Generation and Carbonyl Addition Reactions of Dibromofluoromethyllithium Derived from Tribromofluoromethane as Applied to the Stereoselective Synthesis of Fluoro Olefins and 2-Brom... von Shimizu, Masaki, Yamada, Nobuko, Takebe, Yoko, Hata, Takeshi, Kuroboshi, Manabu, Hiyama, Tamejiro

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Novel Wafer Bevel Treatment for Water Immersion Lithography von Terai, Mamoru, Ishibashi, Takeo, Hagiwara, Takuya, Hanna, Tetsuro, Kumada, Teruhiko, Takebe, Yoko, Yokokoji, Osamu, Fujiwara, Tomoharu, Jiang, Jianhai, Niwa, Takafumi, Wakamizu, Shinya, Kyouda, Hideharu

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Development of Novel Materials for 193-nm Dry and Immersion Lithography von Sasaki, Takashi, Shirota, Naoko, Wang, Shu-Zhong, Takebe, Yoko, Yokokoji, Osamu

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A New Monocyclic Fluoropolymer for 157-nm Photoresists von Sasaki, Takashi, Takebe, Yoko, eda, Masataka, Yokokoji, Osamu, Irie, Shigeo, Otoguro, Akihito, Fujii, Kiyoshi, Itani, Toshio

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Stereoselective synthesis of (E)-ArCFCFR and (E)-ArCHCFR from ArCH(OH)CFBr2 von Kuroboshi, Manabu, Yamada, Nobuko, Takebe, Yoko, Hiyama, Tamejiro

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Generation and Carbonyl Addition of Dibromofluoromethyllithium von Kuroboshi, Manabu, Yamada, Nobuko, Takebe, Yoko, Hiyama, Tamejiro

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157-nm Single-Layer Resists Based on Main-Chain-Fluorinated Polymers von Irie, Shigeo, Ishikawa, Seiichi, Hagiwara, Takuya, Yamazaki, Tamio, Furukawa, Takamitsu, Itani, Toshiro, Kawaguchi, Yasuhide, Kodama, Syun-ichi, Yokokoji, Osamu, Kaneko, Isamu, Takebe, Yoko, Okada, Shinji

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PELLICLE FOR LITHOGRAPHY, PELLICLE-MOUNTED PHOTOMASK, AND EXPOSURE TREATMENT METHOD von TAKEBE, YOKO

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Development of new resist materials for 193-nm dry and immersion lithography von Takebe, Yoko, Sasaki, Takashi, Shirota, Naoko, Yokokoji, Osamu

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Pellicle for lithography, pellicle-mounted photomask, and exposure treatment method von TAKEBE YOKO

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PELLICLE FOR LITHOGRAPHY, PHOTOMASK FITTED WITH PELLICLE AND EXPOSURE METHOD von TAKEBE, YOKO

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PELLICLE FOR LITHOGRAPHY, PELLICLE-MOUNTED PHOTOMASK, AND EXPOSURE TREATMENT METHOD von TAKEBE, YOKO

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PELLICLE FOR LITHOGRAPHY, PELLICLE-MOUNTED PHOTOMASK, AND EXPOSURE TREATMENT METHOD von TAKEBE YOKO

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TWI519889B von TAKEBE, YOKO

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FLUORINE-CONTAINING COMPOUNDS AND POLYMERS AND PROCESSES FOR PRODUCING THE SAME von TAKEBE, YOKO, KANEKO, ISAMU

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Diastereoselective generation of lithium carbenoid reagent RCH(OMEM)CFBrLi and its reaction with electrophiles von Shimizu, Masaki, Takebe, Yoko, Kuroboshi, Manabu, Hiyama, Tamejiro

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COATING MATERIAL COMPOSITION FOR LIQUID IMMERSION EXPOSURE APPARATUS, LAMINATE, METHOD FOR FORMING LAMINATE, AND LIQUID IMMERSION EXPOSURE APPARATUS von YOKOKOJI OSAMU, TAKEBE YOKO

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LIQUID-REPELLENT TREATMENT COMPOSITION FOR IMMERSION EXPOSURE APPARATUS, LIQUID-REPELLENT TREATMENT METHOD FOR IMMERSION EXPOSURE APPARATUS, LIQUID-REPELLENT TREATMENT COMPOSITION... von YOKOKOJI OSAMU, TAKEBE YOKO

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COATING MATERIAL COMPOSITION FOR LIQUID IMMERSION EXPOSURE APPARATUS, LAMINATE, METHOD FOR FORMING LAMINATE, AND LIQUID IMMERSION EXPOSURE APPARATUS von YOKOKOJI OSAMU, TAKEBE YOKO

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Pellicle for lithography, photomask fitted with pellicle and exposure method von TAKEBE YOKO

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