Direct-Liquid-Injection Chemical Vapor Deposition of Nickel Nitride Films and Their Reduction to Nickel Films von Li, Zhefeng, Gordon, Roy G, Pallem, Venkateswara, Li, Huazhi, Shenai, Deo V

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Safer alternative liquid germanium precursors for relaxed graded SiGe layers and strained silicon by MOVPE von Shenai, Deo V., DiCarlo, Ronald L., Power, Michael B., Amamchyan, Artashes, Goyette, Randall J., Woelk, Egbert

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Correlation of vapor pressure equation and film properties with trimethylindium purity for the MOVPE grown III–V compounds von Shenai, Deo V., Timmons, Michael L., DiCarlo, Ronald L., Lemnah, Gregory K., Stennick, Robert S.

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Vapor Deposition of Highly Conformal Copper Seed Layers for Plating Through-Silicon Vias (TSVs) von Au, Yeung, Min Wang, Qing, Li, Huazhi, Lehn, Jean-Sebastien M, Shenai, Deo V, Gordon, Roy Gerald

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Direct-Liquid-Injection Chemical Vapor Deposition of Nickel Nitride Films and Their Reduction to Nickel Films von Li, Zhefeng, Gordon, Roy Gerald, Pallem, Venkateswara, Li, Huazhi, Shenai, Deo V

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Atomic Layer Deposition of Lanthanum-Based Ternary Oxides von Wang, Hongtao, Wang, Jun-Jieh, Gordon, Roy, Lehn, Jean-Sébastien M., Li, Huazhi, Hong, Daewon, Shenai, Deo V.

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Atomic Layer Deposition of Lanthanum-Based Ternary Oxides von Wang, Hongtao, Wang, Jun-Jieh, Gordon, Roy Gerald, Lehn, Jean-Sébastien M, Li, Huazhi, Hong, Daewon, Shenai, Deo V

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New Ni Amidinate Source for ALD/CVD of NiNx, NiO and Ni von Li, Huazhi, Perera, Thiloma, Shenai, Deo V, Li, Zhefeng, Gordon, Roy Gerald

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Development of Novel Germanium Compounds for Use in SiGe Epitaxy von Shenai, Deo, DiCarlo, Ron, Power, Mike, Amamchyan, Art, Goyette, Randy, Woelk, Egbert, Sagnes, Isabel

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