Crowd-sourced technique for pitch track generation von Cook, Perry R, Shimmin, John, Sullivan, Stefan, Schaffer, Dean

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CROWD-SOURCED TECHNIQUE FOR PITCH TRACK GENERATION von SCHAFFER, Dean, COOK, Perry R, SHIMMIN, John, SULLIVAN, Stefan

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Crowd-sourced technique for pitch track generation von Cook, Perry R, Shimmin, John, Sullivan, Stefan, Schaffer, Dean

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CROWD-SOURCED TECHNIQUE FOR PITCH TRACK GENERATION von Cook, Perry R, Shimmin, John, Sullivan, Stefan, Schaffer, Dean

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CROWD-SOURCED TECHNIQUE FOR PITCH TRACK GENERATION von SCHAFFER, Dean, COOK, Perry R, SHIMMIN, John, SULLIVAN, Stefan

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Crowd sourced technique for pitch track generation von Cook, Perry R, Shimmin, John, Sullivan, Stefan, Schaffer, Dean

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CROWD-SOURCED TECHNIQUE FOR PITCH TRACK GENERATION von SCHAFFER, Dean, COOK, Perry R, SHIMMIN, John, SULLIVAN, Stefan

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CROWD-SOURCED TECHNIQUE FOR PITCH TRACK GENERATION von SCHAFFER, Dean, COOK, Perry R, SHIMMIN, John, SULLIVAN, Stefan

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CROWD-SOURCED TECHNIQUE FOR PITCH TRACK GENERATION von Shimmin John, Sullivan Stefan, Schaffer Dean, Cook Perry R

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Musical composition authoring environment integrated with synthetic musical instrument von Cook, Perry R, Moody, Jonathan, Xie, Ran, Smith, Jeffrey C, Yang, Jeannie, Corral, Oscar, Espeleta, Charles, Schaffer, Dean

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MUSICAL COMPOSITION AUTHORING ENVIRONMENT INTEGRATED WITH SYNTHETIC MUSICAL INSTRUMENT von Cook, Perry R, Moody, Jonathan, Xie, Ran, Smith, Jeffrey C, Yang, Jeannie, Corral, Oscar, Espeleta, Charles, Schaffer, Dean

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CROWD-SOURCED TECHNIQUE FOR PITCH TRACK GENERATION von SHIMMIN JOHN, SCHAFFER DEAN, COOK PERRY R, SULLIVAN STEFAN

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Service will continue collecting communications excise tax von Schaffer, Dean

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Ruling revoked on communications tax exemption von Kautter, David J

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Selective polish process for titanium, titanium nitride, tantalum and tantalum nitride von RUTTEN, MATTHEW JEREMY, LANDERS, WILLIAM FRANCIS, SCHAFFER, DEAN ALLEN, FISHER, JR., THOMAS ROBERT

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Slurry for mechanical polishing (CMP) of metals and use thereof von Brigham, Michael, Canaperi, Donald, Cobb, Michael, Cote, William, Davis, Kenneth, Estes, Scott, Gordon, Edward, Hannah, James, Krishnan, Mahadevaiyer, Lofaro, Michael, MacDonald, Michael, Schaffer, Dean, Slusser, George, Tornello, James, White, Eric

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Slurry for mechanical polishing (CMP) of metals and use thereof von Brigham, Michael Todd, Canaperi, Donald Francis, Cobb, Michael Addison, Cote, William, Davis, Kenneth Morgan, Estes, Scott Alan, Gordon, Edward Jack, Hannah, James Willard, Krishnan, Mahadevaiyer, Lofaro, Michael Francis, MacDonald, Michael Joseph, Schaffer, Dean Allen, Slusser, George James, Tornello, James Anthony, White, Eric Jeffrey

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Slurry for mechanical polishing (CMP) of metals and use thereof von LOFARO MICHAEL FRANCIS, COBB MICHAEL ADDISON, KRISHNAN MAHADEVAIYER, TORNELLO JAMES ANTHONY, DAVIS KENNETH MORGAN, SCHAFFER DEAN ALLEN, MACDONALD MICHAEL JOSEPH, COTE WILLIAM, ESTES SCOTT ALAN, WHITE ERIC JEFFREY, CANAPERI DONALD FRANCIS, SLUSSER GEORGE JAMES, GORDON EDWARD JACK, HANNAH JAMES WILLARD, BRIGHAM MICHAEL TODD

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Method for reworking copper metallurgy in semiconductor devices von KRYWANCZYK TIMOTHY C, SMITH, JR. PAUL H, WHITE ERIC J, REYNOLDS CLARK D, SCHAFFER DEAN A, CURRAN, JR. THOMAS F, MOON MATTHEW D, LUBE MICHAEL S, SHARROW JOEL M, NADEAU ROCK, THOMAS DAVID C, YAO KENNETH H

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Method for reworking copper metallurgy in semiconductor devices von Curran, Jr., Thomas F, Krywanczyk, Timothy C, Lube, Michael S, Moon, Matthew D, Nadeau, Rock, Reynolds, Clark D, Schaffer, Dean A, Sharrow, Joel M, Smith, Jr., Paul H, Thomas, David C, White, Eric J, Yao, Kenneth H

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