Controlling Subnanometer Gaps in Plasmonic Dimers Using Graphene von Mertens, Jan, Eiden, Anna L, Sigle, Daniel O, Huang, Fumin, Lombardo, Antonio, Sun, Zhipei, Sundaram, Ravi S, Colli, Alan, Tserkezis, Christos, Aizpurua, Javier, Milana, Silvia, Ferrari, Andrea C, Baumberg, Jeremy J

Volltext

Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology von Sharma, Akhil, Verheijen, Marcel A, Wu, Longfei, Karwal, Saurabh, Vandalon, Vincent, Knoops, Harm C M, Sundaram, Ravi S, Hofmann, Jan P, W M M (Erwin) Kessels, Bol, Ageeth A

Volltext

Chemical Vapor Deposition Repair of Graphene Oxide: A Route to Highly-Conductive Graphene Monolayers von López, Vicente, Sundaram, Ravi S., Gómez-Navarro, Cristina, Olea, David, Burghard, Marko, Gómez-Herrero, Julio, Zamora, Félix, Kern, Klaus

Volltext

The Graphene–Gold Interface and Its Implications for Nanoelectronics von Sundaram, Ravi S, Steiner, Mathias, Chiu, Hsin-Ying, Engel, Michael, Bol, Ageeth A, Krupke, Ralph, Burghard, Marko, Kern, Klaus, Avouris, Phaedon

Volltext

Raman and Photocurrent Imaging of Electrical Stress-Induced p–n Junctions in Graphene von Rao, Gayathri, Freitag, Marcus, Chiu, Hsin-Ying, Sundaram, Ravi S, Avouris, Phaedon

Volltext

Atomic Structure of Reduced Graphene Oxide von Gómez-Navarro, Cristina, Meyer, Jannik C, Sundaram, Ravi S, Chuvilin, Andrey, Kurasch, Simon, Burghard, Marko, Kern, Klaus, Kaiser, Ute

Volltext

Electrical Conduction Mechanism in Chemically Derived Graphene Monolayers von Kaiser, Alan B, Gómez-Navarro, Cristina, Sundaram, Ravi S, Burghard, Marko, Kern, Klaus

Volltext

A Raman metrology approach to quality control of 2D MoS2 film fabrication von Mercado, Elisha, Goodyear, Andy, Moffat, Jonathan, Cooke, Mike, Sundaram, Ravi S

Volltext

Graphene nanoribbon blends with P3HT for organic electronics von El Gemayel, Mirella, Narita, Akimitsu, Dössel, Lukas F, Sundaram, Ravi S, Kiersnowski, Adam, Pisula, Wojciech, Hansen, Michael Ryan, Ferrari, Andrea C, Orgiu, Emanuele, Feng, Xinliang, Müllen, Klaus, Samorì, Paolo

Volltext

Graphene Monolayers: Chemical Vapor Deposition Repair of Graphene Oxide: A Route to Highly-Conductive Graphene Monolayers (Adv. Mater. 46/2009) von López, Vicente, Sundaram, Ravi S., Gómez-Navarro, Cristina, Olea, David, Burghard, Marko, Gómez-Herrero, Julio, Zamora, Félix, Kern, Klaus

Volltext

Spatially Resolved Electrostatic Potential and Photocurrent Generation in Carbon Nanotube Array Devices von Engel, Michael, Steiner, Mathias, Sundaram, Ravi S, Krupke, Ralph, Green, Alexander A, Hersam, Mark C, Avouris, Phaedon

Volltext

Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS 2 : large area, thickness control and tuneable morphology von Sharma, Akhil, Verheijen, Marcel A, Wu, Longfei, Karwal, Saurabh, Vandalon, Vincent, Knoops, Harm C M, Sundaram, Ravi S, Hofmann, Jan P, Kessels, W M M Erwin, Bol, Ageeth A

Volltext

Geotechnics for Transportation Infrastructure: Recent Developments, Upcoming Technologies and New Concepts, Volume 2 von Sundaram, Ravi, Shahu, Jagdish Telangrao, Havanagi, Vasant

Volltext

Geotechnics for Transportation Infrastructure: Recent Developments, Upcoming Technologies and New Concepts, Volume 1 von Sundaram, Ravi, Shahu, Jagdish Telangrao, Havanagi, Vasant

Volltext

Geotechnics for transportation infrastructure.: recent developments, upcoming technologies and new concepts von Sundaram, Ravi, Shahu, Jagdish Telangrao, Havanagi, Vasant

Volltext

Geotechnics for transportation infrastructure: recent developments, upcoming technologies and new concepts von Sundaram, Ravi, Shahu, Jagdish Telangrao, Havanagi, Vasant

Volltext

A Raman metrology approach to quality control of 2D MoS 2 film fabrication von Mercado, Elisha, Goodyear, Andy, Moffat, Jonathan, Cooke, Mike, Sundaram, Ravi S

Volltext

Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphologyElectronic supplementary information (ESI) available: Addi... von Sharma, Akhil, Verheijen, Marcel A, Wu, Longfei, Karwal, Saurabh, Vandalon, Vincent, Knoops, Harm C. M, Sundaram, Ravi S, Hofmann, Jan P, Kessels, W. M. M. (Erwin), Bol, Ageeth A

Volltext

Plasma‐Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer von Canto, Bárbara, Otto, Martin, Powell, Michael J., Babenko, Vitaliy, O'Mahony, Aileen, Knoops, Harm C. M., Sundaram, Ravi S., Hofmann, Stephan, Lemme, Max C., Neumaier, Daniel

Volltext

Plasma‐Enhanced Atomic Layer Deposition of Al 2 O 3 on Graphene Using Monolayer hBN as Interfacial Layer von Canto, Bárbara, Otto, Martin, Powell, Michael J., Babenko, Vitaliy, O'Mahony, Aileen, Knoops, Harm C. M., Sundaram, Ravi S., Hofmann, Stephan, Lemme, Max C., Neumaier, Daniel

Volltext