Growth kinetics of CVD TiO2: influence of carrier gas von SIEFERING, K. L, GRIFFIN, G. L

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Kinetics of Low‐Pressure Chemical Vapor Deposition of TiO2 from Titanium Tetraisopropoxide von Siefering, K. L., Griffin, G. L.

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Chemical vapor deposition of vanadium oxide thin films von SIEFERING, K. L, GRIFFIN, G. L

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Chemical Reactions of Zn/Cu, Zn/Cu sub 2 O, and Zn/CuO Thin Films von Siefering, K L, Griffin, G L

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Edge gripping device for handling a set of semiconductor wafers in an immersion processing system von MACIEJ, TODD K, WAGENER, THOMAS J, SIEFERING, KEVIN L, HERBST, TIM W, GAST, TRACY A

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Edge gripping device for handling a set of semiconductor wafers in an immersion processing system von Herbst, Tim W, Maciej, Todd K, Gast, Tracy A, Wagener, Thomas J, Siefering, Kevin L

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Edge gripping device for handling a set of semiconductor wafers in an immersion processing system von HERBST TIM W, MACIEJ TODD K, WAGENER THOMAS J, GAST TRACY A, SIEFERING KEVIN L

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Semiconductor wafer cleaning systems and methods von HERBST TIM W, MACIEJ TODD K, WAGENER THOMAS J, GAST TRACY A, SIEFERING KEVIN L

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Semiconductor wafer cleaning systems and methods von MACIEJ, TODD K, WAGENER, THOMAS J, SIEFERING, KEVIN L, HERBST, TIM W, GAST, TRACY A

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