Characterization of the CH4/H2/Ar high density plasma etching process for HgCdTe von EDDY, C. R, LEONHARDT, D, SHAMAMIAN, V. A, MEYER, J. R, HOFFMAN, C. A, BUTLER, J. E

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Argon metastables in a high density processing plasma von Leonhardt, D., Eddy, C. R., Shamamian, V. A., Fernsler, R. F., Butler, J. E.

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Characterization of the CH4/H2/Ar high density plasma etching process for ZnSe von EDDY, C. R, LEONHARDT, D, SHAMAMIAN, V. A, BUTLER, J. E

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Guided resonances in asymmetrical GaN photonic crystal slabs observed in the visible spectrum von Rosenberg, A., Carter, Michael W., Casey, J. A., Kim, Mijin, Holm, Ronald T., Henry, Richard L., Eddy, Charles R., Shamamian, V. A., Bussmann, K., Shi, Shouyuan, Prather, Dennis W.

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Treatment of Methyl tert-Butyl Ether Contaminated Water Using a Dense Medium Plasma Reactor:  A Mechanistic and Kinetic Investigation von Johnson, Derek C, Shamamian, Vasgen A, Callahan, John H, Denes, Ferencz S, Manolache, Sorin O, Dandy, David S

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Gallium arsenide surface chemistry and surface damage in a chlorine high density plasma etch process von Eddy, C. R., Glembocki, O. J., Leonhardt, D., Shamamian, V. A., Holm, R. T., Thoms, B. D., Butler, J. E., Pang, S. W.

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Mass spectrometry sampling method for characterizing high-density plasma etching mechanisms von Eddy, C. R., Leonhardt, D., Shamamian, V. A., Butler, J. E., Thoms, B. D.

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Characterization of Cl 2 /Ar high density plasmas for semiconductor etching von Eddy, C. R., Leonhardt, D., Douglass, S. R., Thoms, B. D., Shamamian, V. A., Butler, J. E.

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Decomposition of trimethylgallium on the gallium-rich GaAs (100) surface : implications for atomic layer epitaxy von CREIGHTON, J. R, LYKKE, K. R, SHAMAMIAN, V. A, KAY, B. D

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Two-dimensional model of a large area, inductively coupled, rectangular plasma source for chemical vapor deposition von Giuliani, J.L., Shamamian, V.A., Thomas, R.E., Apruzese, J.P., Mulbrandon, M., Rudder, R.A., Hendry, R.C., Robson, A.E.

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Using Ni masks in inductively coupled plasma etching of high density hole patterns in GaN von Hsu, David S. Y., Kim, Chul Soo, Eddy, Charles R., Holm, Ronald T., Henry, Richard L., Casey, J. A., Shamamian, V. A., Rosenberg, A.

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Guided resonances in asymmetrical GaN photonic crystal slabs observed in the visible spectrum von Rosenberg, A, Carter, Michael, Casey, J, Kim, Mijin, Holm, Ronald, Henry, Richard, Eddy, Charles, Shamamian, V, Bussmann, K, Shi, Shouyuan, Prather, Dennis

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Combustion chemistry in premixed C2F4-O2 flames von DOUGLASS, C. H, LADOUCEUR, H. D, SHAMAMIAN, V. A, MCDONALD, J. R

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Kinetic effects in the chemistry of diamond CVD source gases and implications for diamond growth von Sinkovits, Robert S., DeVore, C. Richard, Shamamian, Vasgen A.

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Development of a tubular high-density plasma reactor for water treatment von Johnson, Derek C., Dandy, David S., Shamamian, Vasgen A.

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Ion Energy Effects on Surface Chemistry and Damage in a High Density Plasma Etch Process for Gallium Arsenide von Leonhardt, Darrin, Eddy, Charles R., Shamamian, Jr, Holm, Ronald T., Glembocki, Orest J., Thoms, Brian D., Katzer, Daniel S., Butler, James E.

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An analysis of gas phase ethanol-water chemistry for diamond CVD von Sinkovits, Robert S., DeVore, C.Richard, Shamamian, Vasgen A., Westbrook, Charles K.

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Characterization of Cl2/Ar high density plasmas for semiconductor etching von Eddy, C. R., Leonhardt, D., Douglass, S. R., Thoms, B. D., Shamamian, V. A., Butler, J. E.

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Speed ratios greater than 1000 and temperatures less than 1 mK in a pulsed he beam von WANG, J, SHAMAMIAN, V. A, THOMAS, B. R, WILKINSON, J. M, RILEY, J, GIESE, C. F, GENTRY, W. R

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Plasma Polymerization of Thin Films:  Correlations between Plasma Chemistry and Thin Film Character von Guerin, Daniel C, Hinshelwood, David D, Monolache, Sorin, Denes, Ferencz S, Shamamian, Vasgen A

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