Treffer 1 - 18 von 18 für Suche 'THILDERKVIST ANNALENA', Suchdauer: 1,14s Treffer weiter einschränken
  1. 1
    Er-doped polycrystalline silicone for light emission at (lambda) = 1.54(mu)m

    Er-doped polycrystalline silicone for light emission at (lambda) = 1.54(mu)m von Chen, Thomas D, Agarwal, Anuradha M, Thilderkvist, Annalena, Michel, Jurgen, Kimerling, Lionel C

    Veröffentlicht in Journal of electronic materials

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  2. 2
    Er-doped polycrystalline silicon for light emission at lambda identical with 1.54 mu m

    Er-doped polycrystalline silicon for light emission at lambda identical with 1.54 mu m von Chen, Thomas D, Agarwal, Anuradha M, Thilderkvist, Annalena, Michel, Jurgen, Kimerling, Lionel C

    Veröffentlicht in Journal of electronic materials

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  3. 3
    Er-doped polycrystalline silicon for light emission at λ = 1.54 μm

    Er-doped polycrystalline silicon for light emission at λ = 1.54 μm von CHEN, T. D, AGARWAL, A. M, THILDERKVIST, A, MICHEL, J, KIMERLING, L. C

    Veröffentlicht in Journal of electronic materials

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  4. 4
    Gold in silicon and other analogous donors and acceptors

    Gold in silicon and other analogous donors and acceptors von Kleverman, Mats, Thilderkvist, AnnaLena, Grossmann, Günter, Grimmeiss, Hermann G, Watkins, George D

    Veröffentlicht in Solid state communications

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  5. 5
    Neutral interstitial iron center in silicon studied by Zeeman spectroscopy

    Neutral interstitial iron center in silicon studied by Zeeman spectroscopy von Thilderkvist, AnnaLena, Grossmann, Günter, Kleverman, Mats, Grimmeiss, Hermann G.


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  6. 6
    Apparatus and method for surface finishing a silicon film

    Apparatus and method for surface finishing a silicon film von COMITA, PAUL B, SCUDDER, LANCE A, RILEY, NORMA B, THILDERKVIST, ANNALENA

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  7. 7
    Method for in-situ cleaning of surfaces in a substrate processing chamber

    Method for in-situ cleaning of surfaces in a substrate processing chamber von COMITA, PAUL B, WALDHAUER, ANN P, THILDERKVIST, ANNALENA

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  8. 8
    Apparatus and method for surface finishing a silicon film

    Apparatus and method for surface finishing a silicon film von COMITA, PAUL B, SCUDDER, LANCE A, RILEY, NORMA B, THILDERKVIST, ANNALENA

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  9. 9
    Method for in-situ cleaning of surfaces in a substrate processing chamber

    Method for in-situ cleaning of surfaces in a substrate processing chamber von COMITA PAUL B, THILDERKVIST ANNALENA, WALDHAUER ANN P

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  10. 10
    METHOD FOR IN-SITU CLEANING OF SURFACES IN A SUBSTRATE PROCESSING CHAMBER

    METHOD FOR IN-SITU CLEANING OF SURFACES IN A SUBSTRATE PROCESSING CHAMBER von COMITA PAUL B, THILDERKVIST ANNALENA, WALDHAUER ANN P

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  11. 11
    Method for in-situ cleaning of surfaces of a substrate processing chamber

    Method for in-situ cleaning of surfaces of a substrate processing chamber von COMITA, PAUL B, WALDHAUER, ANN P, THILDERKVIST, ANNALENA

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  12. 12
    Method for in-situ cleaning of surfaces of a substrate processing chamber

    Method for in-situ cleaning of surfaces of a substrate processing chamber von COMITA, PAUL B, WALDHAUER, ANN P, THILDERKVIST, ANNALENA

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  13. 13
    Apparatus and method for surface finishing a silicon film

    Apparatus and method for surface finishing a silicon film von COMITA, PAUL B, SCUDDER, LANCE A, RILEY, NORMA B, THILDERKVIST, ANNALENA

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  14. 14
    Interstitial magnesium double donor in silicon

    Interstitial magnesium double donor in silicon von Thilderkvist, A, Kleverman, M, Grimmeiss, HG


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  15. 15
    APPARATUS AND METHOD FOR FINISHING SURFACE OF SILICON FILM

    APPARATUS AND METHOD FOR FINISHING SURFACE OF SILICON FILM von SCUDDER LANCE A, COMITA PAUL B, THILDERKVIST ANNALENA, RILEY NORMA B

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  16. 16
    Apparatus and method for surface finishing a silicon film

    Apparatus and method for surface finishing a silicon film von COMITA, PAUL B, SCUDDER, LANCE A, RILEY, NORMA B, THILDERKVIST, ANNALENA

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  17. 17
    Quadratic Zeeman effect of shallow donors in silicon

    Quadratic Zeeman effect of shallow donors in silicon von Thilderkvist, A, Kleverman, M, Grossmann, G, Grimmeiss, HG


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  18. 18
    METHOD FOR IN-SITU CLEANING OF SURFACES IN A SUBSTRATE PROCESSING CHAMBER

    METHOD FOR IN-SITU CLEANING OF SURFACES IN A SUBSTRATE PROCESSING CHAMBER von COMITA PAUL B, THILDERKVIST ANNALENA, WALDHAUER ANN P

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