High external quantum efficiency (10%) AlGaN-based deep-ultraviolet light-emitting diodes achieved by using highly reflective photonic crystal on p-AlGaN contact layer von Kashima, Yukio, Maeda, Noritoshi, Matsuura, Eriko, Jo, Masafumi, Iwai, Takeshi, Morita, Toshiro, Kokubo, Mitsunori, Tashiro, Takaharu, Kamimura, Ryuichiro, Osada, Yamato, Takagi, Hideki, Hirayama, Hideki

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Temperature dependence of inverse Rashba-Edelstein effect at metallic interface von Nomura, Akiyo, Tashiro, Takaharu, Nakayama, Hiroyasu, Ando, Kazuya

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Rashba-Edelstein Magnetoresistance in Metallic Heterostructures von Nakayama, Hiroyasu, Kanno, Yusuke, An, Hongyu, Tashiro, Takaharu, Haku, Satoshi, Nomura, Akiyo, Ando, Kazuya

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Spin current transport in ceramic: TiN thin film von An, Hongyu, Kanno, Yusuke, Tashiro, Takaharu, Nakamura, Yoshio, Shi, Ji, Ando, Kazuya

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Spin-current emission governed by nonlinear spin dynamics von Tashiro, Takaharu, Matsuura, Saki, Nomura, Akiyo, Watanabe, Shun, Kang, Keehoon, Sirringhaus, Henning, Ando, Kazuya

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Absorption of diffusive spin current in surface and bulk states of a topological insulator von Nomura, Akiyo, Nasaka, Nariaki, Tashiro, Takaharu, Sasagawa, Takao, Ando, Kazuya

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Time-resolved spectroscopy of spin-current emission from a magnetic insulator von Tateno, Yuma, Fukami, Masaya, Tashiro, Takaharu, Ando, Kazuya

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Nonlinear spin-current enhancement enabled by spin-damping tuning von Sakimura, Hiroto, Tashiro, Takaharu, Ando, Kazuya

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Formation of Patterned Sapphire Substrate using UV Imprint Processes von Shinohara, Hidetoshi, Fujiwara, Shigeru, Tashiro, Takaharu, Kitahara, Hidetoshi, Goto, Hiroshi

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Rashba-Edelstein Magnetoresistance in Metallic Heterostructures von Nakayama, Hiroyasu, Kanno, Yusuke, An, Hongyu, Tashiro, Takaharu, Haku, Satoshi, Nomura, Akiyo, Ando, Kazuya

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Spin pumping blocked by single-layer graphene von Haku, Satoshi, Tashiro, Takaharu, Nakayama, Hiroyasu, Ieda, Jun ichi, Entani, Shiro, Sakai, Seiji, Ando, Kazuya

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Processing machine and method for manufacturing workpiece von TASHIRO TAKAHARU

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Improvement of EQE in AlGaN deep-UV LED fabricating highly-reflective PhC on p-GaN contact layer von Kashima, Yukio, Watanabe, Yasuhiro, Shibata, Tomohiko, Maeda, Noritoshi, Matsuura, Eriko, Iwai, Takeshi, Kokubo, Mitsunori, Tashiro, Takaharu, Furuta, Kanji, Kamimura, Ryuichiro, Osada, Yamato, Takagi, Hideki, Kurashima, Yuichi, Iwaisako, Yasushi, Nagano, Tsugumi, Hirayama, Hideki

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High WPE (9.6%) AlGaN deep-UV LED using transparent contact layer and lens von Hirayama, Hideki, Kashima, Yukio, Matsuura, Eriko, Takagi, Hideki, Maeda, Noritoshi, Jo, Masafumi, Iwai, Takeshi, Morita, Toshiro, Kokubo, Mitsunori, Tashiro, Takaharu, Kamimura, Ryuichiro, Osada, Yamato

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Achievement of high-EQE(9%) AlGaN deep-UV LED by optimizing thickness of Ni in highly reflective Ni/Al electrode von Maeda, Noritoshi, Jo, Masafumi, Kashima, Yukio, Matsuura, Eriko, Takagi, Hideki, Iwai, Takeshi, Morita, Toshiro, Kokubo, Mitsunori, Tashiro, Takaharu, Kamimura, Ryuichiro, Osada, Yamato, Hirayama, Hideki

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Achievement of high-EQE(10%)AlGaN deep-UV LED using highly-reflective PhC von Kashima, Yukio, Maeda, Noritoshi, Matsuura, Eriko, Jo, Masafumi, Iwai, Takeshi, Morita, Toshiro, Kokubo, Mitsunori, Tashiro, Takaharu, Kamimura, Ryuichiro, Osada, Yamato, Takagi, Hideki, Hirayama, Hideki

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Damage-less fine control fabrication of highly-reflective PhC for AlGaN deep-UV LED von Kashima, Yukio, Tashiro, Takaharu, Kokubo, Mitsunori, Kamimura, Ryuichiro, Osada, Yamato, Iwai, Takeshi, Morita, Toshiro, Matsuura, Eriko, Maeda, Noritoshi, Jo, Masafumi, Takagi, Hideki, Hirayama, Hideki

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Processing machine and production method for object subject to processing von TASHIRO, TAKAHARU

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PROCESSING MACHINE AND PRODUCTION METHOD FOR OBJECT SUBJECT TO PROCESSING von TASHIRO, Takaharu

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PROCESSING MACHINE AND MANUFACTURING METHOD OF WORKPIECE von TASHIRO TAKAHARU

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