Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features von Dallorto, Stefano, Staaks, Daniel, Schwartzberg, Adam, Yang, XiaoMin, Lee, Kim Y, Rangelow, Ivo W, Cabrini, Stefano, Olynick, Deirdre L

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Pattern-generation and pattern-transfer for single-digit nano devices von Rangelow, Ivo W., Ahmad, Ahmad, Ivanov, Tzvetan, Kaestner, Marcus, Krivoshapkina, Yana, Angelov, Tihomir, Lenk, Steve, Lenk, Claudia, Ishchuk, Valentyn, Hofmann, Martin, Nechepurenko, Diana, Atanasov, Ivaylo, Volland, Burkhard, Guliyev, Elshad, Durrani, Zahid, Jones, Mervyn, Wang, Chen, Liu, Dixi, Reum, Alexander, Holz, Mathias, Nikolov, Nikolay, Majstrzyk, Wojciech, Gotszalk, Teodor, Staaks, Daniel, Dallorto, Stefano, Olynick, Deirdre L.

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Nanoimprint lithography guiding templates for advanced magnetic media fabrication von Staaks, Daniel, Hsu, Yautzong, Lee, Kim Y., Steiner, Philip L., Yu, Zhaoning, Wu, Jason J., Xiao, ShuaiGang, Yang, XiaoMin, Chang, Thomas Y.

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Temperature and oxygen concentration effects on anisotropy in chromium hard mask etching for nanoscale fabrication von Staaks, Daniel, Yu, Zhaoning, Dhuey, Scott D., Sassolini, Simone, Lee, Kim Y., Rangelow, Ivo W., Olynick, Deirdre L.

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Polymer-metal coating for high contrast SEM cross sections at the deep nanoscale von Staaks, Daniel, Olynick, Deirdre L, Rangelow, Ivo W, Altoe, M. Virginia P

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MASK ABSORBER LAYERS FOR EXTREME ULTRAVIOLET LITHOGRAPHY von Staaks, Daniel

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Low temperature dry etching of chromium towards control at sub-5 nm dimensions von Staaks, Daniel, Yang, XiaoMin, Lee, Kim Y, Dhuey, Scott D, Sassolini, Simone, Rangelow, Ivo W, Olynick, Deirdre L

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MASK ABSORBER LAYERS FOR EXTREME ULTRAVIOLET LITHOGRAPHY von STAAKS, Daniel

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On the reproducibility of meta-analyses: six practical recommendations von Lakens, Daniël, Hilgard, Joe, Staaks, Janneke

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