Specular spectroscopic scatterometry von Xinhui Niu, Jakatdar, N., Junwei Bao, Spanos, C.J.

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Modeling the electrical effects of metal dishing due to CMP for on-chip interconnect optimization von Runzi Chang, Yu Cao, Spanos, C.J.

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Gate Line Edge Roughness Model for Estimation of FinFET Performance Variability von Patel, K., Tsu-Jae King Liu, Spanos, C.J.

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Measurement and Analysis of Variability in 45 nm Strained-Si CMOS Technology von Liang-Teck Pang, Kun Qian, Spanos, C.J., Nikolic, B.

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Virtual Metrology Modeling for Plasma Etch Operations von Dekong Zeng, Spanos, C.J.

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Dishing-radius model of copper CMP dishing effects von Runzi Chang, Spanos, C.J.

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Circuit sensitivity to interconnect variation von Lin, Z., Spanos, C.J., Milor, L.S., Lin, Y.T.

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Control of photoresist properties: a Kalman filter based approach von Palmer, E., Wei Pen, Spanos, C.J.

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Statistical experimental design in plasma etch modeling von May, G.S., Huang, J., Spanos, C.J.

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A control system for photolithographic sequences von Sovarong Leang, Shang-Yi Ma, Thomson, J., Bombay, B.J., Spanos, C.J.

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A general equipment diagnostic system and its application on photolithographic sequences von Leang, S., Spanos, C.J.

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Physically Justifiable Die-Level Modeling of Spatial Variation in View of Systematic Across Wafer Variability von Lerong Cheng, Gupta, P, Spanos, C J, Kun Qian, Lei He

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A novel in-line automated metrology for photolithography von Leang, S., Spanos, C.J.

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Prediction of wafer state after plasma processing using real-time tool data von Lee, S.F., Spanos, C.J.

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Automated malfunction diagnosis of semiconductor fabrication equipment: a plasma etch application von May, G.S., Spanos, C.J.

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Wafer-grown heat flux sensor arrays for plasma etch processes von Freed, M., Kruger, M.V.P., Poolla, K., Spanos, C.J.

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Real-time furnace modeling and diagnostics von Jiangxin Wang, Spanos, C.J.

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Autonomous on-wafer sensors for process modeling, diagnosis, and control von Freed, M., Kruger, M., Spanos, C.J., Poolla, K.

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Statistical process control in semiconductor manufacturing von Spanos, C.J.

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Patterning tool characterization by causal variability decomposition von Crid Yu, Hua-Yu Liu, Spanos, C.J.

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