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  1. 1
    Influence of deposition rate of LaF3 and annealing on the capacitance–voltage (C–V) characteristics of LaF3/Si heterostructures

    Influence of deposition rate of LaF3 and annealing on the capacitance–voltage (C–V) characteristics of LaF3/Si heterostructures von Sikder, Ramesh Chandra, Mou, Sinthia Shabnam, Rahman, Atowar, Ismail, Abu Bakar Md


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  2. 2
    Influence of deposition rate of LaF 3 and annealing on the capacitance–voltage ( C– V) characteristics of LaF 3/Si heterostructures

    Influence of deposition rate of LaF 3 and annealing on the capacitance–voltage ( C– V) characteristics of LaF 3/Si heterostructures von Sikder, Ramesh Chandra, Mou, Sinthia Shabnam, Rahman, Atowar, Ismail, Abu Bakar Md


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