Secular trends in dietary energy, carbohydrate, protein and fat intake among Korean children and adolescents von Sung, Da-In, Kwon, Yu-Jin, Heo, Seok-Jae, Lee, Ji-Won

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Association among Premenstrual Syndrome, Dietary Patterns, and Adherence to Mediterranean Diet von Kwon, Yu-Jin, Sung, Da-In, Lee, Ji-Won

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Augmented Decision-Making in wound Care: Evaluating the clinical utility of a Deep-Learning model for pressure injury staging von Kim, Jemin, Lee, Changyoon, Choi, Sungchul, Sung, Da-In, Seo, Jeonga, Na Lee, Yun, Hee Lee, Joo, Jin Han, Eun, Young Kim, Ah, Suk Park, Hyun, Jeong Jung, Hye, Hoon Kim, Jong, Hee Lee, Ju

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Fabrication of high-performance graphene nanoplatelet-based transparent electrodes via self-interlayer-exfoliation control von Oh, Jong Sik, Oh, Ji Soo, Sung, Da In, Yeom, Geun Young

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Biocompatible Co-organic Composite Thin Film Deposited by VHF Plasma-Enhanced Atomic Layer Deposition at a Low Temperature von Yeom, Won Kyun, Lee, Jin Woong, Bae, Jin-A, Sung, Da In, Kim, Taeyeop, Lee, Jung Heon, Yeom, Geun Young

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Characteristics of clean SiO2 atomic layer etching based on C6F6 physisorption von Sung, Da In, Tak, Hyun Woo, Kim, Hee Ju, Kim, Dong Woo, Yeom, Geun Young

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Highly oxidation-resistant silver nanowires by CxFy polymers using plasma treatment von Yang, Kyung Chae, Sung, Da In, Shin, Ye Ji, Yeom, Geun Young

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Highly oxidation-resistant silver nanowires by C x F y polymers using plasma treatment von Yang, Kyung Chae, Sung, Da In, Shin, Ye Ji, Yeom, Geun Young

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Fabrication of high-performance graphene nanoplatelet-based transparent electrodes via self-interlayer-exfoliation controlElectronic supplementary information (ESI) available. See... von Oh, Jong Sik, Oh, Ji Soo, Sung, Da In, Yeom, Geun Young

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A comparative study of C x ( x = 4, 5, 7)F 8 plasmas for dry etch processing von Sung, Da In, Tak, Hyun Woo, Kim, Dong Woo, Yeom, Geun Young

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A comparative study of C x (x = 4, 5, 7)F8 plasmas for dry etch processing von Sung, Da In, Tak, Hyun Woo, Kim, Dong Woo, Yeom, Geun Young

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A comparative study of Cx(x = 4, 5, 7)F8 plasmas for dry etch processing von Sung, Da In, Tak, Hyun Woo, Kim, Dong Woo, Yeom, Geun Young

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METHOD FOR PROVIDING INFORMATION ABOUT DECUBITUS AND DEVICE USING SAME von KIM, Je Min, SUNG, Da In, CHOI, Sung Chul, SEO, Jeong A, LEE, Ju Hee, LEE, Chang Yoon

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ETCHING PROCESSING APPARATUS AND ETCHING PROCESSING METHOD von KIM, Dong Woo, TAK, Hyun Woo, SUNG, Da In, YEOM, Geun Young, OH, Ji Young, KIM, Kyong Nam

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ETCHING PROCESSING APPARATUS AND ETCHING PROCESSING METHOD von KIM, Dong Woo, TAK, Hyun Woo, SUNG, Da In, YEOM, Geun Young, OH, Ji Young, KIM, Kyong Nam

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ETCHING PROCESSING APPARATUS AND ETCHING PROCESSING METHOD von KIM, Dong Woo, TAK, Hyun Woo, SUNG, Da In, YEOM, Geun Young, OH, Ji Young, KIM, Kyong Nam

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Apparatus for generating plasma and apparatus for treating substrate having the same von Sung, Da In, Yeom, Geun Young, Shin, Ye Ji, Yang, Kyung Chae, Tak, Hyun Woo

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APPARATUS FOR GENERATING PLASMA AND APPARATUS FOR TREATING SUBSTRATE HAVING THE SAME von SHIN, Ye Ji, YANG, Kyung Chae, SUNG, Da In, YEOM, Geun Young, Tak, Hyun Woo

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Ion beam etching apparatus von Sung, Da In, Lee, Won Oh, Yeom, Geun Young, Mun, Mu Kyeom, Yang, Kyung Chae, Park, Jin Woo, Kim, Ki Hyun, Kim, Doo San, Oh, Ji Soo, Oh, Jong Sik, Ji, You Jin, Kim, Ki Seok

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ION BEAM ETCHING APPARATUS von YANG, Kyung Chae, OH, Jong Sik, MUN, Mu Kyeom, SUNG, Da In, KIM, Ki Seok, YEOM, Geun Young, OH, Ji Soo, LEE, Won Oh, KIM, Ki Hyun, PARK, Jin Woo, KIM, Doo San, JI, You Jin

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