Universal Equation for Argon Gas Cluster Sputtering Yields von Seah, M. P

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Simple universal curve for the energy-dependent electron attenuation length for all materials von Seah, M. P.

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An accurate and simple universal curve for the energy-dependent electron inelastic mean free path von Seah, M. P.

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Sputtering yields of compounds using argon ions von Seah, M P, Nunney, T S

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Peptide Fragmentation and Surface Structural Analysis by Means of ToF-SIMS Using Large Cluster Ion Sources von Yokoyama, Yuta, Aoyagi, Satoka, Fujii, Makiko, Matsuo, Jiro, Fletcher, John S, Lockyer, Nicholas P, Vickerman, John C, Passarelli, Melissa K, Havelund, Rasmus, Seah, Martin P

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Argon Cluster Ion Beams for Organic Depth Profiling: Results from a VAMAS Interlaboratory Study von Shard, Alexander G, Havelund, Rasmus, Seah, Martin P, Spencer, Steve J, Gilmore, Ian S, Winograd, Nicholas, Mao, Dan, Miyayama, Takuya, Niehuis, Ewald, Rading, Derk, Moellers, Rudolf

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Organic Depth Profiling of a Nanostructured Delta Layer Reference Material Using Large Argon Cluster Ions von Lee, J. L. S, Ninomiya, S, Matsuo, J, Gilmore, I. S, Seah, M. P, Shard, A. G

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Microfluidic chip for stacking, separation and extraction of multiple DNA fragments von Wu, Ruige, Seah, YP, Wang, Zhiping

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Angle Dependence of Argon Gas Cluster Sputtering Yields for Organic Materials von Seah, M. P, Spencer, S. J, Shard, A. G

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Quantitative characterization of defect size in graphene using Raman spectroscopy von Pollard, Andrew J., Brennan, Barry, Stec, Helena, Tyler, Bonnie J., Seah, Martin P., Gilmore, Ian S., Roy, Debdulal

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New Aspects in Quantitative Surface Analysis von Seah, M. P.

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Work Functions and Electron Spectroscopy von Seah, M. P.

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THE PROGRESS OF QUANTITATIVE ANALYSIS BY ELECTRON SPECTROSCOPY von Seah, M. P.

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Sputtering, Cluster Primary Ions and Static SIMS von Seah, Martin P.

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Comment on "Identification of background in CMA" [J. Surf. Anal. 14, 95 (2007)] von Seah, Martin P.

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SIMS of Delta Layers in Organic Materials: Amount of Substance, Secondary Ion Species, Matrix Effects, and Anomalous Structures in Argon Gas Cluster Depth Profiles von Seah, M. P, Havelund, R, Gilmore, I. S

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Summary of ISO/TC 201 Standard: VII ISO 15472 : 2001-surface chemical analysis-x-ray photoelectron spectrometers-calibration of energy scales von Seah, M. P.

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Universal Equation for Argon Cluster Size-Dependence of Secondary Ion Spectra in SIMS of Organic Materials von Seah, Martin P, Havelund, Rasmus, Gilmore, Ian S

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The determination of atomic force microscope cantilever spring constants via dimensional methods for nanomechanical analysis von Clifford, Charles A, Seah, Martin P

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Quantification issues in the identification of nanoscale regions of homopolymers using modulus measurement via AFM nanoindentation von Clifford, Charles A., Seah, Martin P.

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