Analysis on crossing frequency in transmission microwave frequency spectrum of the cutoff probe von Kim, Si-jun, Lee, Youngseok, Cho, Chulhee, Seong, Inho, Jeong, Wonnyoung, Lee, Jangjae, You, Shinjae

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Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2 von Lee, Youngseok, Kim, Sijun, Lee, Jangjae, Cho, Chulhee, Seong, Inho, You, Shinjae

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Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath von Seong, Inho, Kim, Sijun, Lee, Youngseok, Cho, Chulhee, Lee, Jangjae, Jeong, Wonnyoung, You, Yebin, You, Shinjae

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A unified global model accompanied with a voltage and current sensor for low-pressure capacitively coupled RF discharge von Seong, Inho, Kim, Sijun, Lee, Woobeen, Lee, Youngseok, Cho, Chulhee, Jeong, Wonnyoung, Choi, Minsu, Choi, Byeongyeop, Seo, Huichan, Song, Sangheon, You, Shinjae

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Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma von Cho, Chulhee, Kim, Sijun, Lee, Youngseok, Jeong, Wonnyoung, Seong, Inho, Lee, Jangjae, Choi, Minsu, You, Yebin, Lee, Sangho, Lee, Jinho, You, Shinjae

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Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma von Seong, Inho, Lee, Jinho, Kim, Sijun, Lee, Youngseok, Cho, Chulhee, Lee, Jangjae, Jeong, Wonnyoung, You, Yebin, You, Shinjae

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Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2 von Lee, Youngseok, Seong, Inho, Lee, Jangjae, Lee, Sangho, Cho, Chulhee, Kim, Sijun, You, ShinJae

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Time-domain direct capacitive coupling detection technique applicable inside a cavity structure for determination of crossing frequency in a transmission microwave frequency spectr... von Cho, Chulhee, Kim, Sijun, Lee, Woobeen, Seong, Inho, Jeong, Wonnyoung, Lee, Youngseok, Seol, Youbin, Na, Byungkeun, Kim, Daewoong, You, Shinjae

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Plasma atomic layer etching of SiO2 with a low global warming potential fluorocarbon precursor (C6F6) von Seong, Inho, You, Yebin, Lee, Youngseok, Choi, Minsu, Sung, Dain, Yeom, Geunyoung, You, ShinJae

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Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method von Cho, Chulhee, Kim, Sijun, Lee, Youngseok, Seong, Inho, Jeong, Wonnyoung, You, Yebin, Choi, Minsu, You, Shinjae

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Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Contro... von Jeong, Wonnyoung, Kim, Sijun, Lee, Youngseok, Cho, Chulhee, Seong, Inho, You, Yebin, Choi, Minsu, Lee, Jangjae, Seol, Youbin, You, Shinjae

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Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma von Seong, Inho, Kim, Sijun, Choi, Minsu, Lee, Woobeen, Jeong, Wonnyoung, Cho, Chulhee, You, Yebin, Lee, Youngseok, Seol, Youbin, You, Shinjae

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Contribution of Ion Energy and Flux on High-Aspect Ratio SiO 2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C 4 F 8 Plasma: Individual Ion Energy and Flux Co... von Jeong, Wonnyoung, Kim, Sijun, Lee, Youngseok, Cho, Chulhee, Seong, Inho, You, Yebin, Choi, Minsu, Lee, Jangjae, Seol, Youbin, You, Shinjae

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Contribution of Ion Energy and Flux on High-Aspect Ratio SiO[sub.2] Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C[sub.4]F[sub.8] Plasma: Individual Ion Ener... von Jeong, Wonnyoung, Kim, Sijun, Lee, Youngseok, Cho, Chulhee, Seong, Inho, You, Yebin, Choi, Minsu, Lee, Jangjae, Seol, Youbin, You, Shinjae

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Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction von Choi, Minsu, Lee, Youngseok, You, Yebin, Cho, Chulhee, Jeong, Wonnyoung, Seong, Inho, Choi, Byeongyeop, Kim, Sijun, Seol, Youbin, You, Shinjae, Yeom, Geun Young

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Initiation mechanism of arcing generated in RF capacitively coupled plasma von Cho, Chulhee, Kim, Sijun, Choi, Minsu, Lee, Youngseok, Seong, Inho, Jeong, Wonnyoung, Lee, Jangjae, Kim, Daewoong, Park, Sanghoo, You, Shin-jae

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Characterization of SiO[sub.2] Plasma Etching with Perfluorocarbon Precursors for the Greenhouse Gas Emissions Reduction von Choi, Minsu, Lee, Youngseok, You, Yebin, Cho, Chulhee, Jeong, Wonnyoung, Seong, Inho, Choi, Byeongyeop, Kim, Sijun, Seol, Youbin, You, Shinjae, Yeom, Geun Young

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On the Quenching of Electron Temperature in Inductively Coupled Plasma von Seong, Inho, Kim, Si-Jun, Lee, Youngseok, Cho, Chulhee, Jeong, Wonnyoung, You, Yebin, Choi, Minsu, Choi, Byeongyeop, You, Shinjae

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Plasma Dielectric Etching with C4H2F6 Isomers of Low Global-Warming Potential von Choi, Minsu, Lee, Youngseok, Cho, Chulhee, Jeong, Wonnyoung, Seong, Inho, Haque, Jami Md Ehsanul, Choi, Byeongyeop, Seo, Seonghyun, Kim, Sijun, You, Shinjae, Yeom, Geun Young

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Apparatus and method for selecting an image stream data using an artificial intelligence automatically in the image editing apparatus von INHO SEONG

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