Preparation of Graphene: Deposition and Annealing von Shustin, E. G.

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Beam–Plasma Discharge in Space and in a Lab von Shustin, E. G.

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Beam plasma discharge in technologies of materials for nanoelectronics von Shustin, E G

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Plasma technologies for material processing in nanoelectronics: Problems and solutions von Shustin, E. G.

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Density Profile of a Plasma Layer Formed by an Electron Beam von Sorokin, I. A., Shustin, E. G.

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Charging effects of plasma impact on microconductor structures on an insulator in plasma processing technologies von Tarakanov, V.P., Shustin, E.G.

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Model of a Plasma Layer Formed by an Electron Beam von Kolodko, D. V., Sorokin, I. A., Tarakanov, V. P., Shustin, E. G.

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Etching of “Microwire-on-Insulator”-Type Structures von Shustin, E. G., Kolodko, D. V., Luzanov, V. A., Mirgorodskaya, E. N., Sorokin, I. A., Tarakanov, V. P., Temiryazeva, M. P., Frolov, E. S.

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Growth of Thin Graphite Films on a Dielectric Substrate using Heteroepitaxial Synthesis von Sorokin, I. A., Kolodko, D. V., Luzanov, V. A., Shustin, E. G.

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Synthesis of Nano-Crystalline Graphite Films in Hollow Cathode Discharge von Sorokin, I. A., Kolodko, D. V., Shustin, E. G.

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Single-domain nickel films for production of graphene von Luzanov, V. A., Kotelyanskii, I. M., Shustin, E. G.

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Formation of thin graphite films upon carbon diffusion through nickel von Shustin, E. G., Isaev, N. V., Luzanov, V. A., Temiryazeva, M. P.

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Control of the energy of ion flow affecting electrically insulated surface in plasma processing reactor based on a beam plasma discharge von Shustin, E.G., Isaev, N.V., Klykov, I.L., Peskov, V.V.

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Simulation of sputtering from an isolated conductor surrounded by a dielectric during plasma etching von Tarakanov, V.P., Shustin, E.G., Ronald, K.

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Aharonov-Bohm effect on columnar defects in thin graphite and graphene von Latyshev, Y U I, Orlov, A P, Shustin, E G, Isaev, N V, Escoffier, W, Monceau, P, Van der Beek, C J, Konczykowski, M, Monnet, I

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Computer simulation of the sheath and the adjacent plasma in the presence of a plasma source von Shustin, E.G., Tarakanov, V.P., Ronald, K.

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Corrigendum to “Charging effects of plasma impact on microconductor structures on an insulator in plasma processing technologies” [Vacuum, 113, (2015), 59–63] von Tarakanov, V.P., Shustin, E.G.

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Mechanism for ion acceleration along the normal to the axis of a beam-plasma discharge in a weak magnetic field von Isaev, N. V., Rukhadze, A. A., Shustin, E. G.

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Ion flows from a beam-plasma discharge von Isaev, N. V., Chmil’, A. I., Shustin, E. G.

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Energy characteristics of beam-plasma interaction in a closed volume von Klykov, I. L., Tarakanov, V. P., Shustin, E. G.

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