Template fabrication for the 32 nm node and beyond von Schmid, Gerard M., Thompson, Ecron, Stacey, Nick, Resnick, Douglas J., Olynick, Deirdre L., Anderson, Erik H.

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Mesoscale Monte Carlo simulation of photoresist processing von SCHMID, Gerard M, STEWART, Michael D, BURNS, Sean D, WILLSON, C. Grant

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Template fabrication for the 32nm node and beyond von Schmid, Gerard M., Thompson, Ecron, Stacey, Nick, Resnick, Douglas J., Olynick, Deirdre L., Anderson, Erik H.

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Minimizing linewidth roughness in Step and Flash Imprint Lithography von Khusnatdinov, Niyaz, Schmid, Gerard M., Brooks, Cynthia B., LaBrake, Dwayne, Resnick, Douglas J., Hart, Mark W., Gopalakrishnan, Kailash, Shenoy, Rohit, Jih, Ron, Zhang, Ying, Sikorski, Edmund, Rothwell, Mary Beth, Owens, Jordan, Ford, Arnie

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Spatial distribution of reaction products in positive tone chemically amplified resists von Schmid, Gerard M., Stewart, Michael D., Singh, Vivek K., Willson, C. Grant

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Advancements to the critical ionization dissolution model von Burns, Sean D., Schmid, Gerard M., Tsiartas, Pavlos C., Willson, C. Grant, Flanagin, Lewis

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Nonaqueous development of silsesquioxane electron beam resist von Schmid, Gerard M., Carpenter, Leslie E., Liddle, J. Alexander

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Implementation of an imprint damascene process for interconnect fabrication von Schmid, Gerard M., Stewart, Michael D., Wetzel, Jeffrey, Palmieri, Frank, Hao, Jianjun, Nishimura, Yukio, Jen, Kane, Kim, Eui Kyoon, Resnick, Douglas J., Liddle, J. Alexander, Willson, C. Grant

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Step and flash imprint lithography for manufacturing patterned media von Schmid, Gerard M., Miller, Mike, Brooks, Cynthia, Khusnatdinov, Niyaz, LaBrake, Dwayne, Resnick, Douglas J., Sreenivasan, S. V., Gauzner, Gene, Lee, Kim, Kuo, David, Weller, Dieter, Yang, XiaoMin

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Acid catalyst mobility in resist resins von Stewart, Michael D., Tran, Hoang Vi, Schmid, Gerard M., Stachowiak, Timothy B., Becker, Darren J., Willson, C. Grant

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Electrostatic effects during dissolution of positive tone photoresists von Schmid, Gerard M., Burns, Sean D., Tsiartas, Pavlos C., Willson, C. Grant

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Electrochemical etching of silicon in nonaqueous electrolytes containing hydrogen fluoride or fluoroborate von FLAKE, J. C, RIEGER, M. M, SCHMID, G. M, KOHL, P. A

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Formation of deprotected fuzzy blobs in chemically amplified resists von Jones, Ronald L., Hu, Tengjiao, Lin, Eric K., Wu, Wen-Li, Goldfarb, Dario L., Angelopoulos, Marie, Trinque, Brian C., Schmid, Gerard M., Stewart, Michael D., Willson, C. Grant

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Methods for fabricating guide patterns and methods for fabricating integrated circuits using such guide patterns von Farrell Richard, Schmid Gerard M

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Quantifying acid generation efficiency for photoresist applications von Tsiartas, Pavlos C., Schmid, Gerard M., Johnson, Heather F., Stewart, Michael D., Willson, C. Grant

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Formation of deprotected fuzzy blobs in chemically amplified resists: Recent developments in polymer science as determined by neutron scattering von JONES, Ronald L, TENGJIAO HU, LIN, Eric K, WU, Wen-Li, GOLDFARB, Dario L, ANGELOPOULOS, Marie, TRINQUE, Brian C, SCHMID, Gerard M, STEWART, Michael D, WILLSON, C. Grant

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METHODS FOR FABRICATING GUIDE PATTERNS AND METHODS FOR FABRICATING INTEGRATED CIRCUITS USING SUCH GUIDE PATTERNS von FARRELL RICHARD, SCHMID GERARD M

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Strain and kinetics control during separation phase of imprint process von Schmid, Gerard M, Miller, Michael N, Lu, Xiaoming, Nimmakayala, Pawan Kumar, Khusnatdinov, Niyaz, Meissl, Mario Johannes, Xu, Frank Y, Thompson, Ecron D, Choi, Byung-Jin

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Safe separation for nano imprinting von Fletcher, Edward Brian, Schmid, Gerard M, Im, Se-Hyuk, Cherala, Anshuman, Sreenivasan, Sidlgata V, GanapathiSubramanian, Mahadevan, Choi, Byung Jin, Khusnatdinov, Niyaz, Meissl, Mario Johannes, Xu, Frank Y

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Multilayer pattern transfer for chemical guides von Raghunathan Sudharshanan, Farrell Richard A, Schmid Gerard M

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