Treffer 1 - 15 von 15 für Suche 'Scholtz, Juliano Sadi', Suchdauer: 0,72s Treffer weiter einschränken
  1. 1
    Oxide Layers Growth on AISI 1006 Steel through 'Asymmetric Bipolar Pulsed Plasma' Process

    Oxide Layers Growth on AISI 1006 Steel through 'Asymmetric Bipolar Pulsed Plasma' Process von Fin, Paula, Recco, Abel A. C., Scholtz, Juliano Sadi, Fontana, Luis C.


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  2. 2
    Pulsed bias effect on crystallinity and nano-roughness of Ti6Al4V-N films deposited by grid assisted magnetron sputtering system

    Pulsed bias effect on crystallinity and nano-roughness of Ti6Al4V-N films deposited by grid assisted magnetron sputtering system von Stryhalski, Joel, Fontana, Luis César, Odorczyk, Marcos Fernando, Scholtz, Juliano Sadi, Sagás, Julio César, Recco, Abel André Candido


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  3. 3
    Asymmetric Bipolar Plasma Power Supply to Increase the Secondary Electrons Emission in Capacitive Coupling Plasmas

    Asymmetric Bipolar Plasma Power Supply to Increase the Secondary Electrons Emission in Capacitive Coupling Plasmas von Scholtz, Juliano Sadi, Fontana, Luis Cesar, Mezaroba, Marcello


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  4. 4
    Graphene nanosheets obtained through graphite powder exfoliation in pulsed underwater electrical discharge

    Graphene nanosheets obtained through graphite powder exfoliation in pulsed underwater electrical discharge von Segundo, Elisa Hellen, Fontana, Luis Cesar, Recco, Abel A.C., Scholtz, Juliano Sadi, Nespolo Vomstein, Marco Aurelio, Becker, Daniela

    Veröffentlicht in Materials chemistry and physics

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  5. 5
    Step-Up/Step-Down DC-DC ZVS PWM Converter With Active Clamping

    Step-Up/Step-Down DC-DC ZVS PWM Converter With Active Clamping von dos Santos Garcia Giacomini, P., Scholtz, J.S., Mezaroba, M.


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  6. 6
    Pulsed bias effect on roughness of TiO sub(2):Nb films deposited by grid assisted magnetron sputtering

    Pulsed bias effect on roughness of TiO sub(2):Nb films deposited by grid assisted magnetron sputtering von Scholtz, Juliano Sadi, Stryhalski, Joel, Sagas, Julio Cesar, Recco, Abel Andre Candido, Mezaroba, Marcello, Fontana, Luis Cesar

    Veröffentlicht in Applied adhesion science

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  7. 7
    Pulsed bias effect on roughness of TiO2:Nb films deposited by grid assisted magnetron sputtering

    Pulsed bias effect on roughness of TiO2:Nb films deposited by grid assisted magnetron sputtering von Scholtz, Juliano Sadi, Stryhalski, Joel, Sagás, Julio César, Recco, Abel André Cândido, Mezaroba, Marcello, Fontana, Luís César

    Veröffentlicht in Applied adhesion science

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  8. 8
    WORKING GAS PRESSURE AS A CONTROL PARAMETER OF CRYSTALLINE PHASES DURING PULSED PLASMA NITRIDING PROCESS / PRESSÃO DO GÁS DE TRABALHO COMO PARÂMETRO DE CONTROLE DE FASES CRISTALINAS OBTIDAS EM NITRETAÇÃO POR PLASMA PULSADO

    WORKING GAS PRESSURE AS A CONTROL PARAMETER OF CRYSTALLINE PHASES DURING PULSED PLASMA NITRIDING PROCESS / PRESSÃO DO GÁS DE TRABALHO COMO PARÂMETRO DE CONTROLE DE FASES CRISTALINA... von Scholtz, Juliano Sadi, Ludero, Alex, Mezaroba, Marcello, Torres, Ricardo Diego, Fontana, Luis Cesar


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  9. 9
    PRESSÃO DO GÁS DE TRABALHO COMO PARÂMETRO DE CONTROLE DE FASES CRISTALINAS OBTIDAS EM NITRETAÇÃO POR PLASMA PULSADO

    PRESSÃO DO GÁS DE TRABALHO COMO PARÂMETRO DE CONTROLE DE FASES CRISTALINAS OBTIDAS EM NITRETAÇÃO POR PLASMA PULSADO von Scholtz, Juliano Sadi, Ludero, Alex, Mezaroba, Marcello, Torres, Ricardo Diego, Fontana, Luis Cesar


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  10. 10
    Plasma densification method

    Plasma densification method von Fontana, Luis Cesar, Scholtz, Juliano Sadi

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  11. 11
    MÉTODO DE DENSIFICAÇÃO DE PLASMA

    MÉTODO DE DENSIFICAÇÃO DE PLASMA von JULIANO SADI SCHOLTZ, LUIS CÉSAR FONTANA

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  12. 12
    PLASMA DENSIFICATION METHOD

    PLASMA DENSIFICATION METHOD von Fontana, Luis César, Scholtz, Juliano Sadi

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  13. 13
    PLASMA DENSIFICATION METHOD

    PLASMA DENSIFICATION METHOD von Scholtz Juliano Sadi, Fontana Luis Cesar

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  14. 14
    MÉTODO DE DENSIFICAÇÃO DE PLASMA

    MÉTODO DE DENSIFICAÇÃO DE PLASMA von JULIANO SADI SCHOLTZ, LUIS CÉSAR FONTANA

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  15. 15
    fonte bipolar pulsada em alta frequência para geração de plasma

    fonte bipolar pulsada em alta frequência para geração de plasma von LUIS CESAR FONTANA, JULIANO SADI SCHOLTZ, MARCELLO MEZAROBA

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