Sub-10 nm Feature Size PS‑b‑PDMS Block Copolymer Structures Fabricated by a Microwave-Assisted Solvothermal Process von Borah, Dipu, Shaw, Matthew T, Holmes, Justin D, Morris, Michael A

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Monitoring PMMA Elimination by Reactive Ion Etching from a Lamellar PS-b-PMMA Thin Film by ex Situ TEM Methods von Farrell, Richard A, Petkov, Nikolay, Shaw, Matthew T, Djara, Vladimir, Holmes, Justin D, Morris, Michael A

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Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing von Ghoshal, Tandra, Shaw, Matthew T., Holmes, Justin D., Morris, Michael A.

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Orientation and Alignment Control of Microphase-Separated PS‑b‑PDMS Substrate Patterns via Polymer Brush Chemistry von Borah, Dipu, Rasappa, Sozaraj, Senthamaraikannan, Ramsankar, Kosmala, Barbara, Shaw, Matthew T, Holmes, Justin D, Morris, Michael A

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Fabrication of Graphoepitaxial Gate-All-Around Si Circuitry Patterned Nanowire Arrays Using Block Copolymer Assisted Hard Mask Approach von Ghoshal, Tandra, Senthamaraikannan, Ramsankar, Shaw, Matthew T, Lundy, Ross, Selkirk, Andrew, Morris, Michael A

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Area Selective Polymer Brush Deposition von Cummins, Cian, Shaw, Matthew T., Morris, Michael A.

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Study on the Combined Effects of Solvent Evaporation and Polymer Flow upon Block Copolymer Self-Assembly and Alignment on Topographic Patterns von Fitzgerald, Thomas G, Farrell, Richard A, Petkov, Nikolay, Bolger, Ciara T, Shaw, Matthew T, Charpin, Jean P. F, Gleeson, James P, Holmes, Justin D, Morris, Michael A

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Synthesis and Characterization of Highly Ordered Cobalt-Magnetite Nanocable Arrays von Daly, Brian, Arnold, Donna C., Kulkarni, Jaideep S., Kazakova, Olga, Shaw, Matthew T., Nikitenko, Sergey, Erts, Donats, Morris, Michael A., Holmes, Justin D.

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Fabrication of Ordered, Large Scale, Horizontally-Aligned Si Nanowire Arrays Based on an In Situ Hard Mask Block Copolymer Approach von Ghoshal, Tandra, Senthamaraikannan, Ramsankar, Shaw, Matthew T., Holmes, Justin D., Morris, Michael A.

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Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application von Ghoshal, Tandra, Maity, Tuhin, Senthamaraikannan, Ramsankar, Shaw, Matthew T., Carolan, Patrick, Holmes, Justin D., Roy, Saibal, Morris, Michael A.

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Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymers under solvent annealing von Ghoshal, Tandra, Chaudhari, Atul, Cummins, Cian, Shaw, Matthew T, Holmes, Justin D, Morris, Michael A

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Fabrication of ultra-dense sub-10 nm in-plane Si nanowire arrays by using a novel block copolymer method: optical properties von Ghoshal, Tandra, Ntaras, Christos, O'Connell, John, Shaw, Matthew T, Holmes, Justin D, Avgeropoulos, Apostolos, Morris, Michael A

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"In situ" hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays von Ghoshal, Tandra, Senthamaraikannan, Ramsankar, Shaw, Matthew T, Holmes, Justin D, Morris, Michael A

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Molecularly Functionalized Silicon Substrates for Orientation Control of the Microphase Separation of PS‑b‑PMMA and PS‑b‑PDMS Block Copolymer Systems von Borah, Dipu, Ozmen, Mustafa, Rasappa, Sozaraj, Shaw, Matthew T, Holmes, Justin D, Morris, Michael A

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Reduction and control of domain spacing by additive inclusion: Morphology and orientation effects of glycols on microphase separated PS-b-PEO von Ghoshal, Tandra, Shaw, Matthew T., Holmes, Justin D., Morris, Michael A.

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Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography von Rasappa, Sozaraj, Borah, Dipu, Faulkner, Colm C, Lutz, Tarek, Shaw, Matthew T, Holmes, Justin D, Morris, Michael A

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Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly von Farrell, Richard A, Kinahan, Niall T, Hansel, Stefan, Stuen, Karl O, Petkov, Nikolay, Shaw, Matthew T, West, Laetitia E, Djara, Vladimir, Dunne, Robert J, Varona, Olga G, Gleeson, Peter G, Jung, Soon-Jung, Kim, Hye-Young, Koleśnik, Maria M, Lutz, Tarek, Murray, Christopher P, Holmes, Justin D, Nealey, Paul F, Duesberg, Georg S, Krstić, Vojislav, Morris, Michael A

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Surface-Directed Dewetting of a Block Copolymer for Fabricating Highly Uniform Nanostructured Microdroplets and Concentric Nanorings von Farrell, Richard A, Kehagias, Nikolaos, Shaw, Matthew T, Reboud, Vincent, Zelsmann, Marc, Holmes, Justin D, Sotomayor Torres, Clivia M, Morris, Michael A

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The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditions von Borah, Dipu, Rasappa, Sozaraj, Senthamaraikannan, Ramsankar, Shaw, Matthew T., Holmes, Justin D., Morris, Michael A.

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Block copolymer lithography: Feature size control and extension by an over-etch technique von Rasappa, Sozaraj, Borah, Dipu, Senthamaraikannan, Ramsankar, Faulkner, Colm C., Shaw, Matthew T., Gleeson, Peter, Holmes, Justin D., Morris, Michael A.

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