Diamond-like carbon film deposition by super-wide electron-cyclotron resonance plasma source excited by traveling microwave von ISHII, A, SAKAGUCHI, Y, MINOMO, S, TANIGUCHI, M, SUGIYO, M, KOBAYASHI, T

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Effects of oxygen addition on diamond film growth by electron-cyclotron-resonance microwave plasma CVD apparatus von NUNOTANI, M, KOMORI, M, YAMASAWA, M, FUJIWARA, Y, SAKUTA, K, KOBAYASHI, T, NAKASHIMA, S, MINOMO, S, TANIGUCHI, M, SUGIYO, M

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Effect of oxygen additive on microwave plasma for diamond film synthesis studied by the plasma impedance measurement von MIYAKE, H, SUGAHARA, K.-I, KOBAYASHI, T, KONDO, K, TANIGUCHI, M, SUGIYO, M

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Preparation of As-grown BiPbSrCaCuO thin films by electron-cyclotron-resonance microwave plasma sputtering von NISHIMORI, Y, MINOMO, S, TANIGUCHI, M, SUGIYO, M, FUKUMOTO, Y, FUJIWARA, Y, KOBAYASHI, T

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Role of xenon additive in microwave plasma-assisted (H2+CH4) chemical vapor deposition of diamond thin film von Hosomi, Takeshi, Maki, Tetsuro, Kobayashi, Takeshi, Yoshizako, Yuji, Taniguchi, Michio, Sugiyo, Masato

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Electron-Cyclotron-Resonance Microwave Plasma Oxidation of Er 1 Ba 2 Cu 3 O y Superconductive Ceramics von Minomo, Shoichiro, Taniguchi, Michio, Ishida, Yuji, Sugiyo, Masato, Takahashi, Tetsuro, Tonouchi, Masayoshi, Kita, Sadamu, Kobayashi, Takeshi

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Plasma processing apparatus for generating uniform strip-shaped plasma von MINOMO, SYOICHIRO, TANIGUCHI, MICHIO, ISHII, AKIRA, SUGIYO, MASATO

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Plasma processing apparatus for generating uniform strip-shaped plasma by propagating microwave through rectangular slit von SUGIYO, MASATO, MINOMO, SYOICHIRO, TANIGUCHI, MICHIO, ISHII, AKIRA

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Plasma processing apparatus for generating uniform strip-shaped plasma von MINOMO, SYOICHIRO, TANIGUCHI, MICHIO, ISHII, AKIRA, SUGIYO, MASATO

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Electron-cyclotron-resonance microwave plasma oxidation of Er1Ba2Cu3Oy superconductive ceramics von MINOMO, S, TANIGUCHI, M, ISHIDA, Y, SUHIYO, M, TAKAHASHI, T, TONOUCHI, M, KITA, S, KOBAYASHI, T

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Plasmabearbeitungsgerät zur Erzeugung eines uniformen bandförmigen plasmas von MINOMO, SYOICHIRO, TAKATSUKI-SHI, OSAKA 569, JP, SUGIYO, MASATO, IZUMI-SHI, OSAKA 590-02, JP, TANIGUCHI, MICHIO, KOBE-SHI, HYOGO 651-12, JP, ISHII, AKIRA, AMAGASAKI-SHI, HYOGO 661, JP

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