The Effectiveness and Safety of Manual Therapy on Pain and Disability in Older Persons With Chronic Low Back Pain: A Systematic Review von de Luca, Katie E., Fang, Sheng Hung, Ong, Justin, Shin, Ki-Soo, Woods, Samuel, Tuchin, Peter J.

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Novel Rinse Liquid for sub-90nm Lithography von Shin, Ki-Soo, Lee, Geunsu

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Performance of ArF Resist Process for 100nm DRAM Full Chip von Shin, Ki-Soo, Kim, Hyeong Soo, Jung, Jae Chang

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Materials and Resists for 193 and 157nm Applications von Padmanaban, Munirathna, Alemy, Eric, Bae, Jun-Bom, Kim, Woo-Kyu, Kudo, Takanori, Masuda, Seiya, Rahman, Dalil, Sakamuri, Raj, Dammel, Ralph, Jung, Jae-Chang, Lee, Sung-Koo, Shin, Ki-Soo

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Optimization of 193 nm Contact Hole Resists for 100 nm Node von Kudo, Takanori, Alemy, Eric L., Dammel, Ralph R., Kim, Woo-Kyu, Lee, Sang-Ho, Masuda, Seiya, McKenzie, Douglas, Rahman, M. Dalil, Romano, Andrew, Padmanaban, Munirathna, Chun, Jun-Sung, Jung, Jae-Chang, Lee, Sung-Koo, Shin, Ki-Soo, Kim, Hyeong-Soo

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Implementation of COMA type ArF Resist for Sub-100nm Patterning von Jung, Jae-Chang, Lee, Sung-Ku, Lee, Guensu, Koh, Cha-Won, Kong, Keun-Kyu, Hwang, Young-Sun, Kim, Jin-Soo, Shin, Ki-Soo

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New ArF Photoresist Based on Modified Maleic Anhydride Cycloolefin Polymers von Jeon, Hyun-pyo, Seo, Dong-chul, Kim, Chang-min, Lim, Young-taek, Cho, Seung-duk, Lee, Jong-bum, Joo, Hyun-sang, Park, Joo-hyeon, Kim, Seong-Ju, Jung, Jae-chang, Kong, Keun-kyu, Kim, Jin-soo, Shin, Ki-soo, Yamada, Tatsuya

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3D printer with residual powder removal device von Lee, Su Bong, Kang, Sung Min, Shin, Ki Soo

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Novel Rinse Liquid for sub-90 nm Lithography von Shin, Ki-Soo, Lee, Geunsu

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3D PRINTER WITH RESIDUAL POWDER REMOVAL DEVICE von KANG, Sung Min, LEE, Su Bong, SHIN, Ki Soo

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Osteoporosis and bone fractures in alcoholic liver disease:A meta-analysis von Bang, Chang Seok, Shin, In Soo, Lee, Sung Wha, Kim, Jin Bong, Baik, Gwang Ho, Suk, Ki Tae, Yoon, Jai Hoon, Kim, Yeon Soo, Kim, Dong Joon

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Portal vein stenting as a signiifcant risk factor for biliary stricture in adult living donor liver transplantation von Min-Ho Shin Deok-Bog Moon Sung-Gyu Lee Shin Hwang Ki-Hun Kim Chul-Soo Ahn Tae-Yong Ha Gi-Won Song Dong-Hwan Jung Gil-Chun Park Young-In Yun Wan-Jun Kim Woo-Hyoung Kang Seok-Hwan Kim Gi-Young Ko

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The Effects of Growth Temperature and Substrate Tilt Angle on GalnP/GaAs Tandem Solar Cells von Jun, Dong-Hwan, Kim, Chang-Zoo, Kim, Hog-Young, Shin, Hyun-Beom, Kang, Ho-Kwan, Park, Won-Kyu, Shin, Ki-Soo, Ko, Chul-Gi

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STL FILE COUPLING METHOD von PARK, Song Hwa, SHIN, Ki Soo

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METHOD FOR REMOVING 3D PRINTER RESIDUAL POWDER BY USING RESIDUAL POWDER REMOVAL DEVICE von KANG, Sung Min, LEE, Su Bong, SHIN, Ki Soo

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3D PRINTER WITH RESIDUAL POWDER REMOVAL DEVICE von KANG, Sung Min, LEE, Su Bong, SHIN, Ki Soo

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The Effects of Growth Temperature and Substrate Tilt Angle on GalnP/GaAs Tandem Solar Cells von Jun, Dong-Hwan, Kim, Chang-Zoo, Kim, Hog-Young, Shin, Hyun-Beom, Kang, Ho-Kwan, Park, Won-Kyu, Shin, Ki-Soo, Ko, Chul-Gi

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New ArF Photoresist Based on Modified Malefic Anhydride Cycloolefin Polymers von Jeon, Hyun-pyo, Seo, Dong-chul, Kim, Chang-min, Lim, Young-taek, Cho, Seung-duk, Lee, Jong-bum, Joo, Hyun-sang, Park, Joo-hyeon, Kim, Seong-Ju, Jung, Jae-chang, Kong, Keun-kyu, Kim, Jin-soo, Shin, Ki-soo, Yamada, Tatsuya

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Optimization of 193nm Contact Hole Resists for 100nm Node von Kudo, Takanori, Alemy, Eric L., Dammel, Ralph R., Kim, Woo-Kyu, Lee, Sang-Ho, Masuda, Seiya, McKenzie, Douglas, Rahman, M. Dalil, Romano, Andrew, Padmanaban, Munirathna, Chun, Jun-Sung, Jung, Jae-Chang, Lee, Sung-Koo, Shin, Ki-Soo, Kim, Hyeong-Soo

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Organic anti-reflective coating composition and method for forming photoresist patterns using the same von Jung, Jae-chang, Shin, Ki-soo

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