Recent Advances in the Design of Resist Materials for 157 nm Lithography von Houlihan, Francis, Sakamuri, Raj, Romano, Andrew, Rentkiewicz, David, Dammel, Ralph, Stephanko, Nickolay, Market, M., Vermeir, U. Mierau Inge, Hohle, Christoph, Conley, Sill, Miller, Daniel, Itani, Toshiro, Shigematus, Masato, Kawaguchi, Etsuo

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