Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering von Jäger, S., Szyszka, B., Szczyrbowski, J., Bräuer, G.

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Low emissivity coatings on architectural glass von Schaefer, C., Bräuer, G., Szczyrbowski, J.

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Some properties of TiO2 layers prepared by medium frequency reactive sputtering von SZCZYRBOWSKI, J, BRÄUER, G, RUSKE, M, BARTELLA, J, SCHROEDER, J, ZMELTY, A

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New low emissivity coating based on TwinMag® sputtered TiO2 and Si3N4 layers von SZCZYRBOWSKI, J, BRÄUER, G, RUSKE, M, SCHILLING, H, ZMELTY, A

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Mid frequency sputtering — a novel tool for large area coating von Bräuer, G., Szczyrbowski, J., Teschner, G.

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Antireflective coatings on large scale substrates produced by reactive twin-magnetron sputtering von Szczyrbowski, J., Bräuer, G., Teschner, G., Zmelty, A.

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Properties of SnO2 films prepared by DC and MF reactive sputtering von RUSKE, M, BRÄUER, G, PISTNER, J, PFÄFFLIN, U, SZCZYRBOWSKI, J

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Large-scale antireflective coatings on glass produced by reactive magnetron sputtering von Szczyrbowski, J., Bräuer, G., Teschner, G., Zmelty, A.

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New approaches for reactive sputtering of dielectric materials on large scale substrates von Bräuer, G., Szczyrbowski, J., Teschner, G.

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Some properties of TiO2-layers prepared by mid-frequency and dc reactive magnetron sputtering von Szczyrbowski, J., Bräuer, G., Ruske, M., Teschner, G., Zmelty, A.

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TwinMag II: attempts to improve an excellent sputter tool von Heister, U, Krempel-Hesse, J, Szczyrbowski, J, Teschner, G, Bruch, J, Braeuer, G

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Properties of SiO2 and Si3N4 layers deposited by MF twin magnetron sputtering using different target materials von RUSKE, M, BRÄUER, G, PISTNER, J, SZCZYRBOWSKI, J, WEIGERT, M

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Mid frequency sputtering with TwinMag ®-a survey of recent results von Bräuer, G, Ruske, M, Szczyrbowski, J, Teschner, G, Zmelty, A

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New low emissivity coating based on TwinMag ® sputtered TiO 2 and Si 3 N 4 layers von Szczyrbowski, J., Bräuer, G., Ruske, M., Schilling, H., Zmelty, A.

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A new simple method of determining the effective mass of an electron or the thickness of thin metal films von Szczyrbowski, J

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Reactive sputtering of dielectric layers on large scale substrates using an AC twin magnetron cathode von Szczyrbowski, J., Bräuer, G., Dicken, W., Scherer, M., Maa, W., Teschner, G., Zmelty, A.

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The Exponential Shape of the Optical Absorption Edge Tail von Szczyrbowski, J.

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Determination of optical constants of real thin films von Szczyrbowski, J

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TwinMag II: Improving an advanced sputtering tool von Heister, U, Krempel-Hesse, J, Szczyrbowski, J, Teschner, G, Bruch, J, Bräuer, G

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Properties of Si3N4-Layers Deposited by Medium Frequency Twin Magnetron Sputtering von Ruske, M., Szczyrbowski, J., Bräuer, G., Pistner, J., Zmelty, A.

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