Protocol for depositing transparent conductive Ta-doped SnO2 film by hollow cathode gas flow sputtering technology von Huo, Fangfang, Hartig, Manuel, Otto Seibertz, Bertwin Bilgrim, Alktash, Nivin, Muydninov, Ruslan, Wang, Can, Gao, Peng, Szyszka, Bernd

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Tantalum-doped tin oxide thin films using hollow cathode gas flow sputtering technology von Huo, Fangfang, Muydinov, Ruslan, Seibertz, Bertwin Bilgrim Otto, Wang, Can, Hartig, Manuel, Alktash, Nivin, Gao, Peng, Szyszka, Bernd

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Hollow Cathode Gas Flow Sputtering of Nickel Oxide Thin Films for Hole‐Transport Layer Application in Perovskite Solar Cells von Vinoth Kumar, Sri Hari Bharath, Muydinov, Ruslan, Maticiuc, Natalia, Alktash, Nivin, Rusu, Marin, Seibertz, Bertwin Bilgrim Otto, Köbler, Hans, Abate, Antonio, Unold, Thomas, Lauermann, Iver, Szyszka, Bernd

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P-type nickel oxide deposited by reactive hollow cathode gas flow sputtering for the potential usage in thin-film transistors von Seibertz, Bertwin Bilgrim Otto, Szyszka, Bernd

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Protocol for depositing transparent conductive Ta-doped SnO 2 film by hollow cathode gas flow sputtering technology von Huo, Fangfang, Hartig, Manuel, Otto Seibertz, Bertwin Bilgrim, Alktash, Nivin, Muydninov, Ruslan, Wang, Can, Gao, Peng, Szyszka, Bernd

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