Double Patterning Using Multilayer Hard Mask Process with Perhydropolysilazane von Terai, Mamoru, Shinohara, Masaaki, Yonekura, Kazumasa, Hagiwara, Takuya, Hanawa, Tetsuro, Kumada, Teruhiko

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Immersion-Specific Defects of High-Receding-Angle Topcoat von Terai, Mamoru, Kumada, Teruhiko, Hagiwara, Takuya, Hanawa, Tetsuro, Ando, Tomoyuki, Matsunobe, Takeshi, Okada, Kazuyuki, Muraji, Yuichi, Yoshikawa, Kazuhiro, Man, Naoki

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Newly Developed Resolution Enhancement Lithography Assisted by Chemical Shrink Process and Materials for Next-Generation Devices von Terai, Mamoru, Kumada, Teruhiko, Ishibashi, Takeo, Hanawa, Tetsuro

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Surface Segregation Analysis of Hydrophobic Additive of Non-topcoat Resist von Hagiwara, Takuya, Ishibashi, Takeo, Terai, Mamoru, Kumada, Teruhiko, Shirota, Naoko, Yokokoji, Osamu, Matsunobu, Takeshi, Man, Naoki, Yoshikawa, Kazuhiro, Tanahashi, Yusuke, Hanawa, Tetsuro

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Novel Wafer Bevel Treatment for Water Immersion Lithography von Terai, Mamoru, Ishibashi, Takeo, Hagiwara, Takuya, Hanna, Tetsuro, Kumada, Teruhiko, Takebe, Yoko, Yokokoji, Osamu, Fujiwara, Tomoharu, Jiang, Jianhai, Niwa, Takafumi, Wakamizu, Shinya, Kyouda, Hideharu

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Characteristics of ArF Immersion Lithography Using Topcoat von Ishibashi, Takeo, Hanawa, Tetsuro, Suganaga, Tsohifumi, Maejima, Shinroku, Narimatsu, Koichiro, Suko, Kazuyuki, Terai, Mamoru, Kumada, Teruhiko, Ando, Tomoyuki

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Oil-Slippery Coating von Kubota, Natsumi, Yoshida, Yasuhiro, Terai, Mamoru

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Oil-Slippery Coating von Kubota, Natsumi, Yoshida, Yasuhiro, Terai, Mamoru

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Double Patterning Using Multilayer Hard Mask Process with Perhydropolysilazane von Terai, Mamoru, Shinohara, Masaaki, Yonekura, Kazumasa, Hagiwara, Takuya, Hanawa, Tetsuro, Kumada, Teruhiko

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Advanced RELACS Technology for ArF Resist von Terai, Mamoru, Toyoshima, Toshiyuki, Ishibashi, Takeo, Tarutani, Shinji, Takahashi, Kiyohisa, Takano, Yusuke, Tanaka, Hatsuyuki

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A Method for Evaluation of Adhesion Strength of Structures on Actual Chip von Negishi, Tetsu, Terai, Mamoru, Nishimura, Takashi

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THERMAL STORAGE DEVICE von NOMURA, Yasumitsu, SATO, Minoru, OHO, Takumi, TERAI, Mamoru, NOBUTOKI, Hideharu

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HEAT EXCHANGER AND METHOD FOR MANUFACTURING HEAT EXCHANGER von TERAI, Mamoru, YAMAMOTO, Yoshinori

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HEAT STORAGE APPARATUS von NOMURA, Yasumitsu, SATO, Minoru, OHO, Takumi, TERAI, Mamoru, NOBUTOKI, Hideharu

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THERMAL STORAGE DEVICE von NOMURA, Yasumitsu, SATO, Minoru, OHO, Takumi, TERAI, Mamoru, NOBUTOKI, Hideharu

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INSULATED WIRE, PRODUCTION METHOD FOR SAME, AND ELECTRICAL EQUIPMENT von TERAI, Mamoru, KAMO, Yoshiyuki

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Semiconductor device and method for manufacturing semiconductor device von TERAI MAMORU, HIRAMATSU SEIKI

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Method of forming resist pattern von HAGIWARA TAKUYA, TERAI MAMORU

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Semiconductor device von Yamamoto, Kei, Terai, Mamoru, Negishi, Tetsu

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DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF von TERAI MAMORU, HITOMI HARUKO

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