Improvement of film uniformity stability of PECVD silicon nitride deposition process by addition of fluorine removal to the plasma clean sequence von Zhao, A., Bulger, J.M., Green, L.P., Harris, W.C., Hunt, T.J., Marchesseault, W.R., Shuman, R.F., French, M.C., Lisy, H.C.

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POSTUPAK ZA DOBIJANJE DERIVATA PIPERAZINILKAMFORSULFONILA KAO ANTAGONISTA OKSITOCINA von GRABOWSKI, E.J.J, MONTGOMERY, K.M, SOHAR, P, DEMARCO, A.M, GUO-JIE, HO, SHUMAN, R.F, MATHRE, D.J

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The chemistry of cephamycins. V. The reactions of the carbamoyl group von Karady, S., Weinstock, L.M., Roberts, F.E., ten Broeke, J., Shuman, R.F., Hoinowski, A.M., Pines, S.H., Sletzinger, M.

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