Antiadhesion considerations for UV nanoimprint lithography von Houle, F. A., Rettner, C. T., Miller, D. C., Sooriyakumaran, R.

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Characterization of Volatile Species Formed during Exposure of Photoresists to Ultraviolet Light von Houle, F. A, Deline, V. R, Truong, H, Sooriyakumaran, R

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Nanoimprint Materials Systems von Houle, F. A., Miller, D. C., Fornof, A., Trung, H., Raoux, S., Sooriyakumaran, R., Ito, H., Hart, M.

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Monomer Reactivities and Kinetics in Radical Copolymerization of Hydroxystyrene Derivatives and tert-Butyl (Meth)acrylate von Ito, Hiroshi, Dalby, Charlie, Pomerantz, Andrew, Sherwood, Mark, Sato, Rikiya, Sooriyakumaran, R, Guy, Kip, Breyta, Greg

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Fundamental Properties of Fluoroalcohol-Methacrylate Polymers for use in 193nm Lithography von Allen, A. D., Breyta, G., Brock, P, DiPietro, R., Sanders, D., Sooriyakumaran, R., Sundberg, L. K.

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Transfer etching of bilayer resists in oxygen-based plasmas von Mahorowala, A. P., Babich, K., Lin, Q., Medeiros, D. R., Petrillo, K., Simons, J., Angelopoulos, M., Sooriyakumaran, R., Hofer, D., Reynolds, G. W., Taylor, J. W.

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Novel thin film composite membrane containing ionizable hydrophobes: pH-dependent reverse osmosis behavior and improved chlorine resistance von La, Young-Hye, Sooriyakumaran, Ratnam, Miller, Dolores C., Fujiwara, Masaki, Terui, Yoshiharu, Yamanaka, Kazuhiro, McCloskey, Bryan D., Freeman, Benny D., Allen, Robert D.

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Fluoroalcohol-Methacrylate Resists for 193nm Lithography von Varanasi, P. R., Kwong, R. W., Khojasteh, M., Patel, K., Chen, K. J., Li, W., Lawson, M. C., Allen, R. D., Sooriyakumaran, R., Brock, P., Sundberg, L. K., Siezak, M., Dabbagh, G., Liu, Z., Nishiyama, Y., Chiba, T., Shimokawa, T.

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Alkoxy-substituted poly(diarylsilanes): thermochromism and solvatochromism von Miller, R. D, Sooriyakumaran, R

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Temperature dependence of the third-order nonlinear optical susceptibilities in polysilanes and polygermanes von BAUMERT, J.-C, BJORKLUND, G. C, JUNDT, D. H, JURICH, M. C, LOOSER, H, MILLER, R. D, RABOLT, J, SOORIYAKUMARAN, R, SWALEN, J. D, TWIEG, R. J

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Poly(di-n-pentylsilane). The spectral consequences of a helical conformation in the solid state von Miller, R. D, Farmer, B. L, Fleming, W, Sooriyakumaran, R, Rabolt, J

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ANNEALING CONCEPT FOR THE DESIGN OF ENVIRONMENTALLY STABLE CHEMICAL AMPLIFICATION RESISTS von ITO, Hiroshi, BREYTA, Greg, SOORIYAKUMARAN, R., HOFER, Don

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Solution photochemistry of poly(dialkylsilanes): a new class of photoresists von Michl, J., Downing, J. W., Karatsu, T., McKinley, A. J., Poggi, G., Wallraff, G. M., Sooriyakumaran, R., Miller, R. D.

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Studies of chain conformational kinetics in poly(di-n-alkylsilanes) by spectroscopic methods. III: Fourier transform Raman studies of unsymmetric side chain substitution von HALLMARK, V. M, SOORIYAKUMARAN, R, MILLER, R. D, RABOLT, J. F

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Progress in 193 nm Positive Resists von ALLEN, R. D., SOORIYAKUMARAN, R., OPITZ, J., WALLRAFF, G. M., BREYTA, G., DIPIETRO, R. A., HOFER, D. C., KUNZ, R. R., OKOROANYANWU, U., WILLSON, C. G.

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Structural study of thermochromism in poly(di-n-alkylgermanes) by Raman spectroscopy in the visible and near infrared von Hallmark, V. M, Zimba, C. G, Sooriyakumaran, R, Miller, R. D, Rabolt, J. F

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APPROACH TOWARD ENVIRONMENTAL STABILIZATION OF CHEMICAL AMPLIFICATION RESISTS von ITO, Hiroshi, ENGLAND, William P., SOORIYAKUMARAN, R., CLECAK, Nicholas J., BREYTA, Gregory, HINSBERG, William D., LEE, Hoosung, YOON, Do Y.

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Cyclic Olefin Resist Polymers and Polymerizations for Improved Etch Resistance von Allen, R. D., Opitz, J., Ito, H., Wallow, T. I., Casmier, D. V., Larson, C. E., Sooriyakumaran, R., Hofer, D. C., Varanasi, P. R.

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Polysilanes: Photochemistry and deep UV lithography von Miller, R. D., Wallraff, G., Clecak, N., Sooriyakumaran, R., Michl, J., Karatsu, T., McKinley, A. J., Klingensmith, K. A., Downing, J.

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Etch Selectivity of 4SiMA:Hydroxystyrene Based Copolymers. Silicon Chemistry for Bilayer Resist Systems von Wallraff, G. M., Larson, C. E., Sooriyakumaran, R., Opitz, J., Fenzel-Alexander, D., DiPietro, R., Hofer, D., Breyta, G., Sherwood, M., Muete, J., Lin, Q., LaTulip, D., Simons, J., Babich, K., Petrillo, K., Angelopoulos, M.

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