Deposition of extremely thin (Ba,Sr)TiO3 thin films for ultra-large-scale integrated dynamic random access memory application von Hwang, Cheol Seong, Park, Soon Oh, Cho, Hag-Ju, Kang, Chang Suk, Kang, Ho-Kyu, Lee, Sang In, Lee, Moon Yong

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Leakage current of sol-gel derived Pb(Zr, Ti)O3 thin films having Pt electrodes von Shin, Ju Cheol, Hwang, Cheol Seong, Kim, Hyeong Joon, Park, Soon Oh

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INFLUENCE OF La0.5Sr0.5CoO3 HETEROSTRUCTURE ELECTRODES ON Pb(Zr,Ti)O3 THIN FILM PROPERTIES von Im, K V, Kuh, B J, Park, S O, Lee, S I, Choo, W K

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Plasma-Assisted Dry Etching of Ferroelectric Capacitor Modules and Application to a 32M Ferroelectric Random Access Memory Devices with Submicron Feature Sizes von Lee, Sang-Woo, Joo, Suk-Ho, Cho, Sung Lae, Son, Yoon-Ho, Lee, Kyu-Mann, Nam, Sang-Don, Park, Kun-Sang, Lee, Yong-Tak, Seo, Jung-Suk, Kim, Young-Dae, An, Hyeong-Geun, Kim, Hyoung-Joon, Jung, Yong-Ju, Heo, Jang-Eun, Lee, Moon-Sook, Park, Soon-Oh, Chung, U-In, Moon, Joo-Tae

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A Simulation Study for Designing a Rail Terminal in a Container Port von Byung Kwon Lee, Bong Joo Jung, Kap Hwan Kim, Soon Oh Park, Jeong Hoon Seo

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Paclitaxel-loaded poly(lactide-co-glycolide)/poly(ethylene vinyl acetate) composite for stent coating by ultrasonic atomizing spray von Yuk, Soon Hong, Oh, Keun Sang, Park, Jinah, Kim, Soon-Joong, Kim, Jung Ho, Kwon, Il Keun

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Etching characteristics of photoresist and low-k dielectrics by Ar/O2 ferrite-core inductively coupled plasmas von HYOUN WOO KIM, JONG WOO LEE, JOO, Junghoon, CHIN WOOK CHUNG, WAN JAE PARK, KANG, Chang-Jin, JOO, Sukho, SOON OH PARK, YOO, Chung-Gon, SUNG KYEONG KIM, JOUNG HO LEE, CHO, Sang-Deog, WOON SUK HWANG, CHOI, Dae-Kyu, KIM, Keeho, JANG, Jeong-Yeol, BEOM HOAN O, SEUNG GOL LEE, PARK, Se-Geun, KIM, Joohee, DUCK JIN CHUNG, SUNG PIL CHANG, JOO, Young-Chang

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Characteristics of Ir etching using Ar/Cl2 inductively coupled plasmas von PARK, Se-Geun, KIM, Chin-Woo, SONG, Ho-Young, HYOUN WOO KIM, JU HYUN MYUNG, JOO, Sukho, SOON OH PARK, LEE, Kyu-Mann

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Fabrication and electrical characterization of Pt/(Ba,Sr)TiO3/Pt capacitors for ultralarge-scale integrated dynamic random access memory applications von PARK, S. O, HWANG, C. S, CHO, H.-J, KANG, C. S, KANG, H.-K, LEE, S. I, LEE, M. Y

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Preparation and electrical properties of SrTiO3 thin films deposited by liquid source metal-organic chemical vapor deposition (MOCVD) von KANG, C. S, HWANG, C. S, CHO, H.-J, LEE, B. T, PARK, S. O, KIM, J. W, HORII, H, LEE, S. I, KOH, Y. B, LEE, M. Y

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Semiconductor nanowires surrounded by cylindrical Al2O3 shells von MIN, Byungdon, JONG SOO LEE, LEE, Moon-Sook, SOON OH PARK, MOON, Joo-Tae, CHO, Kyoungah, JU WON HWANG, KIM, Hyunsuk, MAN YOUNG SUNG, KIM, Sangsig, PARK, Jeunghee, HEE WON SEO, SEUNG YONG BAE

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Memory device and method of manufacturing the same von Park, Soon-Oh, Seong, Dong-Jun

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Interface potential barrier height and leakage current behavior of Pt/(Ba, Sr)TiO3/Pt capacitors fabricated by sputtering process von Hwang, Cheol Seong, Lee, Byoung Taek, Park, Soon Oh, Kim, Jin Won, Cho, Hag-Ju, Kang, Chang Seok, Horii, Hideki, Lee, Sang In, Lee, Moon Yong

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Memory device and method of manufacturing the same von Park, Soon-Oh, Seong, Dong-Jun

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Deposition and electrical characterization of very thin SrTiO3 films for ultra large scale integrated dynamic random access memory application von CHEOL SEONG HWANG, SOON OH PARK, CHANG SEOK KANG, HAG-JU CHO, HO-KYU KANG, SUNG TAE AHN, MOON YOUN LEE

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Effects of oxidants on the deposition and dielectric properties of the SrTiO3 thin films prepared by liquid source metal-organic chemical vapor deposition (MOCVD) von Hwang, Cheol Seong, Kang, Chang Seok, Cho, Hag-Ju, Park, Soon Oh, Lee, Byoung Taek, Kim, Jin Won, Horii, Hideki, Lee, Sang In, Lee, Moon Yong

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Memory device and method of manufacturing the same von Park, Soon-Oh, Seong, Dong-Jun

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MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME von SEONG, DONG-JUN, PARK, SOON-OH

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Semiconductor devices von Park, Soon-Oh, Seong, Dong-Jun, Eun, Sung-Ho

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Etching characteristics of photoresist and low- k dielectrics by Ar/O 2 ferrite-core inductively coupled plasmas von Kim, Hyoun Woo, Lee, Jong Woo, Hwang, Woon Suk, O, Beom Hoan, Lee, Seung Gol, Park, Se-Geun, Kim, Joohee, Chung, Duck Jin, Chang, Sung Pil, Joo, Young-Chang, Joo, Junghoon, Chung, Chin Wook, Park, Wan Jae, Kang, Chang-Jin, Joo, Sukho, Park, Soon Oh, Yoo, Chung-Gon, Kim, Sung Kyeong, Lee, Joung Ho, Cho, Sang-Deog, Choi, Dae-Kyu, Kim, Keeho, Jang, Jeong-Yeol

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