Rapid and Selective Deposition of Patterned Thin Films on Heterogeneous Substrates via Spin Coating von Zhang, Yuanyi, D’Ambra, Colton A, Katsumata, Reika, Burns, Ryan L, Somervell, Mark H, Segalman, Rachel A, Hawker, Craig J, Bates, Christopher M

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Single-Step, Spin-on Process for High Fidelity and Selective Deposition von Zhang, Yuanyi, Discekici, Emre H, Burns, Ryan L, Somervell, Mark H, Hawker, Craig J, Bates, Christopher M

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Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists von Hooge, Joshua S, Somervell, Mark H, Rathsack, Benjamen M, Scheer, Steven, Carcasi, Michael A

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Methods for sensitizing photoresist using flood exposures von Nagahara, Seiji, Somervell, Mark H, Carcasi, Michael A

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UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assembly von Simms, Ihsan, Nafus, Kathleen, Somervell, Mark H, Brown, Ian J, Negreira, Ainhoa

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Organic imaging materials: a view of the future von Stewart, Michael D., Patterson, Kyle, Somervell, Mark H., Willson, C. Grant

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Subtractive methods for creating dielectric isolation structures within open features von Somervell, Mark H, Rathsack, Benjamen M

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METHODS FOR CONTROLLING ACROSS WAFER DIRECTED SELF-ASSEMBLY von SOMERVELL, MARK, H

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METHODS FOR CONTROLLING ACROSS-WAFER DIRECTED SELF-ASSEMBLY von SOMERVELL MARK H

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SOLVENT ANNEAL PROCESSING FOR DIRECTED-SELF-ASSEMBLY APPLICATIONS von SOMERVELL, MARK, H

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SOLVENT ANNEAL PROCESSING FOR DIRECTED-SELF ASSEMBLY APPLICATIONS von SOMERVELL MARK H

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Use of grapho-epitaxial directed self-assembly applications to precisely cut logic lines von Somervell Mark H, Rathsack Benjamen M

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Mitigation of EUV shot noise replicating into acid shot noise in photo-sensitized chemically-amplified resist (PS-CAR) von Somervell Mark H, Carcasi Michael A

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PHOTO-SENSITIZED CHEMICALLY AMPLIFIED RESIST (PS-CAR) MODEL CALIBRATION von SOMERVELL, Mark H, CARCASI, Michael, FONSECA, Carlos

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Use of topography to direct assembly of block copolymers in grapho-epitaxial applications von Somervell Mark H, Rathsack Benjamen M

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METHODS FOR SENSITIZING PHOTORESIST USING FLOOD EXPOSURES von Nagahara, Seiji, Somervell, Mark H, Carcasi, Michael A

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Using sub-resolution openings to aid in image reversal, directed self-assembly, and selective deposition von Somervell Mark H, Rathsack Benjamen M

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Study of the fundamental contributions to line edge roughness in a 193 nm, top surface imaging system von Somervell, Mark H., Fryer, David S., Osborn, Brian, Patterson, Kyle, Byers, Jeffrey, Willson, C. Grant

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USE OF GRAPHO-EPITAXIAL DIRECTED SELF-ASSEMBLY APPLICATIONS TO PRECISELY CUT LOGIC LINES von Somervell Mark H, Rathsack Benjamen M

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USING SUB-RESOLUTION OPENINGS TO AID IN IMAGE REVERSAL, DIRECTED SELF-ASSEMBLY, AND SELECTIVE DEPOSITION von Somervell Mark H, Rathsack Benjamen M

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