Study on mechanism of crystallization in HfO2 films on Si substrates by in-depth profile analysis using photoemission spectroscopy von Toyoda, Satoshi, Takahashi, Haruhiko, Kumigashira, Hiroshi, Oshima, Masaharu, Lee, Dong-Ick, Sun, Shiyu, Liu, Zhi, Sun, Yun, Pianetta, Piero A., Oshiyama, Itaru, Tai, Kaori, Fukuda, Seiichi

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Band-Edge High-Performance Metal-Gate/High- \kappa nMOSFET Using \hbox\hbox/\hbox Stack von Ando, T., Hirano, T., Tai, K., Yamaguchi, S., Yoshida, S., Iwamoto, H., Kadomura, S., Watanabe, H.

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Low Threshold Voltage and High Mobility N-Channel Metal--Oxide--Semiconductor Field-Effect Transistor Using Hf--Si/HfO2 Gate Stack Fabricated by Gate-Last Process von Ando, Takashi, Hirano, Tomoyuki, Tai, Kaori, Yamaguchi, Shinpei, Yoshida, Shinichi, Iwamoto, Hayato, Kadomura, Shingo, Watanabe, Heiji

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1-A-D-7. Determining echo intensity by comparison with control muscles von Matsumoto, Shinichi, Tai, Kaori, Ichimaru, Kanako, Takahashi, Masatoshi, Takamatsu, Naoko

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Threshold Voltage Modulation Technique using Fluorine Treatment through Atomic Layer Deposition TiN Suitable for Complementary Metal–Oxide–Semiconductor Devices von Tai, Kaori, Yamaguchi, Shinpei, Tanaka, Kazuki, Hirano, Tomoyuki, Oshiyama, Itaru, Kazi, Salam, Ando, Takashi, Nakata, Masashi, Yamanaka, Mayumi, Yamamoto, Ryo, Kanda, Sayuri, Tateshita, Yasushi, Wakabayashi, Hitoshi, Tagawa, Yukio, Tukamoto, Masanori, Iwamoto, Hayato, Saito, Masaki, Nagashima, Naoki, Kadomura, Shingo

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Examination of echo intensity by comparison with control muscle von MATSUMOTO, Shinichi, TAI, Kaori, ICHIMARU, Kanako, TAKAHASHI, Masatoshi, TAKAMATSU, Naoko

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Band-Edge High-Performance Metal-Gate/High-κ nMOSFET Using Hf-Si /HfO2 Stack von ANDO, Takashi, HIRANO, Tomoyuki, TAI, Kaori, YAMAGUCHI, Shinpei, YOSHIDA, Shinichi, IWAMOTO, Hayato, KADOMURA, Shingo, WATANABE, Heiji

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High-Performance Metal/High- k n- and p-MOSFETs With Top-Cut Dual Stress Liners Using Gate-Last Damascene Process on (100) Substrates von Mayuzumi, S., Yamakawa, S., Tateshita, Y., Hirano, T., Nakata, M., Yamaguchi, S., Tai, K., Wakabayashi, H., Tsukamoto, M., Nagashima, N.

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Study on mechanism of crystallization in HfO 2 films on Si substratesby in-depth profile analysis using photoemission spectroscopy von Toyoda, Satoshi, Takahashi, Haruhiko, Kumigashira, Hiroshi, Oshima, Masaharu, Lee, Dong-Ick, Sun, Shiyu, Liu, Zhi, Sun, Yun, Pianetta, Piero A., Oshiyama, Itaru, Tai, Kaori, Fukuda, Seiichi

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Photoreflectance Study of Interface Roughness in Ge/SiGe Strained-Layer Heterostructures von Hiroyuki Yaguchi, Hiroyuki Yaguchi, Kaori Tai, Kaori Tai, Keizo Takemasa, Keizo Takemasa, Kentaro Onabe, Kentaro Onabe, Yasuhiro Shiraki, Yasuhiro Shiraki, Ryoichi Ito, Ryoichi Ito

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Low Threshold Voltage and High Mobility N-Channel Metal–Oxide–Semiconductor Field-Effect Transistor Using Hf–Si/HfO 2 Gate Stack Fabricated by Gate-Last Process von Ando, Takashi, Hirano, Tomoyuki, Tai, Kaori, Yamaguchi, Shinpei, Yoshida, Shinichi, Iwamoto, Hayato, Kadomura, Shingo, Watanabe, Heiji

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Examination of echo intensity by comparison with control muscle von MATSUMOTO, Shinichi, TAI, Kaori, ICHIMARU, Kanako, TAKAHASHI, Masatoshi, TAKAMATSU, Naoko

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O-6-3 Examination of the echo intensity by comparing control muscle von Shinichi Matsumoto, Kaori Tai, Kanako Ichimaru, Masatoshi Takahashi, Naoko Takamatsu

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Mechanism of Carrier Mobility Degradation Induced by Crystallization of HfO 2 Gate Dielectrics von Ando, Takashi, Shimura, Takayoshi, Watanabe, Heiji, Hirano, Tomoyuki, Yoshida, Shinichi, Tai, Kaori, Yamaguchi, Shinpei, Iwamoto, Hayato, Kadomura, Shingo, Toyoda, Satoshi, Kumigashira, Hiroshi, Oshima, Masaharu

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O-7-4 Ultrasonography of muscles is useful for diagnosis of drop-head syndrome due to isolated myositis of neck extensor: a case report von Mayuko Izumi, Masatoshi Takahashi, Naoko Takamatu, Kaori Tai, Kanako Ichimaru, Shinichi Matsumoto

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P-6-4 Examination of the echo intensity by musculoskeletal ultrasound von Shinichi Matsumoto, Kaori Tai, Mayuko Izumi, Naoko Takamatsu, Kanako Ichimaru, Masatoshi Takahashi

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O-7-3 Examination of the echo intensity in a myositis von Kaori Tai, Masatoshi Takahashi, Mayuko Izumi, Naoko Takamatsu, Kanako Ichimaru, Shinichi Matsumoto

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Application of HfSiON to Deep-Trench Capacitors of Sub-45-nm-Node Embedded Dynamic Random-Access Memory von Ando, Takashi, Sato, Naoyuki, Hiyama, Susumu, Hirano, Tomoyuki, Nagaoka, Kojiro, Abe, Hitoshi, Okuyama, Atsushi, Ugajin, Hajime, Tai, Kaori, Fujita, Shigeru, Watanabe, Koji, Katsumata, Ryota, Idebuchi, Jun, Suzuki, Takashi, Hasegawa, Toshiaki, Iwamoto, Hayato, Kadomura, Shingo

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Tinv Scaling and Gate Leakage Reduction for n-Type Metal Oxide Semiconductor Field Effect Transistor with HfSi x /HfO 2 Gate Stack by Interfacial Layer Formation Using Ozone–Water-... von Oshiyama, Itaru, Tai, Kaori, Hirano, Tomoyuki, Yamaguchi, Shinpei, Tanaka, Kazuaki, Hagimoto, Yoshiya, Uemura, Takayuki, Ando, Takashi, Watanabe, Koji, Yamamoto, Ryo, Kanda, Saori, Wang, Junli, Tateshita, Yasushi, Wakabayashi, Hitoshi, Tagawa, Yukio, Tsukamoto, Masanori, Iwamoto, Hayato, Saito, Masaki, Oshima, Masaharu, Toyoda, Satoshi, Nagashima, Naoki, Kadomura, Shingo

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P2-2 Examination of the myositis by musculoskeletal ultrasound von Kaori Tai, Shinichi Matsumoto, Kanako Ichimaru, Nobuhiko Okada, Sho Sendo, Goh Tsuji, Masahiro Motoki, Naoko Takamatsu, Shunichi Kumagai

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