Effect of hafnium contaminant present in zirconium targets on sputter deposited ZrN thin films von Fernandez, D.A.R., Brito, B.S.S., Santos, I.A.D., Soares, V.F.D., Terto, A.R., de Oliveira, G.B., Hubler, R., Batista, W.W., Tentardini, E.K.

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Structure and high temperature oxidation of Zr(1-x)Mo(x)N thin films deposited by reactive magnetron sputtering von Soares, V.F.D., Fernandez, D.A.R., Junior, A.S. Fontes, Carvalho, R.G., Machado, R., Mendes, F.M.T., Tentardini, E.K.

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Influence of WS2 content on high temperature wear performance of magnetron sputtered TiN-WSx thin films von Serra, E.C., Soares, V.F.D., Fernandez, D.A.R., Hübler, R., Juste, K.R.C., Lima, C.L., Tentardini, E.K.

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