi, Billel, Chevolleau, Thierry, Cunge, Gilles, Bsiesy, Ahmad, Tiron, Raluca, Chevalier, Xavier, Navarro, Christophe, Aissou, Karim, Otsuka, Issei, Halila, Sami, Fort, Sébastien, Borsali, Redouane

Volltext

DNA Origami for Silicon Patterning von Thomas, Guillaume, Diagne, Cheikh Tidiane, Baillin, Xavier, Chevolleau, Thierry, Charvolin, Thomas, Tiron, Raluca

Volltext

Hydrophobic Films Surface Preparation And Its Impact On Wet Cleaning von Mercadier, Thomas, Garnier, Philippe, Loup, Virginie, Tiron, Raluca, Martinez, Eugenie

Volltext

Evaluation and Optimization of Particle Removal with a Resist Peeling Method von Mercadier, Thomas, Garnier, Philippe, Higuchi, Ayumi, Loup, Virginie, Zhang, Song, Belmiloud, Naser, Tiron, Raluca

Volltext

Selective plasma etching of silicon-containing high chi block copolymer for directed self-assembly (DSA) application von Gusmão Cacho, Maria Gabriela, Benotmane, Khatia, Pimenta-Barros, Patricia, Bouet, Charlotte, Rademaker, Guido, Argoud, Maxime, Navarro, Christophe, Tiron, Raluca, Possémé, Nicolas

Volltext

New CH 4 -N 2 dry etch chemistry for poly(methyl methacrylate) removal without consuming polystyrene for lamellar copolymers application von Sarrazin, Aurélien, Posseme, Nicolas, Pimenta-Barros, Patricia, Barnola, Sebastien, Tiron, Raluca, Cardinaud, Christophe

Volltext

New CH4-N2 dry etch chemistry for poly(methyl methacrylate) removal without consuming polystyrene for lamellar copolymers application von Sarrazin, Aurelien, Posseme, Nicolas, Pimenta-Barros, Patricia, Barnola, Sebastien, Tiron, Raluca, Cardinaud, Christophe

Volltext

Green deep‐UV photoresist based on chitosan for microelectronics von Sysova, Olha, Durin, Paule, Gablin, Corinne, Léonard, Didier, Téolis, Alexandre, Trombotto, Stéphane, Delair, Thierry, Berling, Dominique, Servin, Isabelle, Tiron, Raluca, Bazin, Arnaud, Leclercq, Jean‐Louis, Chevolot, Yann, Soppera, Olivier

Volltext

Morphology modification of Si nanopillars under ion irradiation at elevated temperatures: plastic deformation and controlled thinning to 10 nm von Xu, Xiaomo, Heinig, Karl-Heinz, Möller, Wolfhard, Engelmann, Hans-Jürgen, Klingner, Nico, Gharbi, Ahmed, Tiron, Raluca, Borany, Johannes von, Hlawacek, Gregor

Volltext

Water-soluble bio-sourced resist interactions with fluorinated etching plasmas during the photolithography process von Durin, Paule, Sysova, Olha, Téolis, Alexandre, Trombotto, Stéphane, Hajjar-Garreau, Samar, Delair, Thierry, Servin, Isabelle, Rochat, Névine, Tiron, Raluca, Gablin, Corinne, Soppera, Olivier, Benamrouche, Aziz, Géhin, Thomas, Léonard, Didier, Leclercq, Jean-Louis, Chevolot, Yann

Volltext