Intrinsic charge trapping in amorphous oxide films: status and challenges von Strand, Jack, Kaviani, Moloud, Gao, David, El-Sayed, Al-Moatasem, Afanas'ev, Valeri V, Shluger, Alexander L

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On the Structure of Oxygen Deficient Amorphous Oxide Films von Strand, Jack, Shluger, Alexander L.

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Effect of electric field on defect generation and migration in HfO2 von Strand, Jack W, Cottom, Jonathon, Larcher, Luca, Shluger, Alexander L

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Mechanisms of Oxygen Vacancy Aggregation in SiO2 and HfO2 von Gao, David Z., Strand, Jack, Munde, Manveer S., Shluger, Alexander L.

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Properties of intrinsic point defects and dimers in hexagonal boron nitride von Strand, Jack, Larcher, Luca, Shluger, Alexander L

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Dielectric breakdown in HfO2 dielectrics: Using multiscale modeling to identify the critical physical processes involved in oxide degradation von Strand, Jack, La Torraca, Paolo, Padovani, Andrea, Larcher, Luca, Shluger, Alexander L.

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Role of local structure in the optical and electronic properties of oxygen vacancies in different crystal phases of Ga 2 O 3 von Kaewmeechai, Chaiyawat, Strand, Jack, Shluger, Alexander

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Defect creation in amorphous HfO2 facilitated by hole and electron injection von Strand, Jack, Kaviani, Moloud, Shluger, Alexander L.

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First principles calculations of optical properties for oxygen vacancies in binary metal oxides von Strand, Jack, Chulkov, Sergey K., Watkins, Matthew B., Shluger, Alexander L.

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Hole trapping in amorphous HfO2 and Al2O3 as a source of positive charging von Strand, Jack, Dicks, Oliver A., Kaviani, Moloud, Shluger, Alexander L.

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Electron emission from deep traps in HfO 2 under thermal and optical excitation von Izmailov, Roman, Strand, Jack, Ronchi, Nicolo', Shluger, Alexander, Afanas'ev, Valeri

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Electron emission from deep traps in HfO 2 under thermal and optical excitation von Izmailov, Roman, Strand, Jack, Ronchi, Nicolo, Shluger, Alexander, Afanas'ev, Valeri

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Defect creation in amorphous HfO^sub 2^ facilitated by hole and electron injection von Strand, Jack, Kaviani, Moloud, Shluger, Alexander L

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Intrinsic electron trapping in amorphous oxide von Strand, Jack, Kaviani, Moloud, Afanas'ev, Valeri V, Lisoni, Judit G, Shluger, Alexander L

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Deep electron and hole polarons and bipolarons in amorphous oxide von Kaviani, Moloud, Strand, Jack, Afanas'ev, Valery V., Shluger, Alexander L.

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Dielectric breakdown of oxide films in electronic devices von Padovani, Andrea, La Torraca, Paolo, Strand, Jack, Larcher, Luca, Shluger, Alexander L.

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Author Correction: Dielectric breakdown of oxide films in electronic devices von Padovani, Andrea, La Torraca, Paolo, Strand, Jack, Larcher, Luca, Shluger, Alexander L.

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Intrinsic charge trapping in amorphous oxide films: status and challenges von Strand, Jack, Kaviani, Moloud, Gao, David, El-Sayed, Al-Moatasem, Afanas'ev, Valeri V, Shluger, Alexander L

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Hole trapping in amorphous HfO^sub 2^ and Al^sub 2^O^sub 3^ as a source of positive charging von Strand, Jack, Dicks, Oliver A, Kaviani, Moloud, Shluger, Alexander L

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Effect of electric field on defect generation and migration in HfO 2 von Strand, Jack W., Cottom, Jonathon, Larcher, Luca, Shluger, Alexander L.

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