Control of Columnar Grain Microstructure in CSD LaNiO3 Films von Atanova, Aleksandra V., Seregin, Dmitry S., Zhigalina, Olga M., Khmelenin, Dmitry N., Orlov, Georgy A., Turkina, Daria I., Sigov, Alexander S., Vorotilov, Konstantin A.

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Effect of terminal methyl groups concentration on properties of organosilicate glass low dielectric constant films von Liu, Chunhui, Qi, Qi, Seregin, Dmitry S., Vishnevskiy, Alexey S., Wang, Yingjie, Wei, Shuhua, Zhang, Jing, Vorotilov, Konstantin A., Dultsev, Fedor N., Baklanov, Mikhail R.

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In-Situ Imaging of a Light-Induced Modification Process in Organo-Silica Films via Time-Domain Brillouin Scattering von Sandeep, Sathyan, Vishnevskiy, Alexey S, Raetz, Samuel, Naumov, Sergej, Seregin, Dmitry S, Husiev, Artem, Vorotilov, Konstantin A, Gusev, Vitalyi E, Baklanov, Mikhail R

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Optical characteristics of LaNiO3 thin films in the terahertz–infrared frequency range von Nozdrin, Vadim S., Komandin, Gennadiy A., Spektor, Igor E., Chernomyrdin, Nikita V., Seregin, Dmitry S., Vishnevskiy, Alexey S., Vorotilov, Konstantin A.

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Microstructure analysis of porous lead zirconate–titanate films von Atanova, Aleksandra V., Zhigalina, Olga M., Khmelenin, Dmitry N., Orlov, Georgy A., Seregin, Dmitry S., Sigov, Alexander S., Vorotilov, Konstantin A.

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Critical properties and charge transport in ethylene bridged organosilica low-κ dielectrics von Perevalov, Timofey V., Gismatulin, Andrei A., Seregin, Dmitry S., Wang, Yingjie, Xu, Haoyu, Kruchinin, Vladimir N., Spesivcev, Evgeniy V., Gritsenko, Vladimir A., Nasyrov, Kamil’ A., Prosvirin, Igor’ P., Zhang, Jing, Vorotilov, Konstantin A., Baklanov, Mikhail R.

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Challenges in scaling of IPVD deposited Ta barriers on OSG low‐k films: Carbonization of Ta by CHx radicals generated through VUV‐induced decomposition of carbon‐containing groups... von Ryabinkin, Alexey N., Vishnevskiy, Alexey S., Naumov, Sergej, Serov, Alexander O., Maslakov, Konstantin I., Seregin, Dmitry S., Vorotyntsev, Dmitry A., Pal, Alexander F., Rakhimova, Tatyana V., Vorotilov, Konstantin A., Baklanov, Mikhail R.

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Dielectric contribution of the IR absorption bands of porous organosilicate glass thin films on a platinum sublayer von Komandin, Gennadiy A., Nozdrin, Vadim S., Spektor, Igor E., Porodinkov, Oleg E., Seregin, Dmitry S., Vishnevskiy, Alexey S., Vorotilov, Konstantin A., Sigov, Alexander S.

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Effects of Methyl Terminal and Carbon Bridging Groups Ratio on Critical Properties of Porous Organosilicate Glass Films von Vishnevskiy, Alexey S., Naumov, Sergej, Seregin, Dmitry S., Wu, Yu-Hsuan, Chuang, Wei-Tsung, Rasadujjaman, Md, Zhang, Jing, Leu, Jihperng, Vorotilov, Konstantin A., Baklanov, Mikhail R.

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Damage to OSG low‐k films during IPVD deposition of the Ta barrier layer von Serov, Alexander O., Ryabinkin, Alexey N., Vishnevskiy, Alexey S., Naumov, Sergej, Pal, Alexander F., Rakhimova, Tatyana V., Seregin, Dmitry S., Vorotilov, Konstantin A., Baklanov, Mikhail R.

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Charge Transport Mechanism and Trap Origin in Methyl‐Terminated Organosilicate Glass Low‐κ Dielectrics von Perevalov, Timofey V., Gismatulin, Andrei A., Dolbak, Andrei E., Gritsenko, Vladimir A., Trofimova, Elena S., Pustovarov, Vladimir A., Seregin, Dmitry S., Vorotilov, Konstantin A., Baklanov, Mikhail R.

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Electrodynamic properties of porous PZT‐Pt films at terahertz frequency range von Komandin, Gennady A., Porodinkov, Oleg E., Spektor, Igor E., Volkov, Alexander A., Vorotilov, Konstantin A., Seregin, Dmitry S., Sigov, Alexander S.

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Effect of surface hydrophobisation on the properties of a microporous phenylene-bridged organosilicate film von Vishnevskiy, Alexey S., Vorotyntsev, Dmitry A., Seregin, Dmitry S., Vorotilov, Konstantin A.

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Temperature evolution of organosilicate glass films with organic bridges von Vishnevskiy, Alexey S., Seregin, Dmitry S., Palov, Alexander P., Orlov, Georgy A., Yakushev, Vladislav A., Ovchinnikov, Ivan S., Vorotilov, Konstantin A., Baklanov, Mikhail R.

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Control of Columnar Grain Microstructure in CSD LaNiO[sub.3] Films von Atanova, Aleksandra V, Seregin, Dmitry S, Zhigalina, Olga M, Khmelenin, Dmitry N, Orlov, Georgy A, Turkina, Daria I, Sigov, Alexander S, Vorotilov, Konstantin A

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Challenges in scaling of IPVD deposited Ta barriers on OSG low‐ k films: Carbonization of Ta by CH x radicals generated through VUV‐induced decomposition of carbon‐containing group... von Ryabinkin, Alexey N., Vishnevskiy, Alexey S., Naumov, Sergej, Serov, Alexander O., Maslakov, Konstantin I., Seregin, Dmitry S., Vorotyntsev, Dmitry A., Pal, Alexander F., Rakhimova, Tatyana V., Vorotilov, Konstantin A., Baklanov, Mikhail R.

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Effect of terminal methyl group concentration on critical properties and plasma resistance of organosilicate low-k dielectrics von Rezvanov, Askar A., Miakonkikh, Andrey V., Seregin, Dmitry S., Vishnevskiy, Alexey S., Vorotilov, Konstantin A., Rudenko, Konstantin V., Baklanov, Mikhail R.

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Control of Columnar Grain Microstructure in CSD LaNiO 3 Films von Atanova, Aleksandra V, Seregin, Dmitry S, Zhigalina, Olga M, Khmelenin, Dmitry N, Orlov, Georgy A, Turkina, Daria I, Sigov, Alexander S, Vorotilov, Konstantin A

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Modification of Porous Ultralow‑k Film by Vacuum Ultraviolet Emission von Zotovich, Alexey I., Zyryanov, Sergey M., Lopaev, Dmitry V., Rezvanov, Askar A., Attallah, Ahmed G., Liedke, Maciej O., Butterling, Maik, Bogdanova, Maria A., Vishnevskiy, Alexey S., Seregin, Dmitry S., Vorotyntsev, Dmitry A., Palov, Alexander P., Hirschmann, Eric, Wagner, Andreas, Naumov, Sergej, Vorotilov, Konstantin A., Rakhimova, Tatyana V., Rakhimov, Alexander T., Baklanov, Mikhail R.

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Data publication: Modification of Porous Ultralow‑k Film by Vacuum Ultraviolet Emission von Zotovich, Alexey I., Zyryanov, Sergey M., Lopaev, Dmitry V., Rezvanov, Askar A., Attallah, Ahmed Gamal, Liedke, Maciej Oskar, Butterling, Maik, Bogdanova, Maria A., Vishnevskiy, Alexey S., Seregin, Dmitry S., Vorotyntsev, Dmitry A. Vorotyntsev, Palov, Alexander P., Hirschmann, Eric, Wagner, Andreas, Naumov, Sergej, Vorotilov, Konstantin A., Rakhimova, Tatyana V., Rakhimov, Alexander T. R., Baklanov, Mikhail

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