Growth of water-insoluble rutile GeO2 thin films on (001) TiO2 substrates with graded Ge x Sn1−x O2 buffer layers von Shimazoe, Kazuki, Ogawa, Temma, Nishinaka, Hiroyuki

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Epitaxial growth of metastable c-plane rhombohedral indium tin oxide using mist chemical vapor deposition von Shimazoe, Kazuki, Nishinaka, Hiroyuki, Watanabe, Keisuke, Yoshimoto, Masahiro

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Phase control of α- and κ-Ga2O3 epitaxial growth on LiNbO3 and LiTaO3 substrates using α-Fe2O3 buffer layers von Shimazoe, Kazuki, Nishinaka, Hiroyuki, Arata, Yuta, Tahara, Daisuke, Yoshimoto, Masahiro

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Heteroepitaxial growth of a-, m-, and r-plane α-Ga2O3 thin films on rh-ITO electrodes for vertical device applications von Shimazoe, Kazuki, Nishinaka, Hiroyuki, Yoshimoto, Masahiro

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Alloying Ga 2 O 3 with Fe 2 O 3 on Corundum‐Structured rh‐ITO by Mist CVD and Its Demonstration of Photodetector and Photoelectrode Applications von Kondo, Ryo, Shimazoe, Kazuki, Nishinaka, Hiroyuki

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Growth of water-insoluble rutile GeO 2 thin films on (001) TiO 2 substrates with graded Ge x Sn 1−x O 2 buffer layers von Shimazoe, Kazuki, Ogawa, Temma, Nishinaka, Hiroyuki

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Heteroepitaxial Growth of NiO Thin Films on (‐201) β‐Ga 2 O 3 by Mist Chemical Vapor Deposition von Yasui, Gen, Miyake, Hiroki, Shimazoe, Kazuki, Nishinaka, Hiroyuki

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Epitaxial Growth of δ‐Ga2O3 Thin Films Grown on YSZ and Sapphire Substrates Using β‐Fe2O3 Buffer Layers via Mist Chemical Vapor Deposition von Kato, Takahiro, Nishinaka, Hiroyuki, Shimazoe, Kazuki, Yoshimoto, Masahiro

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Tolerance of Corundum‐Structured Tin‐Doped Indium Oxide Thin Films to Gamma‐ray Irradiation von Shimazoe, Kazuki, Kurosawa, Shunsuke, Tanaka, Hiroki, Takata, Takushi, Nishinaka, Hiroyuki

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Epitaxial Growth of δ‐Ga 2 O 3 Thin Films Grown on YSZ and Sapphire Substrates Using β‐Fe 2 O 3 Buffer Layers via Mist Chemical Vapor Deposition von Kato, Takahiro, Nishinaka, Hiroyuki, Shimazoe, Kazuki, Yoshimoto, Masahiro

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Corundum-structured α-Fe2O3 substrates for α-Ga2O3 epitaxial growth von Nishinaka, Hiroyuki, Shimazoe, Kazuki, Kanegae, Kazutaka, Yoshimoto, Masahiro

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Visible-light absorption of indium oxide thin films via Bi3+ doping for visible-light-responsive photocatalysis von Taniguchi, Yoko, Nishinaka, Hiroyuki, Shimazoe, Kazuki, Kawaharamura, Toshiyuki, Kanegae, Kazutaka, Yoshimoto, Masahiro

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LiTaO3基板上へのα-Ga2O3の成長にα-Fe2O3バッファ層の成長時間が与える影響 von 島添, 和樹, 西中, 浩之, 新田, 悠汰, 吉本, 昌広

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Demonstration of Bixbyite-Structured δ‑Ga2O3 Thin Films Using β‑Fe2O3 Buffer Layers by Mist Chemical Vapor Deposition von Kato, Takahiro, Nishinaka, Hiroyuki, Shimazoe, Kazuki, Kanegae, Kazutaka, Yoshimoto, Masahiro

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α-Fe2O3バッファ層の挿入によるフレキシブルな合成雲母基板上へのα-Ga2O3薄膜のエピタキシャル成長 von 新田, 悠汰, 西中, 浩之, 島添, 和樹, 吉本, 昌広

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Vertical self-powered ultraviolet photodetector using α-Ga2O3 thin films on corundum structured rh-ITO electrodes von Shimazoe, Kazuki, Nishinaka, Hiroyuki, Taniguchi, Yoko, Kato, Takahiro, Kanegae, Kazutaka, Yoshimoto, Masahiro

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Homoepitaxial growth of Ge doped β-gallium oxide thin films by mist chemical vapor deposition von Ogawa, Temma, Nishinaka, Hiroyuki, Shimazoe, Kazuki, Nagaoka, Tatsuji, Miyake, Hiroki, Kanegae, Kazutaka, Yoshimoto, Masahiro

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Impact of α-Fe2O3 Buffer Layer Growth Time on the α-Ga2O3 Grown on LiTaO3 Substrates von SHIMAZOE, Kazuki, NISHINAKA, Hiroyuki, ARATA, Yuta, YOSHIMOTO, Masahiro

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Demonstration of Bixbyite-Structured δ-Ga 2 O 3 Thin Films Using β-Fe 2 O 3 Buffer Layers by Mist Chemical Vapor Deposition von Kato, Takahiro, Nishinaka, Hiroyuki, Shimazoe, Kazuki, Kanegae, Kazutaka, Yoshimoto, Masahiro

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Growth of Metastable α-Ga2O3 Epitaxial Thin Film on Flexible Synthetic Mica by Insertion α-Fe2O3 Buffer Layer von ARATA, Yuta, NISHINAKA, Hiroyuki, SHIMAZOE, Kazuki, YOSHIMOTO, Masahiro

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