Universal Equation for Argon Gas Cluster Sputtering Yields von Seah, M. P

Volltext

Simple universal curve for the energy-dependent electron attenuation length for all materials von Seah, M. P.

Volltext

An accurate and simple universal curve for the energy-dependent electron inelastic mean free path von Seah, M. P.

Volltext

Sputtering yields of compounds using argon ions von Seah, M P, Nunney, T S

Volltext

Organic Depth Profiling of a Nanostructured Delta Layer Reference Material Using Large Argon Cluster Ions von Lee, J. L. S, Ninomiya, S, Matsuo, J, Gilmore, I. S, Seah, M. P, Shard, A. G

Volltext

New Aspects in Quantitative Surface Analysis von Seah, M. P.

Volltext

THE PROGRESS OF QUANTITATIVE ANALYSIS BY ELECTRON SPECTROSCOPY von Seah, M. P.

Volltext

Work Functions and Electron Spectroscopy von Seah, M. P.

Volltext

Angle Dependence of Argon Gas Cluster Sputtering Yields for Organic Materials von Seah, M. P, Spencer, S. J, Shard, A. G

Volltext

SIMS of Delta Layers in Organic Materials: Amount of Substance, Secondary Ion Species, Matrix Effects, and Anomalous Structures in Argon Gas Cluster Depth Profiles von Seah, M. P, Havelund, R, Gilmore, I. S

Volltext

Summary of ISO/TC 201 Standard: VII ISO 15472 : 2001-surface chemical analysis-x-ray photoelectron spectrometers-calibration of energy scales von Seah, M. P.

Volltext

Sputtering Yields for Mixtures of Organic Materials Using Argon Gas Cluster Ions von Seah, M. P, Havelund, R, Shard, A. G, Gilmore, I. S

Volltext

Depth resolution at organic interfaces sputtered by argon gas cluster ions: the effect of energy, angle and cluster size von Seah, M. P, Spencer, S. J, Havelund, R, Gilmore, I. S, Shard, A. G

Volltext

Quantifying SIMS of Organic Mixtures and Depth Profiles—Characterizing Matrix Effects of Fragment Ions von Seah, M. P., Havelund, R., Spencer, S. J., Gilmore, I. S.

Volltext

Ultrathin SiO2 on Si II. Issues in quantification of the oxide thickness von Seah, M. P., Spencer, S. J.

Volltext

Attenuation lengths in organic materials von Seah, M. P., Spencer, S. J.

Volltext

Summary of ISO/TC 201 Standard: ISO 18115-1:2010 - surface chemical analysis - vocabulary - general terms and terms used in spectroscopy von Seah, M P

Volltext

VAMAS interlaboratory study on organic depth profiling von Shard, A. G., Ray, S., Seah, M. P., Yang, L.

Volltext

Analysis of cluster ion sputtering yields: correlation with the thermal spike model and implications for static secondary ion mass spectrometry von Seah, M. P.

Volltext

Mass Spectrometry and Informatics: Distribution of Molecules in the PubChem Database and General Requirements for Mass Accuracy in Surface Analysis von Green, F. M, Gilmore, I. S, Seah, M. P

Volltext