Mucormycotic Osteomyelitis Involving the Maxilla: A Rare Case Report and Review of the Literature von Arani, Rajesh, Khanam, H. M. Khuthija, Shareef, S. N. H. Afsar

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Plasma nitridation of very thin gate dielectrics von Al-Shareef, H.N, Bersuker, G, Lim, C, Murto, R, Borthakur, S, Brown, G.A, Huff, H.R

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Tunability and Calculation of the Dielectric Constant of Capacitor Structures with Interdigital Electrodes von Dimos, D, Raymond, Mv, Schwartz, Rw, Al-shareef, Hn, Mueller, Ch

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A new and rapid process for production of solution-derived (Pb,La)(Zr,Ti)O3 thin films and powders von BOYLE, T. J, AL-SHAREEF, H. N

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Photoinduced changes in the fatigue behavior of SrBi2Ta2O9 and Pb(Zr,Ti)O3 thin films von Dimos, D., Al-Shareef, H. N., Warren, W. L., Tuttle, B. A.

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Characterization of ultrathin gate dielectrics formed by in-situ steam generation with nitrogen postprocessing von KARAMCHETI, A, WATT, V. H. C, AL-SHAREEF, H. N, LUO, T. Y, JACKSON, M. D, HUFF, H. R, STEINBRÜCHEL, C

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Device performance of in situ steam generated gate dielectric nitrided by remote plasma nitridation von Al-Shareef, H. N., Karamcheti, A., Luo, T. Y., Bersuker, G., Brown, G. A., Murto, R. W., Jackson, M. D., Huff, H. R., Kraus, P., Lopes, D., Olsen, C., Miner, G.

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Qualitative model for the fatigue-free behavior of SrBi2Ta2O9 von Al-Shareef, H. N., Dimos, D., Boyle, T. J., Warren, W. L., Tuttle, B. A.

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Leakage and Reliability Characteristics of Lead Zirconate Titanate Thin-Film Capacitors von Al-Shareef, Husam N., Dimos, Duane

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Phase evolution and annealing effects on the electrical properties of Pb(Zr0.53Ti0.47)O3 thin films with RuO2 electrodes von AL-SHAREEF, H. N, BELLUR, K. R, AUCIELLO, O, KINGON, A. I

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Driving force behind voltage shifts in ferroelectric materials von Warren, W. L., Al-Shareef, H. N., Dimos, D., Tuttle, B. A., Pike, G. E.

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Voltage offsets and imprint mechanism in SrBi2Ta2O9 thin films von Al-Shareef, H. N., Dimos, D., Warren, W. L., Tuttle, B. A.

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Time-variant analysis of rotorcraft systems dynamics - An exploitation of vector processors von AMIROUCHE, F. M. L., XIE, M., SHAREEF, N. H.

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Analysis of the oxidation kinetics and barrier layer properties of ZrN and Pt/Ru thin films for DRAM applications von Al-Shareef, H.N., Chen, X., Lichtenwalner, D.J., Kingon, A.I.

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Electron mobility in MOSFETs with ultrathin RTCVD silicon nitride/oxynitride stacked gate dielectrics von Yang, K.J, King, T.-J, Hu, C, Levy, S, Al-Shareef, H.N

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Metallization schemes for dielectric thin film capacitors von Al-Shareef, H. N., Dimos, D., Tuttle, B. A., Raymond, M. V.

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Electrical properties of ferroelectric thin-film capacitors with hybrid (Pt,RuO2) electrodes for nonvolatile memory applications von Al-Shareef, H. N., Auciello, O., Kingon, A. I.

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Gain in computational efficiency by vectorization in the dynamic simulation of multi-body systems von Amirouche, F.M.L., Shareef, N.H.

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Finite element modeling of contact conditions in multibody system dynamics von Amirouche, F. M. L., Xie, M., Shareef, N. H., Valco, M.

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Leakage and interface engineering in titanate thin films for non-volatile ferroelectric memory and ulsi drams von Chen, X., Kingon, A. I., Al-Shareef, H. N., Bellur, K. R., Gifford, K., Auciello, O.

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