Measurement of electron emission due to energetic ion bombardment in plasma source ion implantation von SHAMIM, M. M, SCHEUER, J. T, FETHERSTON, R. P, CONRAD, J. R

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Model of plasma source ion implantation in planar, cylindrical, and spherical geometries von SCHEUER, J. T, SHAMIM, M, CONRAD, J. R

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USJ formation using pulsed plasma doping von Scheuer, J.T, Lenoble, D, Reynard, J.-P, Lallement, F, Grouillet, A, Arevalo, A, Distaso, D, Downey, D, Fang, Z, Godet, L, Koo, B.W, Miller, T, Weeman, J

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Measurements of spatial and temporal sheath evolution for spherical and cylindrical geometries in plasma source ion implantation von SHAMIM, M, SCHEUER, J. T, CONRAD, J. R

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High-Uniformity Inductively Coupled Plasma Source With Magnetic Multicusp Confinement von Biloiu, C., Olson, J. C., Scheuer, J. T., Renau, A.

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Recent advances in plasma source ion implantation at Los Alamos National Laboratory von Munson, Carter P., Faehl, R.J., Henins, I., Nastasi, M., Reass, W.A., Rej, D.J., Scheuer, J.T., Walter, K.C., Wood, B.P.

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Comparison between conventional and plasma source ion-implanted femoral knee components von CHEN, A, SCHEUER, J. T, RITTER, C, ALEXANDER, R. B, CONRAD, J. R

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Increased wear resistance of electrodeposited chromium through applications of plasma source ion implantation techniques von Walter, K.C., Scheuer, J.T., McIntyre, P.C., Kodali, P., Yu, N., Nastasi, M.

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A pulsed inductively coupled plasma source for plasma-based ion implantation von Tuszewski, M., Scheuer, J.T., Adler, R.A.

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Results from 2 years of operation of a plasma implantation facility von Adler, R.J, Horne, W, Brunke, R, Scheuer, J.T

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A magnetically-nozzled, quasi-steady, multimegawatt, coaxial plasma thruster von Scheuer, J.T., Schoenberg, K.F., Gerwin, R.A., Hoyt, R.P., Henins, I., Black, D.C., Mayo, R.M., Moses, R.W.

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Commercial plasma source ion implantation facility von Scheuer, J.T., Walter, K.C., Adler, R.A., Horne, W.G.

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A collisional model of the plasma presheath von Scheuer, J. T., Emmert, G. A.

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Reliability Tests of a Real Time Charge Monitor (RTCM) von Gammel, G, Biloiu, C, Perel, A, Scheuer, J T, Renau, A

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Advanced Charge Control for Single Wafer Implanters von Kurunczi, P F, Perel, A S, Wright, E, Kikuchi, S, Scheuer, J T

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Enhanced Dosimetry For Single Wafer High-Current Implanters von Scheuer, J T, Dzengeleski, J, Distaso, D, Timberlake, D, Cummings, J, Olson, J C

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Optimized Autotuning for Single Wafer High-Current and Medium-Current Implanters von Scheuer, J T, Cucchetti, A, Welsch, M, Callahan, W, Luey, K, Olson, J C

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Sheath and presheath in a collisionless plasma with a Maxwellian source von Scheuer, J. T., Emmert, G. A.

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Magnetic nozzle design for coaxial plasma accelerators von Hoyt, R.P., Scheuer, J.T., Schoenberg, K.F., Gerwin, R.A., Moses, R.W., Henins, I.

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Preliminary investigation of power flow and performance phenomena in a multimegawatt coaxial plasma thruster von Schoenberg, K.F., Gerwin, R.A., Henins, I., Mayo, R.M., Scheuer, J.T., Wurden, G.A.

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