Impact of electron scattering in extreme ultraviolet reflective multilayer on electron image von Iida, Susumu, Amano, Tsuyoshi, Hirano, Ryoichi, Terasawa, Tsuneo, Watanabe, Hidehiro

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Identification of residual-type defect on extreme ultraviolet mask by projection electron microscope using Monte Carlo simulation von Iida, Susumu, Amano, Tsuyoshi, Hirano, Ryoichi, Terasawa, Tsuneo, Watanabe, Hidehiro

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Analysis of image distortion on projection electron microscope image von Iida, Susumu, Hirano, Ryoichi, Terasawa, Tsuneo, Amano, Tsuyoshi, Watanabe, Hidehiro

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Demonstrating 30-nm spatial resolution of three-multilayer-mirror objective for extreme ultraviolet microscopy: Imaging test by observing lithography mask von Toyoda, Mitsunori, Yamasoe, Kenjiro, Tokimasa, Akifumi, Uchida, Kentaro, Harada, Tetsuo, Terasawa, Tsuneo, Amano, Tsuyoshi, Watanabe, Takeo, Yanagihara, Mihiro, Kinoshita, Hiroo

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Residual-type mask defect printability for extreme ultraviolet lithography von Amano, Tsuyoshi, Iida, Susumu, Hirano, Ryoichi, Terasawa, Tsuneo, Watanabe, Hidehiro, Inazuki, Yuichi

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Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability von Terasawa, Tsuneo, Arisawa, Yukiyasu, Amano, Tsuyoshi, Yamane, Takeshi, Watanabe, Hidehiro, Toyoda, Mitsunori, Harada, Tetsuo, Kinoshita, Hiroo

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Actinic Mask Blank Inspection and Signal Analysis for Detecting Phase Defects Down to 1.5 nm in Height von Terasawa, Tsuneo, Yamane, Takeshi, Tanaka, Toshihiko, Iwasaki, Teruo, Suga, Osamu, Tomie, Toshihisa

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Sensitivity-Limiting Factors of at-Wavelength Extreme Ultraviolet Lithography Mask Blank Inspection von Tezuka, Yoshihiro, Tanaka, Toshihiko, Terasawa, Tsuneo, Tomie, Toshihisa

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Background level in extreme-UV dark-field image for mask blank inspection von Yamane, Takeshi, Terasawa, Tsuneo

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Theoretical Calculation of Mask Error Enhancement Factor for Periodic Pattern Imaging von Terasawa, Tsuneo, Hasegawa, Norio

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Simulation of Multilayer Defects in Extreme Ultraviolet Masks von Ito, Masaaki, Ogawa, Taro, Otaki, Katsura, Nishiyama, Iwao, Okazaki, Shinji, Terasawa, Tsuneo

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Analysis of High-Acceleration-Voltage Scanning Electron Microscope Images von Moniwa, Akemi, Terasawa, Tsuneo

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Phase retrieval from defocused images and its applications in lithography von VON BUNAU, R. M, FUKUDA, H, TERASAWA, T

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A novel optical lithography technique using the phase-shifter fringe von TANAKA, T, UCHINO, S, HASEGAWA, N, YAMANAKA, T, TERASAWA, T, OKAZAKI, S

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Roles of Surface Functional Groups on TiN and SiN Substrates in Resist Pattern Deformations von YAMANAKA, R, MINE, T, TANAKA, T, TERASAWA, T

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Actinic Phase Defect Detection for Extreme Ultraviolet Lithography Mask with Absorber Patterns von Terasawa, Tsuneo, Yamane, Takeshi, Tanaka, Toshihiko, Suga, Osamu, Tomie, Toshihisa

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Imaging characteristics of multi-phase-shifting and halftone phase-shifting masks von TERASAWA, T, HASEGAWA, N, FUKUDA, H, KATAGIRI, S

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Overlay Error Estimation of Wafer Rear Surface Alignment for 0.1-µm Lithography von Katagiri, Souichi, Shigeo Moriyama, Shigeo Moriyama, Tsuneo Terasawa, Tsuneo Terasawa

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Nanofabrication with a novel EB system with a large and stable beam current von YOSHIMURA, T, OHTA, H, YAMAMOTO, J, UCHINO, S.-I, GOTOH, Y, TERASAWA, T

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A Fast Method of Simulating Resist Pattern Contours Based on Mean Inhibitor Concentration von Kubota, Hiroyuki, Moniwa, Akemi, Terasawa, Tsuneo

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