Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists von Hirayama, Taku, Shiono, Daiju, Matsumaru, Shogo, Ogata, Toshiyuki, Hada, Hideo, Onodera, Junichi, Arai, Tadashi, Sakamizu, Toshio, Yamaguchi, Atsuko, Shiraishi, Hiroshi, Fukuda, Hiroshi, Ueda, Mitsuru

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Chemical Reaction Analysis of EUV CA Resist using SR Absorption Spectroscopy von Watanabe, Takeo, Haruyama, Yuichi, Shiono, Daiju, Emura, Kazuya, Urayama, Takuro, Harada, Tetsuo, Kinoshita, Hiroo

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New Photoresist Based on Amorphous Low Molecular Weight Polyphenols von Hirayama, Taku, Daiju, Shiono, Hada, Hideo, Onodera, Junichi, Ueda, Mitsuru

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EUV Resist Chemical Reaction Analysis using SR von Watanabe, Takeo, Emura, Kazuya, Shiono, Daiju, Haruyama, Yuichi, Muramatsu, Yasuji, Ohmori, Katsumi, Sato, Kazufumi, Harada, Tetsuo, Kinoshita, Hiroo

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EUV Resist Chemical Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity Achievement von Emura, Kazuya, Watanabe, Takeo, Yamaguchi, Masato, Tanino, Hirohito, Fukui, Tsubasa, Shiono, Daiju, Haruyama, Yuichi, Muramatsu, Yasuji, Ohmori, Katsumi, Sato, Kazufumi, Harada, Tetsuo, Kinoshita, Hiroo

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Spectral analysis of line-edge roughness in polyphenol EB-resists and its impact on transistor performance von Yamaguchi, Atsuko, Fukuda, Hiroshi, Arai, Tadashi, Yamamoto, Jiro, Hirayama, Taku, Shiono, Daiju, Hada, Hideo, Onodera, Junichi

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Decomposition and Roughness Analysis of Chemically Amplified Molecular Resist for Reducing Line Width Roughness von Shiono, Daiju, Hada, Hideo, Sato, Kazufumi, Fukushima, Yasuyuki, Watanabe, Takeo, Kinoshita, Hiroo

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Performance of molecular resist based on polyphenol in EUV lithography von Oizumi, Hiroaki, Kumasaka, Fumiaki, Tanaka, Yuusuke, Hirayama, Taku, Shiono, Daiju, Hada, Hideo, Onodera, Junichi, Yamaguchi, Atsuko, Nishiyama, Iwao

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LER evaluation of molecular resist for EUV lithography von Shiono, Daiju, Hada, Hideo, Yukawa, Hiroto, Oizumi, Hiroaki, Nishiyama, Iwao, Kojima, Kyoko, Fukuda, Hiroshi

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Fundamental Decomposition Analysis of Chemically Amplified Molecular Resist for below 22 nm Resolution von Shiono, Daiju, Hada, Hideo, Sato, Kazufumi, Fukushima, Yasuyuki, Watanabe, Takeo, Kinoshita, Hiroo

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Decomposition Analysis of Chemically Amplified Resists for Improving Critical Dimension Control von Shiono, Daiju, Hada, Hideo, Hirayama, Taku, Onodera, Junichi, Watanabe, Takeo, Kinoshita, Hiroo

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Characterization of Negative-Tone Molecular Resist for EUV and EB Lithography von Kojima, Kyoko, Mori, Shigeki, Shiono, Daiju, Hada, Hideo, Onodera, Junichi

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Depth profile and line-edge roughness of partially O-1-ethoxyethylated low molecular weight amorphous polyphenol and poly(p-hydroxystyrene) base resists for electron-beam lithograp... von Hirayama, Taku, Shiono, Daiju, Onodera, Junichi, Yamaguchi, Atsuko, Fukuda, Hiroshi

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Lithographic Evaluation of Chemically Amplified Molecular Resist for below 22nm Resolution von Shiono, Daiju, Hada, Hideo, Sato, Kazufumi, Fukushima, Yasuyuki, Watanabe, Takeo, Kinoshita, Hiroo

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Patterning capability of new molecular resist in EUV lithography von Oizumi, Hiroaki, Tanaka, Yuusuke, Kumise, Takaaki, Shiono, Daiju, Hirayama, Taku, Hada, Hideo, Onodera, Junichi, Yamaguchi, Atsuko, Nishiyama, Iwao

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Evaluation of New Molecular Resist for EUV Lithography von Oizumi, Hiroaki, Tanaka, Yuusuke, Kumise, Takaaki, Shiono, Daiju, Hirayama, Taku, Hada, Hideo, Onodera, Junichi, Yamaguchi, Atusko, Nishiyama, Iwao

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Fundamental Decomposition Analysis of Chemically Amplified Molecular Resist for below 22nm Resolution von Shiono, Daiju, Hada, Hideo, Sato, Kazufumi, Fukushima, Yasuyuki, Watanabe, Takeo, Kinoshita, Hiroo

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Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography von Shiono, Daiju, Hirayama, Taku, Kasai, Kohei, Hada, Hideo, Onodera, Junichi, Arai, Tadashi, Yamaguchi, Atsuko, Shiraishi, Hiroshi, Fukuda, Hiroshi

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Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography von Hada, Hideo, Hirayama, Taku, Shiono, Daiju, Onodera, Junichi, Watanabe, Takeo, Lee, Seung Yoon, Kinoshita, Hiroo

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2-Aminopteridin-4-one derivatives from 2, 3-dicyanopyrazine von Tada, Masaru, Shiono, Daiju, Tanaka, Shinsuke

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