スパッタリングプロセスにおける静的圧力分布，および動的圧力変化の実測 von 田尻, 修一, 大西, 孝則, 岡野, 夕紀子, 小川, 倉一, 美馬, 宏司

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Measurement of Steady State Pressure Distribution and Dynamic Pressure Fluctuations During Sputtering Process von TAJIRI, Shuichi, ONISHI, Takanori, OKANO, Yukiko, OGAWA, Soichi, MIMA, Hiroshi

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Deposition of Ni thin film on polyimide film (2) von Okano, Yukiko, Tajiri, Shuichi, Onishi, Takanori, Ogawa, Soichi, Mima, Hiroshi

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Pressure distribution and dynamic pressure measurement of sputtering system von Tajiri, Shuichi, Onishi, Takanori, Okano, Yukiko, Ogawa, Soichi, Mima, Hiroshi

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Deposition of TaAl-N Thin Film with Ta-Al Composite Target by Reactive Sputtering von OKANO, Yukiko, TAJIRI, Shuichi, AOZONO, Takashi, OKAMOTO, Akio, OGAWA, Soichi, MIMA, Hiroshi

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Heat Transfer Coefficient in Three-Phase Vertical Downflows of Gas–Liquid–Fine Solid Particles System von Hatate, Yasuo, Tajiri, Shuichi, Fukumoto, Takashi, Uemura, Yoshimitsu, Hano, Tadashi

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HEAT TRANSFER COEFFICIENT IN THREE-PHASE VERTICAL UPFLOWS OF GAS-LIQUID-FINE SOLID PARTICLES SYSTEM von HATATE, YASUO, TAJIRI, SHUICHI, FUJITA, TAKANORI, FUKUMOTO, TAKASHI, IKARI, ATSUSHI, HANO, TADASHI

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GAS HOLDUP AND PRESSURE DROP IN THREE-PHASE HORIZONTAL FLOWS OF GAS-LIQUID-FINE SOLID PARTICLES SYSTEM von HATATE, YASUO, NOMURA, HIROSHI, FUJITA, TAKANORI, TAJIRI, SHUICHI, IKARI, ATSUSHI

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GAS HOLDUP AND PRESSURE DROP IN THREE-PHASE VERTICAL FLOWS OF GAS-LIQUID-FINE SOLID PARTICLES SYSTEM von HATATE, YASUO, NOMURA, HIROSHI, FUJITA, TAKANORI, TAJIRI, SHUICHI, HIDAKA, NOBUYUKI, IKARI, ATSUSHI

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Deposition of TaAl-N Thin Film with Ta-Al Composite Target by Reactive Sputtering von OKANO, Yukiko, TAJIRI, Shuichi, AOZONO, Takashi, OKAMOTO, Akio, OGAWA, Soichi, MIMA, Hiroshi

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TaAl-N Thin Film Prepared by Radio Frequency and Direct Current Reactive Sputtering von OKANO, Yukiko, TAJIRI, Shuichi, AOZONO, Takashi, OKAMOTO, Akio, OGAWA, Soichi, MIMA, Hiroshi

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Ta-Al 複合ターゲットを用いた反応性スパッタ法による窒化物薄膜の形成 von 岡野, 夕紀子, 田尻, 修一, 青園, 隆司, 岡本, 昭夫, 小川, 倉一, 美馬, 宏司

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HEAT-CONDUCTING MOISTURE METER von AOZONO TAKASHI, OKANO YUKIKO, MIMA KOJI, OGAWA SOICHI, TAJIRI SHUICHI

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ポリイミドフィルム基板上へのNi薄膜の形成(2) von 岡野, 夕紀子, 田尻, 修一, 大西, 孝則, 小川, 倉一, 美馬, 宏司

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HEAT CONDUCTION TYPE SENSOR von OKANO YUKIKO, MIMA KOJI, OGAWA SOICHI, ONISHI TAKANORI, TAJIRI SHUICHI

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PRESSURE MEASURING SYSTEM USING HEAT CONDUCTION TYPE SENSOR AND PRESSURE MEASURING METHOD von OKANO YUKIKO, MIMA KOJI, OGAWA SOICHI, ONISHI TAKANORI, TAJIRI SHUICHI

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MICRO PRESSURE SENSOR von AOZONO TAKASHI, OKANO YUKIKO, MIMA KOJI, OGAWA SOICHI, OKAMOTO AKIO, TAJIRI SHUICHI

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VACUUM ENVIRONMENT MEASUREMENT CONTROL SYSTEM von AOZONO TAKASHI, OKANO YUKIKO, MIMA KOJI, OGAWA SOICHI, OKAMOTO AKIO, TAJIRI SHUICHI

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Fabrication of High TCR TaAl-N Thin Film by Reactive Sputtering Method von OKANO, Yukiko, TAJIRI, Shuichi, AOZONO, Takashi, OKAMOTO, Akio, OGAWA, Soichi, MIMA, Hiroshi

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Deposition of TaAl-N Thin Film on the Polyimide Film —Discussion for the New Vacuum Sensor in a Wide Range von OKANO, Yukiko, TAJIRI, Shuichi, AOZONO, Takashi, OKAMOTO, Akio, OGAWA, Soichi, MIMA, Hiroshi

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