Multi Trigger Resist for EUV Lithography von Popescu, Carmen, Vesters, Yannick, McClelland, Alexandra, Simone, Danilo De, Dawson, Guy, Roth, John, Theis, Wolfgang, Vandenberghe, Geert, Robinson, Alex P.G.

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The Path to Better Understanding Stochastics in EUV Photoresist von Simone, Danilo De, Vesters, Yannick, Vandenberghe, Geert

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Photo Material Readiness at the Eve of EUVL HVM von Simone, Danilo De, Vanelderen, Pieter, Vandenberghe, Geert

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The Role of Underlayers in EUVL von Vanelderen, Pieter, Simone, Danilo De, Spampinato, Valentina, Franquet, Alexis, Vandenberghe, Geert

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Metal Based Materials for EUV Lithography von Kosma, Vasiliki, Simone, Danilo De, Vandenberghe, Geert

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Photoresist Challenges for Logic and Memory using 0.33NA EUV Lithography von Simone, Danilo De, Vandenberghe, Geert

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Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists von Fallica, Roberto, Nannarone, Stefano, Mahne, Nicola, Malvezzi, Andrea Marco, Berti, Andrea, Simone, Danilo De

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Metal-containing Materials as Turning Point of EUV Lithography von Simone, Danilo De, Pollentier, Ivan, Vandenberghe, Geert

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EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing von Dinh, Cong Que, Nagahara, Seiji, Kuwahara, Yuhei, Dauendorffer, Arnaud, Yoshida, Keisuke, Okada, Soichiro, Onitsuka, Tomoya, Kawakami, Shinichiro, Shimura, Satoru, Muramatsu, Makoto, Yoshihara, Kosuke, Petersen, John S., Simone, Danilo De, Foubert, Philippe, Vandenberghe, Geert, Huli, Lior, Grzeskowiak, Steven, Krawicz, Alexandra, Bae, Nayoung, Kato, Kanzo, Nafus, Kathleen, Raley, Angélique

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Metal Sensitizer in Chemically Amplified EUV Resist: a Study of Sensitivity Enhancement and Dissolution von Jiang, Jing, Simone, Danilo De, Vandenberghe, Geert

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Role of Metal Sensitizers for Sensitivity Improvement in EUV Chemically Amplified Resist von Yamamoto, Hiroki, Vesters, Yannick, Jiang, Jing, Simone, Danilo De, Vandenberghe, Geert, Kozawa, Takahiro

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Photoresist Absorption Measurement at Extreme Ultraviolet (EUV) Wavelength by Thin Film Transmission Method von Shehzad, Atif, Vesters, Yannick, Simone, Danilo De, Pollentier, Ivan, Nannarone, Stefano, Vandenberghe, Geert, Gendt, Stefan De

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Dissolution Rate Monitor Tool to Measure EUV Photoresist Dissolution von Vesters, Yannick, Simone, Danilo De, Gendt, Stefan De

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Metal Containing Resist Readiness for HVM EUV Lithography von Simone, Danilo De, Mao, Ming, Lazzarino, Frederic, Vandenberghe, Geert

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Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20–450 eV von Fallica, Roberto, Mahne, Nicola, Conard, Thierry, Vanleenhove, Anja, de Simone, Danilo, Nannarone, Stefano

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Sequential Infiltration Synthesis for Line Edge Roughness Mitigation of EUV Resist von Baryshnikova, Marina, Simone, Danilo De, Knaepen, Werner, Kachel, Krzysztof, Chan, BT, Paolillo, Sara, Maes, Jan Willem, Roest, David De, Delgadillo, Paulina Rincon, Vandenberghe, Geert

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Progresses and Challenges of EUV Lithography Materials von Simone, Danilo De, Goethals, Anne Marie, Roey, Frieda Van, Zheng, Tao, Foubert, Philippe, Hendrickx, Eric, Vandenberghe, Geert, Ronse, Kurt

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Spin-on Metal Oxides and Their Applications for Next Generation Lithography von Yao, Huirong, Mullen, Salem, Wolfer, Elizabeth, Mckenzie, Douglas, Dioses, Alberto, Rahman, Dalil, Cho, JoonYeon, Padmanaban, Munirathna, Petermann, Claire, Hong, SungEun, Mannaert, Geert, Hopf, Toby, Simone, Danilo De, Vangoidsenhoven, Diziana, Lorant, Christophe, Sebaai, Farid, Sanchez, Efrain Altamirano

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Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation von Park, Juhae, Lee, Sung-Gyu, Vesters, Yannick, Severi, Joren, Kim, Myungwoong, De Simone, Danilo, Oh, Hye-Keun, Hur, Su-Mi

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Enhancing Performance and Function of Polymethacrylate Extreme Ultraviolet Resists Using Area-Selective Deposition von Nye, Rachel A., Van Dongen, Kaat, De Simone, Danilo, Oka, Hironori, Parsons, Gregory N., Delabie, Annelies

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