Advanced Roll-to-Roll Plasma-Enhanced CVD Silicon Carbide Barrier Technology for Protection from Detrimental Gases von Zambov, L., Shamamian, V., Weidner, K., Loboda, M.

Volltext

Guided resonances in asymmetrical GaN photonic crystal slabs observed in the visible spectrum von Rosenberg, A, Carter, Michael, Casey, J, Kim, Mijin, Holm, Ronald, Henry, Richard, Eddy, Charles, Shamamian, V, Bussmann, K, Shi, Shouyuan, Prather, Dennis

Volltext

Dense medium plasma synthesis of carbon/iron-based magnetic nanoparticle system von Denes, F. S., Manolache, S., Ma, Y. C., Shamamian, V., Ravel, B., Prokes, S.

Volltext

Treatment of Methyl tert-Butyl Ether Contaminated Water Using a Dense Medium Plasma Reactor:  A Mechanistic and Kinetic Investigation von Johnson, Derek C, Shamamian, Vasgen A, Callahan, John H, Denes, Ferencz S, Manolache, Sorin O, Dandy, David S

Volltext

Dense Medium Plasma Environments:  A New Approach for the Disinfection of Water von Manolache, S, Somers, E. B, Wong, A. C. L, Shamamian, V, Denes, F

Volltext

Guided resonances in asymmetrical GaN photonic crystal slabs observed in the visible spectrum von Rosenberg, A., Carter, Michael W., Casey, J. A., Kim, Mijin, Holm, Ronald T., Henry, Richard L., Eddy, Charles R., Shamamian, V. A., Bussmann, K., Shi, Shouyuan, Prather, Dennis W.

Volltext

Argon metastables in a high density processing plasma von Leonhardt, D., Eddy, C. R., Shamamian, V. A., Fernsler, R. F., Butler, J. E.

Volltext

Characterization of the CH4/H2/Ar high density plasma etching process for HgCdTe von EDDY, C. R, LEONHARDT, D, SHAMAMIAN, V. A, MEYER, J. R, HOFFMAN, C. A, BUTLER, J. E

Volltext

Characterization of the CH4/H2/Ar high density plasma etching process for ZnSe von EDDY, C. R, LEONHARDT, D, SHAMAMIAN, V. A, BUTLER, J. E

Volltext

Mass spectrometry sampling method for characterizing high-density plasma etching mechanisms von Eddy, C. R., Leonhardt, D., Shamamian, V. A., Butler, J. E., Thoms, B. D.

Volltext

Characterization of Cl 2 /Ar high density plasmas for semiconductor etching von Eddy, C. R., Leonhardt, D., Douglass, S. R., Thoms, B. D., Shamamian, V. A., Butler, J. E.

Volltext

Gallium arsenide surface chemistry and surface damage in a chlorine high density plasma etch process von Eddy, C. R., Glembocki, O. J., Leonhardt, D., Shamamian, V. A., Holm, R. T., Thoms, B. D., Butler, J. E., Pang, S. W.

Volltext

Dense Medium Plasma-Plasma-Enhanced Decontamination of Water of Aromatic Compounds von Manolache, Sorin, Shamamian, Vasgen, Denes, Ferencz

Volltext

Decomposition of trimethylgallium on the gallium-rich GaAs (100) surface : implications for atomic layer epitaxy von CREIGHTON, J. R, LYKKE, K. R, SHAMAMIAN, V. A, KAY, B. D

Volltext

Two-dimensional model of a large area, inductively coupled, rectangular plasma source for chemical vapor deposition von Giuliani, J.L., Shamamian, V.A., Thomas, R.E., Apruzese, J.P., Mulbrandon, M., Rudder, R.A., Hendry, R.C., Robson, A.E.

Volltext

Combustion chemistry in premixed C2F4-O2 flames von DOUGLASS, C. H, LADOUCEUR, H. D, SHAMAMIAN, V. A, MCDONALD, J. R

Volltext

Development of a tubular high-density plasma reactor for water treatment von Johnson, Derek C., Dandy, David S., Shamamian, Vasgen A.

Volltext

Kinetic effects in the chemistry of diamond CVD source gases and implications for diamond growth von Sinkovits, Robert S., DeVore, C. Richard, Shamamian, Vasgen A.

Volltext

Ion Energy Effects on Surface Chemistry and Damage in a High Density Plasma Etch Process for Gallium Arsenide von Leonhardt, Darrin, Eddy, Charles R., Shamamian, Jr, Holm, Ronald T., Glembocki, Orest J., Thoms, Brian D., Katzer, Daniel S., Butler, James E.

Volltext

Characterization of Cl2/Ar high density plasmas for semiconductor etching von Eddy, C. R., Leonhardt, D., Douglass, S. R., Thoms, B. D., Shamamian, V. A., Butler, J. E.

Volltext