Damage Characteristics of TiO2 Thin Film Surfaces Etched by Capacitively Coupled Radio Frequency Helium Plasmas von Kawakami, Retsuo, Takeichi, Atsushi, Niibe, Masahito, Inaoka, Takeshi, Tominaga, Kikuo

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Comparison between Damage Characteristics of p- and n-GaN Surfaces Etched by Capacitively Coupled Radio Frequency Argon Plasmas von Kawakami, Retsuo, Niibe, Masahito, Nakano, Yoshitaka, Konishi, Masashi, Mori, Yuta, Takeichi, Atsushi, Tominaga, Kikuo, Mukai, Takashi

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Etch damage characteristics of TiO2 thin films by capacitively coupled RF Ar plasmas von Kawakami, Retsuo, Tominaga, Kikuo, Okada, Kenji, Nouda, Takahiro, Inaoka, Takeshi, Takeichi, Atsushi, Fukudome, Toshiaki, Murao, Kenichi

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Effect of Dielectric Barrier Discharge Air Plasma Treatment on TiO2 Thin Film Surfaces von Kawakami, Retsuo, Niibe, Masahito, Fukudome, Toshiaki, Takeichi, Atsushi, Inaoka, Takeshi, Tominaga, Kikuo

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Etch-induced damage characteristics of n-GaN surfaces by capacitively coupled radio frequency He and Ar plasmas von Kawakami, Retsuo, Inaoka, Takeshi, Tominaga, Kikuo, Niibe, Masahito, Mukai, Takashi, Takeichi, Atsushi, Fukudome, Toshiaki

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Synergy Effect of Xenon Plasma Ions and Ultraviolet Lights on GaN Etch Surface Damage and Modification von Kawakami, Retsuo, Inaoka, Takeshi, Tominaga, Kikuo, Niibe, Masahito, Mukai, Takashi, Takeichi, Atsushi, Fukudome, Toshiaki

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Capacitively coupled radio frequency nitrogen plasma etch damage to N-type gallium nitride von Kawakami, Retsuo, Takeichi, Atsushi, Niibe, Masahito, Konishi, Masashi, Mori, Yuta, Kotaka, Takuya, Inaoka, Takeshi, Tominaga, Kikuo, Mukai, Takashi

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Damage Characteristics of TiO 2 Thin Film Surfaces Etched by Capacitively Coupled Radio Frequency Helium Plasmas von Kawakami, Retsuo, Takeichi, Atsushi, Niibe, Masahito, Inaoka, Takeshi, Tominaga, Kikuo

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Damage Characteristics of TiO 2 Thin Film Surfaces Etched by Capacitively Coupled Radio Frequency Helium Plasmas von Kawakami, Retsuo, Takeichi, Atsushi, Niibe, Masahito, Inaoka, Takeshi, Tominaga, Kikuo

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Characteristics of TiO2 Thin Film Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasmas von Kawakami, Retsuo, Niibe, Masahito, Takeichi, Atsushi, Mori, Yuta, Konishi, Masashi, Kotaka, Takuya, Matsunaga, Fumihiko, Takasaki, Toshihide, Kitano, Takanori, Miyazaki, Takahiro, Inaoka, Takeshi, Tominaga, Kikuo

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Light emitting device and method of manufacturing the light emitting device von Takeichi, Atsushi

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Effect of Dielectric Barrier Discharge Air Plasma Treatment on TiO 2 Thin Film Surfaces von Kawakami, Retsuo, Niibe, Masahito, Fukudome, Toshiaki, Takeichi, Atsushi, Inaoka, Takeshi, Tominaga, Kikuo

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Characteristics of TiO 2 Thin Film Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasmas von Kawakami, Retsuo, Niibe, Masahito, Takeichi, Atsushi, Mori, Yuta, Konishi, Masashi, Kotaka, Takuya, Matsunaga, Fumihiko, Takasaki, Toshihide, Kitano, Takanori, Miyazaki, Takahiro, Inaoka, Takeshi, Tominaga, Kikuo

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Etch damage characteristics of TiO sub(2) thin films by capacitively coupled RF Ar plasmas von Kawakami, Retsuo, Tominaga, Kikuo, Okada, Kenji, Nouda, Takahiro, Inaoka, Takeshi, Takeichi, Atsushi, Fukudome, Toshiaki, Murao, Kenichi

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Effect of Dielectric Barrier Discharge Air Plasma Treatment on TiO 2 Thin Film Surfaces von Kawakami, Retsuo, Niibe, Masahito, Fukudome, Toshiaki, Takeichi, Atsushi, Inaoka, Takeshi, Tominaga, Kikuo

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Etch damage characteristics of TiO 2 thin films by capacitively coupled RF Ar plasmas von Kawakami, Retsuo, Tominaga, Kikuo, Okada, Kenji, Nouda, Takahiro, Inaoka, Takeshi, Takeichi, Atsushi, Fukudome, Toshiaki, Murao, Kenichi

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Characteristics of TiO 2 Thin Film Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasmas von Kawakami, Retsuo, Niibe, Masahito, Takeichi, Atsushi, Mori, Yuta, Konishi, Masashi, Kotaka, Takuya, Matsunaga, Fumihiko, Takasaki, Toshihide, Kitano, Takanori, Miyazaki, Takahiro, Inaoka, Takeshi, Tominaga, Kikuo

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LIGHT EMITTING DEVICE AND METHOD OF MANUFACTURING THE LIGHT EMITTING DEVICE von TAKEICHI Atsushi

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Method of manufacturing light-emitting device and wiring substrate for light-emitting element von MORIWAKI TOSHIAKI, TAKEUCHI YOSHIKAZU, TANI TAKAHIRO, TAKEICHI ATSUSHI

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METHOD OF MANUFACTURING LIGHT-EMITTING DEVICE AND WIRING SUBSTRATE FOR LIGHT-EMITTING ELEMENT von MORIWAKI TOSHIAKI, TAKEUCHI YOSHIKAZU, TANI TAKAHIRO, TAKEICHI ATSUSHI

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