Hole injection SiO2 breakdown model for very low voltage lifetime extrapolation von SCHUEGRAF, K. F, CHENMING HU

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Single-wafer process technology: enabling rapid SiGe BiCMOS development von Schuegraf, K.

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Semiconductor Logic Technology Innovation to Achieve Sub-10 nm Manufacturing von Schuegraf, K., Abraham, M. C., Brand, A., Naik, M., Thakur, R.

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Epi defined (ED) FinFET: An alternate device architecture for high mobility Ge channel integration in PMOSFET von Mittal, S., Gupta, S., Nainani, A., Abraham, M. C., Schuegraf, K., Lodha, S., Ganguly, U.

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Handbook of Thin-Film Deposition Processes and Techniques - Principles, Methods, Equipment and Applications (2nd Edition) von Seshan, Krishna

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Effects of temperature and defects on breakdown lifetime of thin SiO2 at very low voltages von SCHUEGRAF, K. F, CHENMING HU

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Epitaxialy defined (ED) FinFET: to reduce VT variability and enable multiple VT von Mittal, S., Gupta, S., Nainani, A., Abraham, M. C., Schuegraf, K., Lodha, S., Ganguly, U.

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Metal-oxide-semiconductor field-effect-transistor substrate current during Fowler–Nordheim tunneling stress and silicon dioxide reliability von Schuegraf, Klaus F., Hu, Chenming

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Effects of temperature and defects on breakdown lifetime of thinSiO(2) at very low voltages von Schuegraf, K F, Hu, Chenming

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Hole injection SiO(2) breakdown model for very low voltagelifetime extrapolation von Schuegraf, K F, Hu, Chenming

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Reliability of thin SiO 2 von Schuegraf, K F, Hu, Chenming

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Radiation Effects on Bipolar Integrated Injection Logic von Raymond, J. P., Wong, T. Y., Schuegraf, K. K.

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Is strain engineering scalable in FinFET era?: Teaching the old dog some new tricks von Nainani, A., Gupta, S., Moroz, V., Munkang Choi, Yihwan Kim, Cho, Y., Gelatos, J., Mandekar, T., Brand, A., Er-Xuan Ping, Abraham, M. C., Schuegraf, K.

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EBS Diode Arrays von Schuegraf,K. K

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Design Approach to Radiation-Hardened I2L Gate Arrays von Bahraman, Ali, Chang, Stephen, Romeo, Donald, Schuegraf, Klaus

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Halogensubstitutionsprodukte des Thyronins (Desjod-thyroxins) von Schuegraf, K.

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1 - Deposition Technologies and Applications: Introduction and Overview von Kern, Werner, Schuegraf, Klaus K.

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Design, development, and fabrication of a electronic analog microminiaturized electronic analog signal to discrete time interval converter von Schoenfeld, A. D., Schuegraf, K. K.

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BC35: a 0.35 /spl mu/m, 30 GHz production RF BiCMOS technology von Racanelli, M., Zhe Zhang, Jie Zheng, Kar-Roy, A., Joshi, P., Kalburge, A., Nathawad, L., Todd, M., Ukah, C., Chun Hu, Compton, G., Schuegraf, K., Peihua Ye, Dowlatshahi, R., Jolly, G., Kempf, P.

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LSI Digital Frequency Synthesizer von Allen,R A, Krebs,M G, Schuegraf,K K

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